公开(公告)号：US08395133B2

公开(公告)日：2013-03-12

申请号：US12560864

申请日：2009-09-16

申请人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20130048886A1

公开(公告)日：2013-02-28

申请号：US13696517

申请日：2011-12-13

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B5/10 ,  G21K5/04 ,  G02B7/182

CPC分类号： G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

摘要翻译： 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。

公开(公告)号：US08198613B2

公开(公告)日：2012-06-12

申请号：US12469140

申请日：2009-05-20

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04 ,  G21K1/06

CPC分类号： G02B5/1838 ,  G02B5/0891 ,  G02B5/1857 ,  G03F7/70575 ,  G21K1/065 ,  G21K2201/064

摘要： The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.

摘要翻译： EUV光源装置除去其发射的光之外的EUV辐射以外的辐射，并且仅将EUV辐射提供给曝光装置。 在EUV收集镜的前表面上设置由多个Mo / Si对层构成的复合层，在该复合层中形成闪耀槽。 从等离子体发射的辐射入射到该EUV收集镜上，并被反射或衍射。 反射的EUV辐射（包括衍射的EUV）进行到中间焦点IF。 由于其反射角或衍射角不同，其他波长的辐射进入除了该焦点IF之外的某个位置。 具有开口部分的SPF屏蔽设置在焦点IF处。 因此，只有EUV辐射通过开口部分并被提供给曝光装置，而另一辐射被屏蔽件遮挡。

公开(公告)号：US07923705B2

公开(公告)日：2011-04-12

申请号：US12385835

申请日：2009-04-21

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： G21G4/00

CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70883 ,  H05G2/008

摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.

摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到 目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

公开(公告)号：US20100078580A1

公开(公告)日：2010-04-01

申请号：US12566865

申请日：2009-09-25

申请人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B26/02 ,  G21K1/00

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。

公开(公告)号：US20100078577A1

公开(公告)日：2010-04-01

申请号：US12560864

申请日：2009-09-16

申请人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00 ,  H01S3/10

CPC分类号： H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20100025231A1

公开(公告)日：2010-02-04

申请号：US12148969

申请日：2008-04-24

申请人： Masato Moriya ,  Yoshifumi Ueno ,  Tamotsu Abe ,  Akira Sumitani

发明人： Masato Moriya ,  Yoshifumi Ueno ,  Tamotsu Abe ,  Akira Sumitani

IPC分类号： C23C14/34 ,  B08B7/00

CPC分类号： H05G2/001 ,  G03F7/70033 ,  H05G2/005

摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.

摘要翻译： 一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质， 包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

公开(公告)号：US20090301517A1

公开(公告)日：2009-12-10

申请号：US12478083

申请日：2009-06-04

申请人： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

发明人： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

IPC分类号： B08B7/00

CPC分类号： B08B7/00 ,  B08B7/0035 ,  B08B13/00

摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。

公开(公告)号：US20090159222A1

公开(公告)日：2009-06-25

申请号：US12096391

申请日：2007-08-03

申请人： Masato Moriya ,  Fumio Sasaki

发明人： Masato Moriya ,  Fumio Sasaki

IPC分类号： E06B9/24

CPC分类号： E06B9/52 ,  E06B2009/527 ,  F16B5/0692

摘要： [Object] To provide a holding member for a net for a screen door effective for fixing a net for a screen door having fine filaments and a fine mesh compared with a known insect protection net to a frame body for use in a screen door.[Solving Means] A holding member 14 is constructed by providing a pair of elastically deformable leg ridges 16 being fitted into a latch groove 18 under a condition of being in pressure contact with an inward projecting edge 19 thereof, to a cover plate 15 for covering the latch groove 18. A soft pressure-contact portion 15a being in pressure contact with the net 12 sandwiched between the same and an outer surface 19a of the inward projecting edge 19 of the latch groove 18 is integrally formed at an outer side of the leg ridge 16 of the cover plate 15. In the pressure-contact portion 15a, an acute head-shaped projecting ridge 15b being elastically in pressure contact with the net sandwiched between the same and the outer surface of the inward projecting edge 19 of the latch groove 18 is projected and the projecting ridge has elasticity so as to be deformed by unevenness of the net surface.

摘要翻译： 本发明提供一种用于筛网门的保持构件，其有效地固定具有细丝的筛网的网和与已知的防虫网相比较的细筛网到用于筛网门的框体。 [解决方案]保持构件14通过在与其向内突出的边缘19压力接触的状态下设置一对可弹性变形的腿脊16而构成，并将其嵌入到闩锁槽18中，以覆盖盖板15 闩锁槽18.与被夹在其间的网12压力接触的软压接部15a和闩锁槽18的向内突出的边缘19的外表面19a一体地形成在腿的外侧 在压接部分15a中，与夹在其间的网与弹性槽的向内突出的边缘19的外表面弹性地压接的尖锐的头部形状的突出脊15b 18突出并且突出的脊具有弹性，以便由于网表面的不平坦而变形。

公开(公告)号：US07472738B2

公开(公告)日：2009-01-06

申请号：US10562660

申请日：2004-06-29

申请人： Yoji Kamosawa ,  Hirotsugu Toda ,  Mitsuhiko Chino ,  Masato Moriya

发明人： Yoji Kamosawa ,  Hirotsugu Toda ,  Mitsuhiko Chino ,  Masato Moriya

IPC分类号： A47H5/00 ,  A47H1/00 ,  A47G5/02

CPC分类号： E06B9/52 ,  E06B9/522 ,  E06B2009/543

摘要： A screen device including a screen guide that has a simple structure, stably operates, and, in a guided-out state, can be formed in a straight rail-like shape. A screen guide of the screen device includes a large number of guide pieces, each formed in an approximately U-shape by a bottom and standing walls respectively extending along the end of a screen and the external side surfaces of the screen, and having a structure in which passage holes are formed along the tops of the standing walls, two strings of wire members are exerted through the respective passage holes, and, when the screen guide is guided out along the end of the screen, the serial contact surfaces of the adjacent guide pieces abut against each other.

摘要翻译： 包括具有简单结构，稳定操作并且在导出状态下的屏幕引导件的屏幕装置可以形成为直轨形。 屏幕装置的屏幕引导件包括大量的引导件，每个引导件通过底部形成为大致U形，并且分别沿着屏幕的端部和屏幕的外侧表面延伸，并且具有结构 其中沿着立壁的顶部形成通道孔，通过相应的通孔施加两串线构件，并且当屏幕导向件沿着屏幕的端部被引出时，相邻的连接件的串联接触表面 引导件相互抵靠。