Non-volatile memory (NVM) retention improvement utilizing protective electrical shield
    42.
    发明申请
    Non-volatile memory (NVM) retention improvement utilizing protective electrical shield 有权
    使用保护电气屏蔽的非易失性存储器(NVM)保持改进

    公开(公告)号:US20080213959A1

    公开(公告)日:2008-09-04

    申请号:US12012545

    申请日:2008-02-04

    IPC分类号: H01L21/336

    CPC分类号: H01L29/7881 H01L29/42324

    摘要: An electrical shield is provided in a non-volatile memory (NVM) cell structure to protect the cell's floating gate from any influence resulting from charge redistribution in the vicinity of the floating gate during a programming operation. The shield may be created from the second polysilicon layer or other conductive material covering the floating gate. The shield may be grounded. Alternately, it may be connected to the cell's control gate electrode resulting in better coupling between the floating gate and the control gate. It is not necessary that the shield cover the floating gate completely, the necessary protective effect is achieved if the coupling to the dielectric layers surrounding the floating gate is reduced.

    摘要翻译: 在非易失性存储器(NVM)单元结构中提供电屏蔽,以在编程操作期间保护电池的浮动栅极免受在浮动栅极附近的电荷再分配的任何影响。 可以从覆盖浮动栅极的第二多晶硅层或其他导电材料产生屏蔽。 屏蔽可能接地。 或者,其可以连接到电池的控制栅电极,从而在浮栅和控制栅之间形成更好的耦合。 屏蔽罩完全不需要覆盖浮动栅极,如果与围绕浮动栅极的电介质层的耦合减小,则实现必要的保护效果。

    Non-volatile memory structure and erase method with floating gate voltage control
    43.
    发明授权
    Non-volatile memory structure and erase method with floating gate voltage control 有权
    具有浮动栅极电压控制的非易失性存储器结构和擦除方法

    公开(公告)号:US07339835B1

    公开(公告)日:2008-03-04

    申请号:US11057355

    申请日:2005-02-14

    IPC分类号: G11C11/34

    CPC分类号: G11C16/14

    摘要: Feedback between the floating gate voltage and a high erase voltage is utilized in the erase operation of a non-volatile memory (NVM) cell. Erasing stops when the floating gate voltage reaches the threshold voltage of the controlling transistor, making the variability of the NVM cell's threshold voltage the same as a regular device in the integrated circuit structure, thereby reducing the significant threshold voltage variability in erased NVM cells.

    摘要翻译: 在非易失性存储器(NVM)单元的擦除操作中,利用浮栅电压和高擦除电压之间的反馈。 当浮动栅极电压达到控制晶体管的阈值电压时,擦除停止,使得NVM单元的阈值电压的变化与集成电路结构中的常规器件相同,从而降低了擦除的NVM单元中的显着阈值电压变化。

    Multistage snapback ESD protection network
    44.
    发明授权
    Multistage snapback ESD protection network 有权
    多级snapback ESD保护网络

    公开(公告)号:US07298599B1

    公开(公告)日:2007-11-20

    申请号:US10917605

    申请日:2004-08-13

    IPC分类号: H02H9/00

    CPC分类号: H01L27/0266

    摘要: A snapback ESD protection network coupled across first and second integrated circuit pads and including first and second snapback devices, such as SCR devices, with the second device having a turnoff current ITOFF which is greater than the turnoff current of the first device. Each of the snapback devices has an anode terminal and a cathode terminal, with the first device anode and cathode terminals being coupled to the respective first and second integrated circuit pads through a first effective series resistance and the second device being coupled to the respective first and second integrated circuit pads through a second effective series resistance, with the first effective series resistance being smaller than the second so as to cause the first and second snapback devices to tend to turn on at about the same time at the beginning of an ESD event. The differences in turnoff current cause the second snapback device to turn off prior to the first snapback device at the conclusion of an ESD event.

    摘要翻译: 耦合在第一和第二集成电路焊盘上并且包括第一和第二快速恢复装置(例如SCR装置)的快速恢复ESD保护网络,其中第二装置具有大于截止电流的截止电流I TOFF < 的第一个设备。 每个快速恢复装置具有阳极端子和阴极端子,其中第一器件阳极和阴极端子通过第一有效串联电阻耦合到相应的第一和第二集成电路焊盘,并且第二器件耦合到相应的第一和 第二集成电路焊盘通过第二有效串联电阻,其中第一有效串联电阻小于第二有效串联电阻,以便使得第一和第二快速恢复装置在ESD事件开始时大致同时导通。 在ESD事件结束时,截止电流之间的差异导致第二个恢复装置在第一个恢复装置之前关闭。

