利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

163 条记录 (耗时 0.038 秒)

    Positive radiation-sensitive composition
    1.
    发明授权
    Positive radiation-sensitive composition 有权
    正辐射敏感组合物

    公开(公告)号：US06806023B2

    公开(公告)日：2004-10-19

    申请号：US09851113

    申请日：2001-05-09

    申请人： Shinichi Kanna ,  Kunihiko Kodama

    发明人： Shinichi Kanna ,  Kunihiko Kodama

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/115

    摘要： A positive radiation-sensitive composition comprising: (a) a resin whose solubility in an alkali developer increases by the action of an acid; (b) a compound which generates a carboxylic acid having a molecular weight of 100 or less upon irradiation with an actinic ray or a radiant ray; (c) a surfactant; and (d) a solvent.

    摘要翻译： 一种正性辐射敏感性组合物，其包含：（a）其在碱性显影剂中的溶解度随着酸的作用而增加的树脂;（b）在光化反应下产生分子量为100以下的羧酸的化合物 射线或辐射线;（c）表面活性剂; 和（d）溶剂。

    Positive resist composition
    3.
    发明授权
    Positive resist composition 有权

    公开(公告)号：US06605409B2

    公开(公告)日：2003-08-12

    申请号：US09860440

    申请日：2001-05-21

    申请人： Kunihiko Kodama ,  Shinichi Kanna

    发明人： Kunihiko Kodama ,  Shinichi Kanna

    IPC分类号： G03F7004

    CPC分类号： C07D275/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

    摘要： A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.

    Positive-working radiation-sensitive composition
    4.
    发明授权
    Positive-working radiation-sensitive composition 有权
    正向辐射敏感组合物

    公开(公告)号：US06727036B2

    公开(公告)日：2004-04-27

    申请号：US09748198

    申请日：2000-12-27

    申请人： Shinichi Kanna ,  Kunihiko Kodama

    发明人： Shinichi Kanna ,  Kunihiko Kodama

    IPC分类号： G03C173

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/115

    摘要： A positive-working radiation-sensitive composition containing a resin having an acid-decomposing group having a specific acetal structure, and being decomposed by the action of an acid to increase the solubility thereof in an alkali developer; a compound generating an acid by the irradiation of an active light or radiation and contributes to the decomposition reaction of the acid-decomposing group of the resin; a compound generating an acid by the irradiation of an active light or radiation but does not contribute to the decomposition reaction of the acid-decomposing group of the resin; a surface active agent, and a solvent.

    摘要翻译： 一种正性辐射敏感性组合物，其含有具有特定缩醛结构的酸分解基团的树脂，并通过酸的作用而分解，以增加其在碱显影剂中的溶解度; 通过照射活性光或辐射而产生酸的化合物，并有助于树脂的酸分解基团的分解反应; 通过照射活性光或辐射而产生酸的化合物，但不影响树脂的酸分解基团的分解反应; 表面活性剂和溶剂。

    Positive resist composition
    5.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US07335454B2

    公开(公告)日：2008-02-26

    申请号：US10317110

    申请日：2002-12-12

    申请人： Shinichi Kanna ,  Kazuyoshi Mizutani ,  Kunihiko Kodama ,  Tomoya Sasaki

    发明人： Shinichi Kanna ,  Kazuyoshi Mizutani ,  Kunihiko Kodama ,  Tomoya Sasaki

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/115

    摘要： A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator capable of generating an acid upon irradiation of an actinic ray or radiation, and the acid generator of (B) is a compound selected from a sulfonium salt containing no aromatic ring and a compound having a phenacylsulfonium salt structure.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在聚合物骨架的主链和/或侧链中具有被氟原子取代的结构的含氟基树脂和通过酸的作用而分解的基团以增加 在碱显影剂中的溶解度和（B）能够在光化射线或辐射照射时能产生酸的酸发生剂，（B）的酸产生剂是选自不含芳环的锍盐和具有 苯甲酰锍盐结构。

    Positive photoresist composition
    6.
    发明授权
    Positive photoresist composition 有权
    正光致抗蚀剂组合物

    公开(公告)号：US06485883B2

    公开(公告)日：2002-11-26

    申请号：US09769375

    申请日：2001-01-26

    申请人： Kunihiko Kodama ,  Shinichi Kanna ,  Toshiaki Aoai

    发明人： Kunihiko Kodama ,  Shinichi Kanna ,  Toshiaki Aoai

    IPC分类号： G03F7039

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： A positive photoresist composition which comprises (A) a resin having a group which decomposes by the action of an acid to increase solubility in an alkaline developing solution, and (B) a compound which generates an aliphatic or aromatic carboxylic acid substituted with at least one fluorine atom upon irradiation with an actinic ray or radiation. The positive photoresist composition of the present invention is improved in resolution and process allowance such as exposure margin and depth of focus in a lithographic technology using a light source having a short wavelength capable of conducting the ultra fine fabrication and a chemical amplification-type positive photoresist. Further, it exhibits the excellent performance when an electron beam is used as a light source for exposure.

    摘要翻译： 一种正型光致抗蚀剂组合物，其包含（A）具有通过酸的作用分解以提高在碱性显影液中的溶解度的基团的树脂，和（B）产生被至少一个 通过光化射线或辐射照射，本发明的正性光致抗蚀剂组合物在使用具有短波长能够导电的光源的光刻技术中的分辨率和工艺容限（例如曝光余量和焦深）方面得到改善 超精细制造和化学放大型正性光致抗蚀剂。 此外，当使用电子束作为曝光用光源时，其表现出优异的性能。

    POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    9.
    发明申请
    POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 审中-公开
    正性感光性组合物及其形成图案的方法

    公开(公告)号：US20120058431A1

    公开(公告)日：2012-03-08

    申请号：US13293290

    申请日：2011-11-10

    申请人： Hyou TAKAHASHI ,  Naoya Sugimoto ,  Kunihiko Kodama ,  Kei Yamamoto

    发明人： Hyou TAKAHASHI ,  Naoya Sugimoto ,  Kunihiko Kodama ,  Kei Yamamoto

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  C08F224/00 ,  G03F7/26 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

    摘要翻译： 正型感光性组合物包括：通过酸的作用使碱性显影液中的溶解速度增加的树脂（A），含有由通式（I）表示的酸分解性重复单元的树脂（A）和酸不分解性 由通式（II）表示的重复单元; 以及能够在照射活性射线和辐射之一时产生酸的化合物（B）：其中Xa1表示氢原子，烷基，氰基和卤素原子中的一个，A1表示单键 和二价连接基团，ALG表示离去烃基的酸，Xa2表示氢原子，烷基，氰基和卤素原子中的一个，A2表示单键和二价连接基团之一，ACG 代表无酸的酸性烃基。