Method and apparatus for plasma processing
    51.
    发明授权
    Method and apparatus for plasma processing 失效
    等离子体处理方法和装置

    公开(公告)号:US07601619B2

    公开(公告)日:2009-10-13

    申请号:US11887821

    申请日:2006-04-04

    摘要: A method and an apparatus for plasma processing which can accurately monitor an ion current applied to the surface of a sample. Predetermined gas is exhausted via an exhaust port by a turbo-molecular pump while introducing the gas within the vacuum chamber from a gas supply device, and the pressure within the vacuum chamber is kept at a predetermined value by a pressure regulating valve. A high-frequency power supply for a plasma source supplies a high-frequency power to a coil provided near a dielectric window to generate inductively coupled plasma within the vacuum chamber. A high-frequency power supply for the sample electrode for supplying the high-frequency power to the sample electrode is provided. A matching circuit for the sample electrode and a high-frequency sensor are provided between the sample electrode high-frequency power supply and the sample electrode. An ion current applied to the surface of a sample can be accurately monitored buy using the high-frequency sensor and an arithmetic device.

    摘要翻译: 一种用于等离子体处理的方法和装置,其可以精确地监测施加到样品表面的离子电流。 通过涡轮分子泵通过排气口排出预定气体,同时从气体供给装置引入真空室内的气体,并通过压力调节阀将真空室内的压力保持在预定值。 用于等离子体源的高频电源为设置在电介质窗附近的线圈提供高频电力,以在真空室内产生电感耦合等离子体。 提供了用于向样品电极提供高频电力的样品电极的高频电源。 在样品电极高频电源和样品电极之间设置用于样品电极和高频传感器的匹配电路。 使用高频传感器和运算装置,可以精确地监视施加到样品表面的离子电流。

    IMPURITY INTRODUCING APPARATUS AND IMPURITY INTRODUCING METHOD
    52.
    发明申请
    IMPURITY INTRODUCING APPARATUS AND IMPURITY INTRODUCING METHOD 失效
    引进设备和引进方法的引入

    公开(公告)号:US20080166861A1

    公开(公告)日:2008-07-10

    申请号:US12057117

    申请日:2008-03-27

    IPC分类号: H01L21/26

    摘要: It is an object to prevent functions expected originally from being unexhibited when impurities to be introduced into a solid sample are mixed with each other, and to implement plasma doping with high precision. In order to distinguish impurities which may be mixed from impurities which should not be mixed, first of all, an impurity introducing mechanism of a core is first distinguished. In order to avoid a mixture of the impurities in very small amounts, a mechanism for delivering a semiconductor substrate to be treated and a mechanism for removing a resin material to be formed on the semiconductor substrate are used exclusively.

    摘要翻译: 当将待引入固体样品的杂质相互混合并且以高精度实现等离子体掺杂时,本发明的目的是防止最初预期的功能不被阻止。 为了区分可能与不混合的杂质混合的杂质,首先首先区分芯的杂质引入机理。 为了避免非常少量的杂质的混合,专门使用用于输送待处理的半导体衬底的机构和用于去除在半导体衬底上形成的树脂材料的机构。

    METHOD FOR INTRODUCING IMPURITIES AND APPARATUS FOR INTRODUCING IMPURITIES
    53.
    发明申请
    METHOD FOR INTRODUCING IMPURITIES AND APPARATUS FOR INTRODUCING IMPURITIES 失效
    引进污染物的方法和引进污染物的方法

    公开(公告)号:US20080160728A1

    公开(公告)日:2008-07-03

    申请号:US12040476

    申请日:2008-02-29

    IPC分类号: H01L21/265

    摘要: A method for introducing impurities includes a step for forming an amorphous layer at a surface of a semiconductor substrate, and a step for forming a shallow impurity-introducing layer at the semiconductor substrate which has been made amorphous, and an apparatus used therefore. Particularly, the step for forming the amorphous layer is a step for irradiating plasma to the surface of the semiconductor substrate, and the step for forming the shallow impurity-introducing layer is a step for introducing impurities into the surface which has been made amorphous.

    摘要翻译: 用于引入杂质的方法包括在半导体衬底的表面形成非晶层的步骤,以及在半导体衬底上形成非晶化的浅杂质引入层的步骤以及因此使用的装置。 特别地,用于形成非晶层的步骤是用于将等离子体照射到半导体衬底的表面的步骤,并且用于形成浅掺杂杂质的层的步骤是将杂质引入已经被制成无定形的表面的步骤。

    Method for introducing impurities and apparatus for introducing impurities
    55.
    发明申请
    Method for introducing impurities and apparatus for introducing impurities 失效
    引入杂质的方法和引入杂质的装置

    公开(公告)号:US20070254460A1

    公开(公告)日:2007-11-01

    申请号:US11819567

    申请日:2007-06-28

    IPC分类号: H01L21/00

    摘要: A method for introducing impurities includes a step for forming an amorphous layer at a surface of a semiconductor substrate, and a step for forming a shallow impurity-introducing layer at the semiconductor substrate which has been made amorphous, and an apparatus used therefore. Particularly, the step for forming the amorphous layer is a step for irradiating plasma to the surface of the semiconductor substrate, and the step for forming the shallow impurity-introducing layer is a step for introducing impurities into the surface which has been made amorphous.

