公开(公告)号：US20180318866A1

公开(公告)日：2018-11-08

申请号：US16032803

申请日：2018-07-11

Applicant: United Technologies Corporation

Inventor： James W. Neal ,  Kevin W. Schlichting ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik ,  Michael J. Maloney

IPC: B05B15/62 ,  C23C14/24 ,  C23C14/50

CPC classification number: B05B15/62 ,  C23C14/24 ,  C23C14/243 ,  C23C14/505

Abstract: An embodiment of a method includes retaining a first workpiece and a second workpiece selectively on a workpiece fixture disposed within a deposition chamber. The workpiece fixture includes tooling including a first workpiece holder, a second workpiece holder, and a first hollow wall. The first workpiece is separated from the second workpiece using the first hollow wall. Energy is selectively applied and directed within the deposition chamber, from an energy source toward a first crucible, the first crucible including a plurality of walls defining an upper recess contiguous with, and disposed directly above a first lower recess, at least the upper recess open to an interior of the deposition chamber. During the step of selectively applying and directing energy, a gas valve is controlled to maintain a partial vacuum in the deposition chamber of greater than 2 Pa to control a size and overlap of at least one coating zone formed around each of the at least one workpiece.

公开(公告)号：US10106882B2

公开(公告)日：2018-10-23

申请号：US14880861

申请日：2015-10-12

Applicant: United Technologies Corporation

Inventor： James W. Neal ,  Michael J. Maloney ,  Kevin W. Schlichting ,  Eric Jorzik ,  David A. Litton ,  Brian T. Hazel

IPC: C23C14/24 ,  C23C14/30 ,  C23C14/08 ,  F01D25/00 ,  F01D25/28 ,  C23C14/00 ,  F01D5/28

Abstract: A method includes forming a multi-layered ceramic barrier coating under a chamber pressure of greater than 1 Pascals. In the method, low- and high-dopant ceramic materials are evaporated using input evaporating energies that fall, respectively, above and below a threshold for depositing the materials in a columnar microstructure (low-dopant) and in a branched columnar microstructure (high-dopant).

公开(公告)号：US20180010232A1

公开(公告)日：2018-01-11

申请号：US15712696

申请日：2017-09-22

Applicant: United Technologies Corporation

Inventor： James W. Neal ,  David A. Litton ,  Russell A. Beers ,  Benjamin Joseph Zimmerman ,  Michael J. Maloney

IPC: C23C14/04 ,  C23C14/30

CPC classification number: C23C14/042 ,  C23C14/044 ,  C23C14/30 ,  F05D2230/313

Abstract: A coating system for coating a part (10), such as a turbine blade or vane, has a mask (14) positioned adjacent to a first portion (16) of the part (10) to be coated and a mechanism (30) for moving the mask (14) relative to the part (10). The mechanism (30) may be a gear mechanism or a magnetic mechanism.

公开(公告)号：US20170145557A1

公开(公告)日：2017-05-25

申请号：US15006879

申请日：2016-01-26

Applicant: United Technologies Corporation

Inventor： James W. Neal ,  Kevin W. Schlichting ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik ,  Michael J. Maloney

IPC: C23C14/24 ,  C23C14/30

CPC classification number: C23C14/243 ,  C23C14/30

Abstract: An embodiment of an apparatus includes a deposition chamber, a workpiece fixture including a first workpiece holder, and a first crucible. The workpiece holder is configured to retain a first workpiece in the deposition chamber. The first crucible includes a body including at least one wall defining a non-circular upper recess with a base. A first lower recess is formed below the base of the upper recess and configured to retain a first primary coating feedstock therein.

公开(公告)号：US20160333465A1

公开(公告)日：2016-11-17

申请号：US15112213

申请日：2015-01-08

Applicant: UNITED TECHNOLOGIES CORPORATION

Inventor： Mladen F. Trubelja ,  David A. Litton ,  Joseph A. DePalma ,  James W. Neal ,  Michael Maloney ,  Russell A. Beers ,  Brian T. Hazel ,  Glenn A. Cotnoir

IPC: C23C14/54 ,  F01D9/04 ,  C23C14/08 ,  C23C14/24 ,  C23C14/50

CPC classification number: C23C14/542 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30 ,  C23C14/505 ,  C23C14/54 ,  F01D9/041 ,  F01D15/10 ,  F05D2220/32 ,  F05D2230/313 ,  F05D2230/90 ,  F05D2300/2118

Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Abstract translation: 一种用于物理气相沉积涂覆方法的方法包括将陶瓷涂层材料从羽状物沉积到至少一个基底上以在其上形成陶瓷涂层，并且在沉积期间，以至少一个基板以相对于 陶瓷涂层材料沉积到至少一个基底上。

公开(公告)号：US20160195272A1

公开(公告)日：2016-07-07

申请号：US14971573

申请日：2015-12-16

Applicant: United Technologies Corporation

Inventor： John S. Tu ,  Philip J. Kirsopp ,  David A. Litton ,  Mark F. Zelesky ,  Dennis M. Moura ,  Aaron S. Butler

IPC: F23R3/00 ,  C23C14/08 ,  C23C4/11 ,  C23C4/134 ,  F02C7/28 ,  C23C4/129 ,  C23C14/32 ,  F01D5/28 ,  F01D9/02 ,  C23C14/30 ,  C23C28/00

CPC classification number: F23R3/002 ,  C23C4/02 ,  C23C4/11 ,  C23C4/129 ,  C23C4/134 ,  C23C4/18 ,  C23C14/08 ,  C23C14/083 ,  C23C14/30 ,  C23C14/325 ,  F01D5/288 ,  F05D2230/90 ,  F23R3/007 ,  F23R2900/00018 ,  Y02E20/344 ,  Y02T50/672

Abstract: The present disclosure relates to methods for coating gas turbine engine components, such as combustor panels. In one embodiment, a method includes forming a first layer to a substrate to form a bond coat, and forming a second layer over the first layer. The second layer may be formed by a material having a thermal conductivity within the range of 4.45 to 30 Kcal/(m hoC). According to one or more embodiments, the first layer may be formed by at least one of a high velocity oxy-fuel (HVOF) source, an electric-arc source and low pressure plasma spraying. According to one or more embodiments, the second layer, and as a result a thermal barrier coating, may be formed by at least one of air plasma spraying, suspension plasma spraying, and electronic beam physical vapor deposition.

Abstract translation: 本公开涉及用于涂覆燃气涡轮发动机部件（例如燃烧器面板）的方法。 在一个实施方案中，一种方法包括将第一层形成至基底以形成粘合涂层，以及在第一层上形成第二层。 第二层可以由导热率在4.45至30Kcal /（m·hoC）范围内的材料形成。 根据一个或多个实施例，第一层可以由高速氧 - 燃料（HVOF）源，电弧源和低压等离子体喷涂中的至少一种形成。 根据一个或多个实施例，可以通过空气等离子体喷涂，悬浮等离子体喷涂和电子束物理气相沉积中的至少一种来形成第二层，并由此形成热障涂层。