公开(公告)号：US20170343904A1

公开(公告)日：2017-11-30

申请号：US15653435

申请日：2017-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US20160252827A1

公开(公告)日：2016-09-01

申请号：US15028676

申请日：2014-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Ramidin Izair KAMIDI ,  Yanin KASEMSINSUP

IPC: G03F7/20 ,  G01B11/00 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02 ,  G01B11/002 ,  G03F7/70725

Abstract: An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.

Abstract translation: 物体定位系统包括物体; 用于测量所述物体的位置的测量系统，其中所述测量系统的每个传感器在所述物体上具有相关联的测量区域，并且其中所述物体上的至少一个测量区域的位置取决于所述物体的位置; 用于定位物体的致动器系统; 配置成驱动所述致动器系统的控制系统，其中所述控制系统包括具有所述物体的动态模型的观察者以估计所述物体的内部动态行为，其中所述动态模型包括至少一个测量区域的位置的依赖性 在所述对象的位置上，并且其中所述控制系统被配置为依照所述观察者的输出来驱动所述致动器系统。

公开(公告)号：US20150338752A1

公开(公告)日：2015-11-26

申请号：US14817998

申请日：2015-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  G05B19/418

CPC classification number: G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

Abstract: A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating.

Abstract translation: 多级系统包括：定子，其包括多个电线圈; 第一级包括第一磁体组件，所述第一级可相对于所述定子移动; 第二级包括第二磁体组件，所述第二级相对于所述定子可移动; 控制器，被配置为通过分别激活多个电线圈的第一子集来与第一磁体组件和多个电线圈的第二子集相互作用来相对于定子来定位第一和第二阶段， 第二磁体组件，所述控制器适于防止至少一个电线圈被所述第一和第二子集同时共享以将所述第一和第二平台定位在所述定子上，从而不启动。

公开(公告)号：US20150323872A1

公开(公告)日：2015-11-12

申请号：US14762190

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜和/或配置反射镜形状的致动器（500）的反射镜（510），致动器还为反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

公开(公告)号：US20150062554A1

公开(公告)日：2015-03-05

申请号：US14542263

申请日：2014-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G03F7/20 ,  H02P25/06

CPC classification number: G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

Abstract: A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating.