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公开(公告)号：US08057970B2
公开(公告)日：2011-11-15
申请号：US12540322
申请日：2009-08-12
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
IPC分类号： G03F9/00
CPC分类号： G03F1/70 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/78 , G03F7/20 , G03F7/2037 , G03F7/2063 , G03F7/7025 , G06F17/50 , G06F17/5068 , G06F17/5081 , G06F2217/12 , H01J37/3174 , Y10S430/143
摘要： A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a single CP character, by varying dosage. A method for forming circular patterns on a surface using a variable shaped beam (VSB) charged particle beam writer is also disclosed, wherein the dosages of the shots may vary, and wherein the union of the shots is different than the set of target patterns. A method for forming circular patterns on a surface using a library of glyphs is also disclosed, wherein the glyphs are pre-calculated dosage maps that can be formed by one or more charged particle beam shots.
摘要翻译： 公开了一种使用字符投影（CP）带电粒子束写入器在表面上形成圆形图案的方法，其中可以通过改变剂量使用单个CP字符形成不同尺寸的圆形图案。 还公开了一种使用可变形波束（VSB）带电粒子束写入器在表面上形成圆形图案的方法，其中射击的剂量可以变化，并且其中镜头的联合不同于目标图案的集合。 还公开了使用字形库在表面上形成圆形图案的方法，其中所述字形是可以由一个或多个带电粒子束照射形成的预先计算的剂量图。
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52.发明申请METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开使用充电颗粒光栅制作表面的方法和系统公开(公告)号：US20110089345A1
公开(公告)日：2011-04-21
申请号：US12898646
申请日：2010-10-05
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/78
摘要： In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single extended shot to form a track. In some embodiments, the track may form a straight path, a curved path, or a perimeter of a curvilinear shape. In other embodiments, the width of the track may be altered by varying the velocity of the dragged beam. The techniques may be used for manufacturing an integrated circuit by dragging a charged particle beam across a resist-coated wafer to transfer a pattern to the wafer, or by dragging a charged particle beam across a reticle, where the reticle is used to manufacture a photomask which is then used to transfer a pattern to a wafer using an optical lithographic process.
摘要翻译： 在使用成形束带电粒子束光刻的半导体生产领域中，通过在单个延伸射击中将带电粒子束拖过表面而形成轨迹，从而在表面上形成图案。 在一些实施例中，轨道可以形成曲线形状的直线路径，曲线路径或周边。 在其他实施例中，轨道的宽度可以通过改变拖曳梁的速度来改变。 这些技术可以用于通过将带电粒子束拖过抗蚀剂涂覆的晶片以将图案转移到晶片，或者通过将带电粒子束拖动通过掩模版来制造集成电路，其中掩模版用于制造光掩模 然后将其用于使用光学光刻工艺将图案转印到晶片。
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53.发明申请Method for Fracturing a Pattern for Writing with a Shaped Charged Particle Beam Writing System Using Dragged Shots 失效用成形的带电粒子束写入系统使用拖曳射击压缩图案的方法公开(公告)号：US20110089344A1
公开(公告)日：2011-04-21
申请号：US12603580
申请日：2009-10-21
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a shot determined for a shaped charged particle beam writer system comprises dragging the charged particle beam across a surface during the shot, so as to form a complex pattern in a single, extended shot. The dragging may be done with either variable shaped beam (VSB) or character projection (CP) shots. Methods for specifying in the shot data the path for the dragged shot are also disclosed. Other embodiments include using dragged shots with partial projection, varying the dragging velocity during a shot, and combining dragged shots with conventional shots. A method and system for creating glyphs which contain dragged shots is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中为成形带电粒子束写入器系统确定的镜头包括将带电粒子束拖过 在射击期间形成一个复杂的图案，在一个单一的延伸射击。 可以用可变形波束（VSB）或角色投影（CP）拍摄完成拖动。 还公开了在拍摄数据中指定用于拖动镜头的路径的方法。 其他实施例包括使用具有部分投影的拖动镜头，在拍摄期间改变拖动速度，以及将拖动的镜头与传统镜头组合。 还公开了一种用于创建包含拖动镜头的字形的方法和系统。
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公开(公告)号：US6009203A
公开(公告)日：1999-12-28
申请号：US911212
申请日：1997-08-14
申请人： Yi Liu , Michael Tucker , Geoffrey Strongin
发明人： Yi Liu , Michael Tucker , Geoffrey Strongin
摘要： A method and apparatus for decoding variable length code (VLC) data employ a hybrid technique of parsing short-length VLC codes using a binary tree or binary search procedure and parsing longer VLC codes using a table lookup procedure. This technique includes the steps of accessing a plurality of bits of coded bitstream data, bit testing a preselected number N first bits of the plurality of bitstream bits and determining whether the N first bits include a complete VLC code. If the N first bits include a complete VLC code, a VLC code is decoded in accordance with a result of the bit testing step. If the N first bits do not include a complete VLC code, a VLC code is decoded from a lookup table to a table element addressed by the bits of coded bitstream data.
