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    Method and apparatus for inspecting foreign particles on real time basis in semiconductor mass production line
    52.
    发明授权
    Method and apparatus for inspecting foreign particles on real time basis in semiconductor mass production line 失效
    半导体批量生产线实时检测外来颗粒的方法和装置

    公开(公告)号：US5274434A

    公开(公告)日：1993-12-28

    申请号：US778363

    申请日：1991-10-17

    Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Yuzo Taniguchi

    Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Yuzo Taniguchi

    IPC: G01N21/94 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68 ,  G01N21/89 ,  G02B27/46 ,  G06F15/46

    CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01R31/308 ,  H01J37/00 ,  H01L21/67253 ,  H01L21/67276 ,  H01L21/67288 ,  H01L22/20 ,  G01N2021/8822 ,  G01N21/95623 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L22/12

    Abstract: In a mass production line of a semiconductor manufacturing process, foreign particle inspection method and apparatus for preventing occurrence of large quantities of defects and for keeping a necessary yield. The inspection apparatus is made up in a small-sized apparatus and disposed at inlet/outlet of processing apparatuses of the production line or to a transfer system between the processing apparatuses. The inspection apparatus includes at least one monitor for real-time sampling foreign particles possible deposited on wafer which is being carried by the transfer system, thereby enabling simplification in construction of the production line and reduction of manufacturing cost. The inspection apparatus may comprise a refractive index changeable type lens array, a spatial filter and a pattern data elimination circuit, and makes possible to conduct foreign particle inspection on repetitively-patterned portions of the wafers during transfer. With the spatial filter for eliminating repetitive data of the repetition patterns the small-sized compact inspection apparatus is capable of real-time inspecting the foreign particles on the wafers at a high speed.

    Abstract translation: 在半导体制造方法的大规模生产线中，用于防止发生大量缺陷并保持必要成品率的外来颗粒检查方法和装置。 检查装置由小型装置构成，配置在生产线的处理装置的出入口处或处理装置之间的转印系统。 该检查装置包括至少一个监视器，用于实时采样可能沉积在由转印系统携带的晶片上的异物，从而能够简化生产线的构造和降低制造成本。 检查装置可以包括折射率可变型透镜阵列，空间滤光器和图案数据消除电路，并且可以在转印期间对晶片的重复构图部分进行异物检查。 利用用于消除重复图案的重复数据的空间滤波器，小型紧凑型检查装置能够以高速实时检查晶片上的异物。

    Focusing position detecting device in optical magnifying and observing apparatus
    54.
    发明授权
    Focusing position detecting device in optical magnifying and observing apparatus 失效
    聚焦位置检测装置在光学放大和观察装置中

    公开(公告)号：US4433235A

    公开(公告)日：1984-02-21

    申请号：US310240

    申请日：1981-10-09

    Applicant: Nobuyuki Akiyama ,  Yoshimasa Ohshima ,  Mitsuyoshi Koizumi

    Inventor： Nobuyuki Akiyama ,  Yoshimasa Ohshima ,  Mitsuyoshi Koizumi

    IPC: G02B21/24 ,  G01J1/20 ,  G01J1/32

    CPC classification number: G02B21/245

    Abstract: A focusing position detecting device in which a laser beam is directed through an objective lens toward the surface of an object to form a minute spot on the surface of the object, and the beam reflected from the surface of the object is led through the objective lens again toward a concentrating point, so as to detect the focusing position of the objective lens by measuring the position of the concentrating point. In the device, a photoelectric element is provided to detect the intensity of the reflected beam, and the intensity of the laser beam is so controlled that the output of the photoelectric element is maintained constant.

    Abstract translation: 一种聚焦位置检测装置，其中激光束被引导通过物镜朝向物体的表面，以在物体的表面上形成微小的点，并且从物体的表面反射的光束被引导通过物镜 再次朝向集中点，以便通过测量集中点的位置来检测物镜的聚焦位置。 在该装置中，设置光电元件以检测反射光束的强度，并且控制激光束的强度使得光电元件的输出保持恒定。

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