    Snapback clamp having low triggering voltage for ESD protection
    45.
    发明授权
    Snapback clamp having low triggering voltage for ESD protection 有权
    具有低触发电压的Snapback钳位用于ESD保护

    公开(公告)号:US07141831B1

    公开(公告)日:2006-11-28

    申请号:US10900709

    申请日:2004-07-28

    IPC分类号: H01L29/74

    CPC分类号: H01L27/0262

    摘要: An SCR device having a first P type region disposed in a semiconductor body and electrically connected to anode terminal of the device. At least one N type region is also disposed in the body adjacent the first P type region so as to form a PN junction having a width Wn near a surface of the semiconductor body. A further P type region is also disposed in the body to form a further PN junction with the N type region, with the junction having a width Wp near the body surface, with Wp being at least 1.5 times width Wn. A further N type region is provided which is electrically connected to a cathode terminal of the device and forming a third PN junction with the further N type region.

    摘要翻译: 一种SCR器件,其具有设置在半导体本体中并与该器件的阳极端子电连接的第一P型区域。 至少一个N型区域也设置在与第一P型区域相邻的本体中,以便形成在半导体本体的表面附近具有宽度Wn的PN结。 另外的P型区域还设置在主体中以与N型区域形成另外的PN结,其中接合部在身体表面附近具有宽度Wp,Wp为宽度Wn的至少1.5倍。 提供另外的N型区域,其电连接到器件的阴极端子,并与另外的N型区域形成第三PN结。

    Retention improvement technique for one time programmable non-volatile memory
    47.
    发明授权
    Retention improvement technique for one time programmable non-volatile memory 有权
    一次性可编程非易失性存储器的保留改进技术

    公开(公告)号:US06982907B1

    公开(公告)日:2006-01-03

    申请号:US11044965

    申请日:2005-01-27

    IPC分类号: G11C16/04

    CPC分类号: G11C16/10 G11C2216/26

    摘要: A programming technique for a one-time-programmable non-volatile memory (NVM) utilizes a repeated programming cycle with an interval between cycles that is long enough to redistribute charge in the layers surrounding the floating gate of the cell. Each cycle programs the floating gate and also the surrounding layers. The cycling saturates in an equilibrium state when the electric field form outside to the floating gate equals zero. This technique eliminates the first stage of conventional VT drop in NVM cells and, thus, improves retention.

    摘要翻译: 用于一次性可编程非易失性存储器(NVM)的编程技术利用重复的编程周期,其周期之间的间隔足够长以重新分布围绕该单元的浮动栅极的层中的电荷。 每个循环都对浮动门和周围的层进行编程。 当电场外部到浮动门等于零时,循环饱和状态处于平衡状态。 这种技术消除了NVM单元中常规VT下降的第一阶段,从而改善了保留。

    Method of forming a region of graded doping concentration in a semiconductor device and related apparatus
    50.
    发明授权
    Method of forming a region of graded doping concentration in a semiconductor device and related apparatus 有权
    在半导体器件和相关装置中形成渐变掺杂浓度区域的方法

    公开(公告)号:US07964485B1

    公开(公告)日:2011-06-21

    申请号:US12589417

    申请日:2009-10-23

    IPC分类号: H01L21/22

    摘要: A method for forming a doped region of a semiconductor device includes masking a portion of a substrate with a mask. The mask is configured to create a graded doping profile within the doped region. The method also includes performing an implant using the mask to create doped areas and undoped areas in the substrate. The method further includes diffusing the doped areas to create the graded doping profile in the doped region. The mask could include a first region having openings distributed throughout a photo-resist material, where the openings vary in size and spacing. The mask could also include a second region having blocks of photo-resist material distributed throughout an open region, where the photo-resist blocks vary in size and spacing. Diffusing the doped areas could include applying a high temperature anneal to smooth the doped and undoped areas to produce a linearly graded doping profile.

    摘要翻译: 用于形成半导体器件的掺杂区域的方法包括用掩模掩蔽衬底的一部分。 掩模被配置为在掺杂区域内产生渐变掺杂分布。 该方法还包括使用掩模执行植入物以在衬底中产生掺杂区域和未掺杂区域。 该方法还包括扩散掺杂区域以在掺杂区域中产生渐变掺杂分布。 掩模可以包括具有分布在整个光致抗蚀剂材料中的开口的第一区域,其中开口的尺寸和间隔变化。 掩模还可以包括具有分布在整个开放区域中的光致抗蚀剂材料块的第二区域,其中光刻胶块的尺寸和间距变化。 扩散掺杂区域可以包括施加高温退火以使掺杂和未掺杂区域平滑以产生线性渐变的掺杂分布。