摘要翻译： 用于解码可变长度码（VLC）数据的方法和装置采用使用二叉树或二进制搜索过程解析短长度VLC码并使用表查找过程解析较长VLC码的混合技术。 该技术包括以下步骤：访问编码比特流数据的多个比特，对多个比特流比特中的预先选择的N个第一比特进行比特测试，并确定N个第一比特是否包括完整的VLC码。 如果N个第一比特包括完整的VLC码，则根据比特测试步骤的结果对VLC码进行解码。 如果N个第一比特不包括完整的VLC码，则VLC码从查找表解码为由编码比特流数据的比特寻址的表格元素。
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公开(公告)号：US08397207B2
公开(公告)日：2013-03-12
申请号：US11944792
申请日：2007-11-26
申请人： Arthur C. Leonard , Pavel R. Karimov , Timothy E. Getsch , Michael J. McCormack , Michael Tucker
发明人： Arthur C. Leonard , Pavel R. Karimov , Timothy E. Getsch , Michael J. McCormack , Michael Tucker
IPC分类号： G06F9/44
摘要： Embodiments are provided for displaying components for visually designing logical structures or macros. In one embodiment, a logical surface component is displayed which may include a design surface. The design surface may be utilized to display data which make up one or more macros. The design surface may be selected for receiving macro data. The received data, which represents a macro design, may then be displayed in the design surface on a display device. In another embodiment, controls for navigating within logical surface components utilized for designing macros may be displayed on a display device. A logical surface component which includes a hierarchical grouping of macro actions may be displayed. One more actions may be selected and an instruction may be received in a visual interface to move selected actions among the hierarchical grouping. In response to receiving the move instruction, the selected actions which were moved may be displayed.
摘要翻译： 提供了用于显示用于视觉设计逻辑结构或宏的组件的实施例。 在一个实施例中，显示可包括设计表面的逻辑表面分量。 设计表面可用于显示构成一个或多个宏的数据。 可以选择设计表面来接收宏数据。 接收到的表示宏观设计的数据然后可以显示在显示设备的设计表面中。 在另一个实施例中，用于在用于设计宏的逻辑表面组件内导航的控件可以显示在显示设备上。 可以显示包括宏动作的分级分组的逻辑表面组件。 可以选择一个动作，并且可以在可视界面中接收指令以在分层分组之间移动所选择的动作。 响应于接收到移动指令，可以显示被移动的所选动作。
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56.发明授权Method for fracturing and forming a pattern using circular characters with charged particle beam lithography 有权使用带有带电粒子束光刻的圆形特征压裂和形成图案的方法公开(公告)号：US08283094B2
公开(公告)日：2012-10-09
申请号：US13274346
申请日：2011-10-16
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular character projection shots, where at least two shots overlap, is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体制造领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中多个圆形或近圆形字符投影字符的镜头具有至少两个镜头 重叠，可以在表面上形成非圆形图案。 还公开了用于制造掩模版和用于通过使用多个圆形或几乎圆形的角色投影镜在表面上形成非圆形图案来制造诸如硅晶片的基板的方法，其中至少两个重叠。
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57.发明授权Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography 失效使用具有带电粒子束光刻的曲线字符压裂和形成图案的方法公开(公告)号：US08039176B2
公开(公告)日：2011-10-18
申请号：US12618722
申请日：2009-11-14
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中为带电粒子束写入器系统确定了一系列曲线角色投影镜头，使得 一组镜头可以在表面上形成可能具有不同宽度的连续轨迹。 还公开了使用一系列曲线角色投影镜头在表面上形成连续轨道的方法。 还公开了用于制造掩模版和用于通过使用一系列曲线字符投影镜在表面上形成连续轨迹来制造诸如硅晶片的基板的方法。
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58.发明授权Method for fracturing circular patterns and for manufacturing a semiconductor device 有权破坏圆形图案和制造半导体器件的方法公开(公告)号：US08017288B2
公开(公告)日：2011-09-13
申请号：US12540321
申请日：2009-08-12
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
IPC分类号： G03F9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , Y10S430/143
摘要： A method for manufacturing a semiconductor device using a photomask and optical lithography is disclosed, wherein circular patterns on the semiconductor wafer are formed by using circular patterns on the photomask, which is manufactured using a charged particle beam writer. In one embodiment, circular patterns of varying sizes have been formed on the photomask using a single character projection (CP) character, by varying the charged particle beam dosage. A method for fracturing circular patterns is also disclosed, either using circular CP characters or using VSB shots wherein the union of the plurality of VSB shots is different than the set of desired patterns.
