摘要:
A vertical MOS transistor has a source region, a channel region, and a drain region that are vertically stacked, and a trench that extends from the top surface of the drain region through the drain region, the channel region, and partially into the source region. The vertical MOS transistor also has an insulation layer that lines the trench, and a conductive gate region that contacts the insulation layer to fill up the trench.
摘要:
An electrical shield is provided in a non-volatile memory (NVM) cell structure to protect the cell's floating gate from any influence resulting from charge redistribution in the vicinity of the floating gate during a programming operation. The shield may be created from the second polysilicon layer or other conductive material covering the floating gate. The shield may be grounded. Alternately, it may be connected to the cell's control gate electrode resulting in better coupling between the floating gate and the control gate. It is not necessary that the shield cover the floating gate completely, the necessary protective effect is achieved if the coupling to the dielectric layers surrounding the floating gate is reduced.
摘要:
Feedback between the floating gate voltage and a high erase voltage is utilized in the erase operation of a non-volatile memory (NVM) cell. Erasing stops when the floating gate voltage reaches the threshold voltage of the controlling transistor, making the variability of the NVM cell's threshold voltage the same as a regular device in the integrated circuit structure, thereby reducing the significant threshold voltage variability in erased NVM cells.
摘要:
A snapback ESD protection network coupled across first and second integrated circuit pads and including first and second snapback devices, such as SCR devices, with the second device having a turnoff current ITOFF which is greater than the turnoff current of the first device. Each of the snapback devices has an anode terminal and a cathode terminal, with the first device anode and cathode terminals being coupled to the respective first and second integrated circuit pads through a first effective series resistance and the second device being coupled to the respective first and second integrated circuit pads through a second effective series resistance, with the first effective series resistance being smaller than the second so as to cause the first and second snapback devices to tend to turn on at about the same time at the beginning of an ESD event. The differences in turnoff current cause the second snapback device to turn off prior to the first snapback device at the conclusion of an ESD event.
摘要:
An SCR device having a first P type region disposed in a semiconductor body and electrically connected to anode terminal of the device. At least one N type region is also disposed in the body adjacent the first P type region so as to form a PN junction having a width Wn near a surface of the semiconductor body. A further P type region is also disposed in the body to form a further PN junction with the N type region, with the junction having a width Wp near the body surface, with Wp being at least 1.5 times width Wn. A further N type region is provided which is electrically connected to a cathode terminal of the device and forming a third PN junction with the further N type region.
摘要:
A charge pump circuit in which at least one of the switching elements takes the form of a LVTSCR. The switching on and off of the LVTSCRs may be achieved by making use of a pulsed input and relying on the triggering and holding voltages of the LVTSCRs to switch on and off.
摘要:
A programming technique for a one-time-programmable non-volatile memory (NVM) utilizes a repeated programming cycle with an interval between cycles that is long enough to redistribute charge in the layers surrounding the floating gate of the cell. Each cycle programs the floating gate and also the surrounding layers. The cycling saturates in an equilibrium state when the electric field form outside to the floating gate equals zero. This technique eliminates the first stage of conventional VT drop in NVM cells and, thus, improves retention.
摘要:
A method of programming a PMOS stacked gate memory cell is provided that utilizes a sequence of control gate pulses to obtain the desired potential on the floating gate.
摘要:
The number of times that a non-volatile memory (NVM) can be programmed and erased is substantially increased by utilizing a localized heating element that anneals the oxide that is damaged by tunneling charge carriers when the NVM is programmed and erased. The program and erase voltages are also reduced when heat from the heating element is applied prior to programming and erasing.
摘要:
A method for forming a doped region of a semiconductor device includes masking a portion of a substrate with a mask. The mask is configured to create a graded doping profile within the doped region. The method also includes performing an implant using the mask to create doped areas and undoped areas in the substrate. The method further includes diffusing the doped areas to create the graded doping profile in the doped region. The mask could include a first region having openings distributed throughout a photo-resist material, where the openings vary in size and spacing. The mask could also include a second region having blocks of photo-resist material distributed throughout an open region, where the photo-resist blocks vary in size and spacing. Diffusing the doped areas could include applying a high temperature anneal to smooth the doped and undoped areas to produce a linearly graded doping profile.