公开(公告)号：US20070052940A1

公开(公告)日：2007-03-08

申请号：US11516050

申请日：2006-09-06

Applicant: Koen Jacobus Zaal ,  Antonius De Kort ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Hermen Pen

Inventor： Koen Jacobus Zaal ,  Antonius De Kort ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Hermen Pen

IPC: G03B27/42

CPC classification number: G03F7/70633 ,  G03F7/70341 ,  G03F7/7045 ,  G03F7/70458

Abstract: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.

Abstract translation: 在浸没式光刻设备的叠加性能的校准中，使用例如正常和反向蜿蜒进行的曝光获得两组覆盖数据。 然后可以使用两个数据集来消除由于衬底冷却引起的影响。

公开(公告)号：US20060172507A1

公开(公告)日：2006-08-03

申请号：US11317241

申请日：2005-12-27

Applicant: Keith Best ,  Geoffrey Phillipps ,  Franciscus Casper Bijnen ,  Enno Den Brink ,  Henricus Maria Van Buel ,  Joseph Consolini ,  Peter Berge

Inventor： Keith Best ,  Geoffrey Phillipps ,  Franciscus Casper Bijnen ,  Enno Den Brink ,  Henricus Maria Van Buel ,  Joseph Consolini ,  Peter Berge

IPC: H01L21/30

CPC classification number: H01L25/50 ,  B81C3/001 ,  G03F9/7084 ,  H01L24/26 ,  H01L24/83 ,  H01L2224/8385 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01041 ,  H01L2924/01061 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01082 ,  H01L2924/01087 ,  H01L2924/07802 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/00

Abstract: A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.

Abstract translation: 基板接合系统具有用于分别保持第一基板和第二基板的第一和第二基板台，以及控制器。 第一衬底包括具有第一接触焊盘的第一器件，而第二衬底具有第二接触焊盘的第二器件。 晶片接合系统布置成以第一和第二器件形成电路的方式结合第一和​​第二器件。 第一和第二衬底台各自包括位置传感器，其布置成分别测量在第一和第二衬底的对准标记上产生的光信号。 第一和第二衬底台包括分别设置成改变相应衬底台的位置和取向的第一和第二致动器。

公开(公告)号：US20040160588A1

公开(公告)日：2004-08-19

申请号：US10684826

申请日：2003-10-15

Applicant: ASML Netherlands B. V.

Inventor： Heine Melle Mulder ,  Marco H. P. Moers

IPC: G03B027/54

CPC classification number: G03F7/70941

Abstract: A system and method for determining the stray radiation condition of a projection system, is presented herein. The invention comprises providing a detector with a detector aperture coincident with the image plane of the projection system, and measuring of a reference parameter in accordance with the projection beam intensity. The invention also comprises measuring a stray radiation parameter of an image of an isolated feature, formed by the projection system, and calculating a coefficient representative of the stray radiation condition of the projection system based on the measured stray radiation parameter and the reference parameter. The extent of the detector aperture fits within the extent of a notional shape, which is defined by first scaling down the shape of the feature by the magnification factor of the projection system, and by subsequently displacing each line element constituting the edge of the scaled down shape, parallel to itself, over a distance of at least null/NA in a direction perpendicular to that line element. The invention further comprises positioning the detector aperture within the image of the isolated feature.

Abstract translation: 本文提出了一种用于确定投影系统的杂散辐射条件的系统和方法。 本发明包括提供具有与投影系统的图像平面重合的检测器孔的检测器，以及根据投影束强度测量参考参数。 本发明还包括测量由投影系统形成的孤立特征的图像的杂散辐射参数，并且基于测量的杂散辐射参数和参考参数来计算代表投影系统的杂散辐射条件的系数。 检测器孔的范围适合于通过首先按照投影系统的放大系数缩小特征的形状，并且随后将构成缩小的边缘的每个线元素移位的概念形状的范围 形状，平行于其自身，在垂直于该线元件的方向上至少为λ/ NA的距离。 本发明还包括将检测器孔定位在隔离特征的图像内。

公开(公告)号：US20250053106A1

公开(公告)日：2025-02-13

申请号：US18721718

申请日：2022-12-14

Applicant: ASML Netherlands B,V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F9/00

Abstract: Disclosed is an apparatus for and method of using local alignment position deviation parameters for alignment marks on a semiconductor wafer wherein the parameters are used to generate one or more values indicating a condition of the alignment marks, which values may be used to obtain an wafer grid model having an improved fit.

公开(公告)号：US20240412067A1

公开(公告)日：2024-12-12

申请号：US18808844

申请日：2024-08-19

Applicant: ASML Netherlands B. V.

Inventor： Lorenzo TRIPODI ,  Patrick WARNAAR ,  Grzegorz GRZELA ,  Mohammadreza HAJIAHMADI ,  Farzad FARHADZADEH ,  Patricius Aloysius Jacobus TINNEMANS ,  Scott Anderson MIDDLEBROOKS ,  Adrianus Cornelis Matheus KOOPMAN ,  Frank STAALS ,  Brennan PETERSON ,  Anton Bernhard VAN OOSTEN

IPC: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/00

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.

公开(公告)号：US20240142885A1

公开(公告)日：2024-05-02

申请号：US18533662

申请日：2023-12-08

Applicant: ASML NETHERLANDS B. V.

Inventor： Sander Jeroen HERMANUSSEN ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Hans BUTLER ,  Bas JANSEN ,  Michael Marinus Anna STEUR

IPC: G03F7/00 ,  H01L21/687

CPC classification number: G03F7/70725 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68785

Abstract: An object table configured to hold an object on a holding surface, the object table including: a main body; a plurality of burls extending from the main body, end surfaces of the burls defining the holding surface; an actuator assembly; and a further actuator assembly, wherein the actuator assembly is configured to deform the main body to generate a long stroke out-of-plane deformation of the holding surface based on shape information of the object that is to be held and the further actuator assembly is configured to generate a short stroke out-of-plane deformation of the holding surface.

公开(公告)号：US11960215B2

公开(公告)日：2024-04-16

申请号：US17282871

申请日：2019-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Vahid Mohammadi ,  Yassin Chowdhury ,  Pieter Cristiaan De Groot ,  Wouter Joep Engelen ,  Marcel Johannes Petrus Theodorus Van Der Hoorn

IPC: H01L31/18 ,  G03F7/00 ,  H01L31/02 ,  H01L31/0216

CPC classification number: G03F7/7085 ,  H01L31/02019 ,  H01L31/02161 ,  H01L31/02164 ,  H01L31/1868

Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.

公开(公告)号：US11628498B2

公开(公告)日：2023-04-18

申请号：US17587236

申请日：2022-01-28

Applicant: ASML NETHERLANDS B. V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: B22F7/06 ,  G03F7/20 ,  B23K26/354 ,  B23K26/342 ,  B22F10/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20220152703A1

公开(公告)日：2022-05-19

申请号：US17587236

申请日：2022-01-28

Applicant: ASML NETHERLANDS B. V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20210107061A1

公开(公告)日：2021-04-15

申请号：US17132084

申请日：2020-12-23

Applicant: ASML NETHERLANDS B. V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  G03F7/20 ,  B05D5/00 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  B05D3/06 ,  B22F10/00

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.