    摘要翻译: 用于引入杂质的方法包括在半导体衬底的表面形成非晶层的步骤,以及在半导体衬底上形成非晶化的浅杂质引入层的步骤以及因此使用的装置。 特别地,用于形成非晶层的步骤是用于将等离子体照射到半导体衬底的表面的步骤,并且用于形成浅掺杂杂质的层的步骤是将杂质引入已经被制成无定形的表面的步骤。

    Storage containers for lithography mask and method of use
    56.
    发明授权
    Storage containers for lithography mask and method of use 失效
    光刻掩模用储存容器及使用方法

    公开(公告)号:US06813005B2

    公开(公告)日:2004-11-02

    申请号:US10364282

    申请日:2003-02-10

    申请人: Cheng Guo

    发明人: Cheng Guo

    IPC分类号: G03B2762

    摘要: A container is provided for storing a lithographic printing mask. A first container section is formed of a sturdy material which defines a central inner recess area that is shaped to house a mask and to hold outer edges of a mask without touching a pattern on the mask. A second identical container section is placed against the first container section with a mask housed within recesses of, both to form a container which has a common pressure level all around and therein. A higher pressure level is then applied outside the container causes the first and second sections of the container to be held together. To remove the mask from the container, the pressure outside the container is reduced to substantially the pressure level inside the container and the first and second sections are pulled apart.

    摘要翻译: 提供了用于存储平版印刷掩模的容器。 第一容器部分由坚固的材料形成,该材料限定了中心内部凹陷区域,该中心内部凹陷区域被成形为容纳掩模并且保持掩模的外边缘而不接触掩模上的图案。 将第二相同的容器部分放置在第一容器部分上,其中容纳在其中的凹部内的掩模,以形成其周围和内部具有共同的压力水平的容器。 然后在容器外部施加较高的压力水平,使容器的第一和第二部分保持在一起。 为了从容器中取出掩模,容器外部的压力降低到容器内的基本上的压力水平,并且第一和第二部分被拉开。

    Process for preparing antihistamine tannates
    57.
    发明授权
    Process for preparing antihistamine tannates 失效
    制备抗组胺药丹宁酸的方法

    公开(公告)号:US5663415A

    公开(公告)日:1997-09-02

    申请号:US671604

    申请日:1996-06-28

    IPC分类号: C07C209/82 C07C69/88

    CPC分类号: C07C209/82

    摘要: A process for preparing pure antihistamine tannate compositions. The antihistamine in the form of its free base is contacted with tannic acid in the presence of water for a period of time of about 5 minutes to 4 hours and at a maximum temperature such that not more than about 5 wt. % of the antihistamine tannate will be decomposed. Water is removed from the antihistamine tannate by freeze-drying.

    摘要翻译: 制备纯的抗组胺药单宁组合物的方法。 其游离碱形式的抗组胺剂在水存在下与丹宁酸接触约5分钟至4小时,最高温度不超过约5重量%。 抗组氨酸丹宁酸的百分比将分解。 通过冷冻干燥将抗氧化剂组合物去除水。

    Two-component chemiluminescent composition
    58.
    发明授权
    Two-component chemiluminescent composition 失效
    双组分化学发光组合物

    公开(公告)号:US5597517A

    公开(公告)日:1997-01-28

    申请号:US640069

    申请日:1996-04-30

    IPC分类号: C09K11/07 C09K3/00

    CPC分类号: C09K11/07

    摘要: A chemiluminescent composition comprising an oxalate component comprising an oxalate ester and a solvent, an activator component comprising a peroxide compound and a catalyst and a fluorescer contained in the oxalate component and/or the activator component. The solvent contained in the oxalate component comprises a propylene glycol dihydrocarbyl ether containing one to three propylene moieties and each hydrocarbyl moiety contains up to 8 carbon atoms and is independently selected from the group consisting of straight chain alkyl, branched chain alkyl, cycloalkyl, aryl, alkaryl and aralkyl groups.

    摘要翻译: 一种化学发光组合物,其包含草酸酯组分和溶剂的草酸盐组分,包含过氧化物化合物的活化剂组分和包含在草酸盐组分和/或活化剂组分中的催化剂和荧光剂。 草酸酯组分中所含的溶剂包含含有一至三个丙烯部分的丙二醇二烃基醚,每个烃基部分含有至多8个碳原子,独立地选自直链烷基,支链烷基,环烷基,芳基, 烷芳基和芳烷基。

    Target device for toy gun
    60.
    发明授权

    公开(公告)号:US09651344B1

    公开(公告)日:2017-05-16

    申请号:US15161270

    申请日:2016-05-22

    发明人: Chih-Wei Chiu

    摘要: A target device for toy gun comprises a control circuit board, an isolation net, a metal sensing board, a first buffering board, a display board, and a second buffering board. The control circuit board is arranged inside an upper cover of a box. The isolation net is arranged at a front side of the control circuit board. The metal sensing board is arranged at a front side of the isolation net and electrically connected with the control circuit board. The first buffering board is arranged at a front side of the metal sensing board. The display board is arranged at a front side of the first buffering board and electrically connected to the metal sensing board and the control circuit board. The display board may display scores, flash lights, make a sound, and display numeral indications. The second buffering board is arranged at a front side of the display board.