公开(公告)号：US11670482B2

公开(公告)日：2023-06-06

申请号：US17037935

申请日：2020-09-30

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Rutger Meyer Timmerman Thijssen

IPC: H01J37/305 ,  H01J37/12 ,  G02B6/136 ,  H01J37/147 ,  H01J37/20 ,  G02B6/12

CPC classification number: H01J37/3053 ,  G02B6/136 ,  H01J37/12 ,  H01J37/1478 ,  H01J37/20 ,  H01J37/3056 ,  G02B2006/12107 ,  H01J2237/1507 ,  H01J2237/3174

Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.

公开(公告)号：US11587778B2

公开(公告)日：2023-02-21

申请号：US17088443

申请日：2020-11-03

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Joseph C. Olson ,  Frank Sinclair ,  Peter F. Kurunczi

IPC: H01J49/36 ,  H01J49/06 ,  H01J37/317 ,  H01J49/10

Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.

公开(公告)号：US11512385B2

公开(公告)日：2022-11-29

申请号：US16715906

申请日：2019-12-16

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen ,  Morgan Evans ,  Jinxin Fu

IPC: G03F7/20 ,  C23C14/22 ,  G02B5/18 ,  G03F7/00 ,  G03F7/16 ,  F21V8/00

Abstract: Embodiments of the disclosure generally relate to methods of forming gratings. The method includes depositing a resist material on a grating material disposed over a substrate, patterning the resist material into a resist layer, projecting a first ion beam to the first device area to form a first plurality of gratings, and projecting a second ion beam to the second device area to form a second plurality of gratings. Using a patterned resist layer allows for projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area.

公开(公告)号：US20220139691A1

公开(公告)日：2022-05-05

申请号：US17088443

申请日：2020-11-03

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Joseph C. Olson ,  Frank Sinclair ,  Peter F. Kurunczi

IPC: H01J49/36 ,  H01J49/10 ,  H01J49/06

Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.

公开(公告)号：US20220100078A1

公开(公告)日：2022-03-31

申请号：US17032520

申请日：2020-09-25

Applicant: Applied Materials, Inc.

Inventor： M. Arif Zeeshan ,  Ross Bandy ,  Peter F. Kurunczi ,  Shantanu Kallakuri ,  Thomas Soldi ,  Joseph C. Olson

IPC: G03F1/36 ,  G03F1/80 ,  G03F1/70 ,  G03F1/74

Abstract: Methods and devices for producing substrates with variable height features are provided. In one example, a proximity mask may include a plate positioned over a substrate, wherein at least a portion of the plate is separated from the substrate by a distance. The plate may include a first opening and a second opening, wherein the first opening is defined by a first perimeter having a first shape, wherein the second opening is defined by a second perimeter having a second shape, and wherein the first shape is different than the second shape.

公开(公告)号：US11226439B2

公开(公告)日：2022-01-18

申请号：US16228205

申请日：2018-12-20

Applicant: APPLIED Materials, Inc.

Inventor： Joseph C. Olson ,  Ludovic Godet ,  Costel Biloiu

IPC: G02B5/18 ,  G02B6/136

Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.

公开(公告)号：US11195703B2

公开(公告)日：2021-12-07

申请号：US16682888

申请日：2019-11-13

Applicant: APPLIED Materials, Inc.

Inventor： Peter F. Kurunczi ,  Morgan Evans ,  Joseph C. Olson

IPC: H01J37/32 ,  G02B5/18 ,  H01J37/147

Abstract: A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane.

公开(公告)号：US20210305011A1

公开(公告)日：2021-09-30

申请号：US16828218

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Jonathan Gerald England ,  Joseph C. Olson

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/317 ,  H01J37/141

Abstract: A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.

公开(公告)号：US11119405B2

公开(公告)日：2021-09-14

申请号：US16159059

申请日：2018-10-12

Applicant: APPLIED Materials, Inc.

Inventor： Morgan Evans ,  Joseph C. Olson ,  Rutger Meyer Timmerman Thijssen

IPC: G03F7/09 ,  G03F7/11 ,  H01L21/3213 ,  G03F1/80 ,  G03F7/20

Abstract: A method of forming angled structures in a substrate. The method may include the operation of forming a mask by etching angled mask features in a mask layer, disposed on a substrate base of the substrate, the angled mask features having sidewalls, oriented at a non-zero angle of inclination with respect to perpendicular to a main surface of the substrate. The method may include etching the substrate with the mask in place, the etching comprising directing ions having trajectories arranged at a non-zero angle of incidence with respect to a perpendicular to the main surface.

公开(公告)号：US20210257179A1

公开(公告)日：2021-08-19

申请号：US16789591

申请日：2020-02-13

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Thomas Soldi ,  Rutger Meyer Timmerman Thijssen ,  Maurice Emerson Peploski

IPC: H01J37/08 ,  H01J37/305 ,  H01J37/20 ,  H01J29/07

Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.