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41.发明申请公开(公告)号：US20120307605A1
公开(公告)日：2012-12-06
申请号：US13482065
申请日：2012-05-29
申请人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
发明人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
IPC分类号： G11B13/04
CPC分类号： G11B5/455 , G11B2005/0021
摘要： In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.
摘要翻译： 在用于检查热辅助磁记录头元件的方法和装置中，将样本安装在可在扫描探针显微镜装置的平面中移动的台上，从所述样本的渐逝光的发光部分产生ev逝光 通过在平面中移动台来检测ev逝光的散射光，同时具有探针的扫描探针显微镜的悬臂在试样的表面附近垂直振动，并且从from射光发射的ev逝光的强度分布 使用基于检测到的散射光的ev逝光的产生的位置信息来检查ev逝光的发光部分或试样的ev逝光的发光部分的表面轮廓。
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42.发明授权公开(公告)号：US08064066B2
公开(公告)日：2011-11-22
申请号：US12605089
申请日：2009-10-23
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。
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公开(公告)号：US08011230B2
公开(公告)日：2011-09-06
申请号：US12023158
申请日：2008-01-31
申请人： Masahiro Watanabe , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
发明人： Masahiro Watanabe , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
IPC分类号： G01B5/28
摘要： A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.
摘要翻译： 扫描探针显微镜，其能够执行不受样品静电荷分布影响的形状测量，其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态 通过探针和样品之间的相对扫描，进行电位调整，以消除静电电荷分布的影响，从而防止由于放电而引起的探针或样品的损伤，并实现由静电电荷分布引起的测量误差的降低。
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公开(公告)号：US07768634B2
公开(公告)日：2010-08-03
申请号：US12192578
申请日：2008-08-15
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。
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公开(公告)号：US07716970B2
公开(公告)日：2010-05-18
申请号：US11411022
申请日：2006-04-26
IPC分类号： G01B5/28
CPC分类号： G01Q60/34
摘要： The present invention provides a method of using an accurate three-dimensional shape without damaging a sample by making a probe contact the sample only at a measuring point, lifting and retracting the probe when moving to the next measuring point and making the probe approach the sample after moving to the next measuring point, wherein high frequency/minute amplitude cantilever excitation and vibration detection are performed and further horizontal direction excitation or vertical/horizontal double direction excitation are performed to improve the sensitivity of contacting force detection on a slope of steep inclination. The method uses unit for inclining the probe in accordance with the inclination of a measurement target and a structure capable of absorbing or adjusting the orientation of the light detecting the condition of contact between the probe and sample after reflection on the cantilever, which varies a great deal depending on the inclination of the probe.
摘要翻译： 本发明提供了一种使用准确的三维形状而不损害样品的方法，该方法是使探针仅在测量点接触样品，当移动到下一个测量点时提升和缩回探针并使探针接近样品 在移动到下一个测量点之后，执行高频/分钟幅度的悬臂激励和振动检测，并且执行进一步的水平方向激励或垂直/水平双向激励，以提高在陡倾斜度上的接触力检测的灵敏度。 该方法使用用于根据测量对象的倾斜度和能够吸收或调节探测器和样品之间的接触条件的光的方向来倾斜测量头的单元，其反射在悬臂上，其变化很大 取决于探头的倾斜度。
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46.发明授权Scanning probe microscope and sample observing method using this and semiconductor device production method 有权扫描探针显微镜及采用此方法的样品观察方法及半导体器件的制作方法公开(公告)号：US07562564B2
公开(公告)日：2009-07-21
申请号：US10542624
申请日：2004-01-29
CPC分类号： G01Q10/06 , G01Q10/065 , G01Q20/02 , G01Q20/04 , G01Q30/025 , G01Q30/06
摘要： A scanning probe microscope capable of measuring accurate 3-D shape information of a sample with high through-put without damaging a sample. In a method for acquiring an accurate 3-D shape of a sample without imparting damage to the sample by bringing a probe into contact at only a measurement point, once pulling up and retracting the probe when it moves towards a next measurement point, moving the probe towards the next measurement point and allowing it to approach, a deflection signal of the probe and its twist signal area analyzed so that measurement can be made at a minimum necessary retraction distance. Control for minimizing residual oscillation at the time of transverse movement is made so that a measurement frequency can be raised and high speed measurement can be accomplished.
摘要翻译： 一种扫描探针显微镜，能够测量具有高通量的样品的精确3-D形状信息而不损害样品。 在通过仅在测量点使探针接触而获取样品的3-D形状的准确性的方法中，一旦在探头向下一个测量点移动时向上和向后缩回，则移动 探测下一个测量点并使其接近，分析探头的偏转信号及其扭转信号区域，以便能够以最小必要的回缩距离进行测量。 进行用于使横向运动时的残余振荡最小化的控制，使得可以提高测量频率并且可以实现高速度测量。
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公开(公告)号：US20060124874A1
公开(公告)日：2006-06-15
申请号：US10536715
申请日：2003-11-27
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.
摘要翻译： 一种缺陷检查装置，具有：在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统，用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统，包括：用于接收从检查对象基板向上发射的上方反射/散射光的上方光检测器，从而将其转换为高定向图像信号;以及侧向光检测器， 将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向，以与照明光束平坦地相交，从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。
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公开(公告)号：US20050151077A1
公开(公告)日：2005-07-14
申请号：US11077904
申请日：2005-03-11
IPC分类号： G01B21/16 , G01B21/30 , G01Q10/00 , G01Q10/02 , G01Q10/04 , G01Q10/06 , G01Q20/00 , G01Q20/02 , G01Q30/02 , G01Q30/20 , G01Q60/24 , G01Q60/32 , H01L21/66 , G01B5/28
CPC分类号： G01Q10/06 , G01Q10/02 , G01Q20/02 , G01Q60/32 , Y10S977/852
摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.
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公开(公告)号：US09134279B2
公开(公告)日：2015-09-15
申请号：US13819355
申请日：2011-06-01
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： An internal defect inspection method where an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, the ultrasonic wave reflected by the sample is detected by an imaging type common-path interferometer as an interference signal, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal. An internal defect inspection apparatus including an ultrasonic wave transmitter, an imaging type common-path interferometer and an ultrasonic wave signal detecting device is also provided.
摘要翻译： 从超声波发射器向样品发射超声波的内部缺陷检查方法，由成像型共通干涉仪作为干扰信号检测由样品反射的超声波，从超声波信号获得超声波信号 干扰信号，并从超声波信号中检测出样本内的任何缺陷。 还提供了包括超声波发射器，成像型共轨干涉仪和超声波信号检测装置的内部缺陷检查装置。
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公开(公告)号：US08844061B2
公开(公告)日：2014-09-23
申请号：US13726764
申请日：2012-12-26
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
摘要： In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.
摘要翻译： 在测量具有陡峭侧壁的图案的情况下，当接近图案侧壁时，探针通过作用在探针和侧壁之间的范德华力附着在侧壁上，并且在测量的轮廓中发生错误 侧壁部分。 当测量具有几乎等于探针直径的槽宽度的图案时，探针粘附到两个侧壁，探针不能到达凹槽底部，并且不能测量凹槽深度。 当使用细长的探针测量微观高纵横比图案时探头粘附到图案侧壁上时，通过检测探针与图案侧壁的粘附力使探针到达侧壁底部，并暂时增加 探针和样品之间的接触力。 此外，通过利用图案的形状数据获得悬臂的扭转量的数据，通过获得的扭转量的数据来校正侧壁部分的粘附的轮廓误差。
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