Chemically resistant glass composition for the manufacture of glass reinforcing strands
    43.
    发明授权
    Chemically resistant glass composition for the manufacture of glass reinforcing strands 有权
    用于制造玻璃增强线的耐化学玻璃组合物

    公开(公告)号:US09212086B2

    公开(公告)日:2015-12-15

    申请号:US12446778

    申请日:2007-10-25

    CPC classification number: C03C13/00 C03C3/078 C03C4/20 C03C13/002 C08K7/14

    Abstract: The present invention relates to a chemically resistant glass composition for the production of reinforcing strands which comprises the following constituents within the limits defined below, expressed in mol %: SiO2 67-72%; ZrO2 5-9.5%, preferably ≧7.5%; R2O (R=Na, K and Li) 11-17%; Li2O 0-5.5%; K2O 0-5.5%; Na2O

    Abstract translation: 本发明涉及一种用于生产增强线材的耐化学腐蚀性玻璃组合物,其包含下列限定的以下成分,以摩尔%表示:SiO 2 67-72%; ZrO 2为5-9.5%,优选为≥7.5%。 R2O(R = Na,K和Li)11-17%; Li2O 0-5.5%; K2O 0-5.5%; Na2O <10%; 和CaO 3-9%,该组合物还含有少于1%的杂质(Al 2 O 3,Fe 2 O 3,Cr 2 O 3,TiO 2,MgO,SrO,BaO和P 2 O 5)并且不含F。它还涉及由该组合物获得的玻璃丝 以及基于含有这种链的有机或无机材料的复合材料。

    Multi-layer effect pigment
    45.
    发明授权
    Multi-layer effect pigment 有权
    多层效果颜料

    公开(公告)号:US08007583B2

    公开(公告)日:2011-08-30

    申请号:US11056560

    申请日:2005-02-12

    Abstract: A multilayer effect pigment includes a transparent substrate, a layer of high refractive index material on the substrate, and alternating layers of low refractive index and high refractive index materials on the first layer, the total number of layers being an odd number of at least three, all adjacent layers differing in refractive index by at least about 0.2 and at least one of the layers having an optical thickness which is different from all of the other layers. The resulting multilayer effect pigment is not a quarter-wave stack. The present effect pigments may be used in cosmetic and industrial applications.

    Abstract translation: 多层效应颜料包括透明基材,基材上的高折射率材料层和第一层上低折射率和高折射率材料的交替层,总层数为奇数至少三 ,折射率不同至少约0.2的所有相邻层和至少一层具有与所有其它层不同的光学厚度。 所得到的多层效应颜料不是四分之一波长叠层。 本效果颜料可用于化妆品和工业应用中。

    Settable mixture containing lime, a cementitious composition and a polymer
    46.
    发明授权
    Settable mixture containing lime, a cementitious composition and a polymer 有权
    含石灰,水泥组合物和聚合物的可混合混合物

    公开(公告)号:US07803853B2

    公开(公告)日:2010-09-28

    申请号:US10584869

    申请日:2004-12-03

    Abstract: The present invention refers to a settable mixture comprising (i) a water absorbing composition and (ii) an aqueous emulsion of organic polymer or (iii) dispersible organic polymer, wherein the water absorbing composition (i) contains inorganic ingredients which are capable to react with water and the water absorbing composition (i) contains at least 13 weight % lime and at least 5 weight % of a cementitious composition of which components form ettringite during the absorption of water and wherein the amount of the aqueous emulsion of organic polymer (ii) in relation to (i) is such as to provide a ratio of combined weight of polymer solids to combined weight of ingredients which are capable to react with water of from 0.5:1 to 10:1, preferably 1:1 to 4:1 and wherein the amount of dispersible organic polymer (iii) in relation to (i) is such as to give a ratio of combined weight of polymers to combined weight of ingredients which are capable to react with water of from 0.5:1 to 10:1, preferably 1:1 to 4:1.

    Abstract translation: 本发明涉及一种可固化混合物,其包含(i)吸水组合物和(ii)有机聚合物的水乳液或(iii)可分散有机聚合物,其中吸水组合物(i)含有能够反应的无机成分 其中水和吸水组合物(i)含有至少13重量%的石灰和至少5重量%的水泥组合物,其中组分在吸收水中形成钙矾石,并且其中有机聚合物的水乳液的量(ii )相对于(i)提供聚合物固体的组合重量与能够与水反应的成分的组合重量比为0.5:1至10:1,优选1:1至4:1的比例 并且其中与(i)相关的可分散有机聚合物(iii)的量使得聚合物的组合重量与能够与水反应的成分的组合重量比为0.5:1至10:1 ,前 优选为1:1至4:1。

    Method of producing Mn alloy sputtering target and Mn alloy sputtering target produced through the production method
    49.
    发明申请
    Method of producing Mn alloy sputtering target and Mn alloy sputtering target produced through the production method 审中-公开
    通过该制造方法制造Mn合金溅射靶和Mn合金溅射靶的方法

    公开(公告)号:US20050181955A1

    公开(公告)日:2005-08-18

    申请号:US11036552

    申请日:2005-01-14

    Applicant: Kazuteru Kato

    Inventor: Kazuteru Kato

    CPC classification number: C23C14/3414

    Abstract: The provided is a producing technology for an Mn alloy sputtering target having low contents of impurity components such as oxygen, carbon and nitrogen and controlled crystal conformation. The present invention is characterized by the production steps of: adding deoxidant comprising elements having stronger affinity for oxygen than that of Mn to Mn; subjecting the Mn to a deoxidization-melting treatment in a fire-resistant crucible to prepare low-oxygen Mn, in which Mn is melted until oxide of the added deoxidant floats in the Mn molten metal; mixing the low-oxygen Mn with constituent metals of a sputtering target by respective predetermined amounts; adding further the deoxidant to the mixture; vacuum melting the mixture; and subjecting the mixture to a casting treatment.

    Abstract translation: 提供了一种用于Mn合金溅射靶的制造技术,其具有低含量的杂质成分如氧,碳和氮以及受控的晶体构象。 本发明的特征在于:添加包含对氧的亲和性高于Mn至Mn的元素的脱氧剂; 在耐火坩埚中对Mn进行脱氧熔融处理,制备低Mn Mn,其中Mn被熔化,直到氧化物在Mn熔融金属中漂浮; 将低氧Mn与溅射靶的组成金属混合各自的预定量; 将脱氧剂进一步添加到混合物中; 真空熔化混合物; 并对混合物进行铸造处理。

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