摘要翻译： 公开了使用光掩模和光刻法制造半导体器件的方法，其中通过使用带电粒子束写入器制造的光掩模上的圆形图案形成半导体晶片上的圆形图案。 在一个实施例中，通过改变带电粒子束的剂量，已经使用单个字符投影（CP）字符在光掩模上形成了不同尺寸的圆形图案。 还公开了一种用于压裂圆形图案的方法，其使用圆形CP字符或使用VSB拍摄，其中多个VSB拍摄的并集不同于所需图案的集合。
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59.发明申请WING COVER PANEL ASSEMBLY AND WING COVER PANEL FOR AN AIRCRAFT WING AND A METHOD OF FORMING THEREOF 有权用于飞机的WING盖板组件和盖板及其形成方法公开(公告)号：US20090200423A1
公开(公告)日：2009-08-13
申请号：US12302862
申请日：2007-07-05
申请人： Michael Tucker
发明人： Michael Tucker
CPC分类号： B64C3/18 , B64C3/26 , Y10T29/49826
摘要： A wing cover panel assembly, wing cover and method of forming thereof are disclosed in which an attachment surface of the wing cover panel is provided with a locating channel into which a wing structural element such as a stringer or spar is captured so as to fix the wing structural element to the wing cover panel.
摘要翻译： 公开了一种翼盖板组件，翼盖及其成形方法，其中机翼盖板的附接表面设置有定位通道，其中捕获诸如桁条或翼梁的机翼结构元件，以便固定 翼结构元件到翼盖板。
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公开(公告)号：US20090138845A1
公开(公告)日：2009-05-28
申请号：US11944792
申请日：2007-11-26
申请人： Arthur C. Leonard , Pavel R. Karimov , Timothy E. Getsch , Michael J. McCormack , Michael Tucker
发明人： Arthur C. Leonard , Pavel R. Karimov , Timothy E. Getsch , Michael J. McCormack , Michael Tucker
摘要： Embodiments are provided for displaying components for visually designing logical structures or macros. In one embodiment, a logical surface component is displayed which may include a design surface. The design surface may be utilized to display data which make up one or more macros. The design surface may be selected for receiving macro data. The received data, which represents a macro design, may then be displayed in the design surface on a display device. In another embodiment, controls for navigating within logical surface components utilized for designing macros may be displayed on a display device. A logical surface component which includes a hierarchical grouping of macro actions may be displayed. One more actions may be selected and an instruction may be received in a visual interface to move selected actions among the hierarchical grouping. In response to receiving the move instruction, the selected actions which were moved may be displayed.
摘要翻译： 提供了用于显示用于视觉设计逻辑结构或宏的组件的实施例。 在一个实施例中，显示可包括设计表面的逻辑表面分量。 设计表面可用于显示构成一个或多个宏的数据。 可以选择设计表面来接收宏数据。 接收到的表示宏观设计的数据然后可以显示在显示设备的设计表面中。 在另一个实施例中，用于在用于设计宏的逻辑表面组件内导航的控件可以显示在显示设备上。 可以显示包括宏动作的分级分组的逻辑表面组件。 可以选择一个动作，并且可以在可视界面中接收指令以在分层分组之间移动所选择的动作。 响应于接收到移动指令，可以显示被移动的所选动作。
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