摘要:
A cascaded micromechanical actuator structure for rotating a micromechanical component about a rotation axis is described. The structure includes a torsion spring device which, on the one hand, is attached to a mount and to which, on the other hand, the micromechanical component is attachable. The torsion spring device has a plurality of torsion springs which run along or parallel to the rotation axis. The structure includes a rotary drive device having a plurality of rotary drives which are connected to the torsion spring device in such a way that each rotary drive contributes a fraction to an overall rotation angle of a micromechanical component about the rotation axis.
摘要:
A magnetic yoke (10) having a magnet (12) having a magnetization direction (14) on which a first yoke arm (18a) and a second yoke arm (18b) are mounted in such a way that the magnet (12) and the two yoke arms (18a, 18b) define a yoke intermediate space (20) extending from a front side to a rear side of the magnetic yoke; and first pole shoe (22a) configured on the first yoke arm (18a) and a second pole shoe (22b) configured on the second yoke arm (18b), between which a yoke gap (24) is located; the first pole shoe (22a) having a first width (b1) at a first end (40a) on the front side of the magnetic yoke (10), in parallel to the magnetization direction (14) of the magnet (12), and having a second width (b2) unequal to the first width (b1) at a second end (42a) facing opposite the first end (40a) on the rear side of the magnetic yoke (10), in parallel to the magnetization direction (14) of the magnet (12).
摘要:
A micromechanical component, in particular a pressure sensor, including a substrate that has a membrane region, a surrounding region of the membrane region, at least one measuring resistance provided in the membrane region and modifiable by deformation of the membrane region, and a corresponding evaluation circuit provided in the surrounding region. An interference effect on the measuring resistance is producible by way of a deformation of parts, in particular conductor paths, of the evaluation circuit relative to the substrate. The invention also creates a corresponding equalization method on a test chip or as an individual final equalization.
摘要:
A micromechanical sensor includes a support of silicon substrate having an epitaxial layer of silicon applied on the silicon substrate. A part of the epitaxial layer is laid bare to form at least one micromechanical deflection part by an etching process. The bared deflection part is made of polycrystalline silicon which has grown in polycrystalline form during the epitaxial process over a silicon-oxide layer which has been removed by etching. In the support region and/or at the connection to the silicon substrate, the exposed deflection part passes into single crystal silicon. By large layer thicknesses, a large working capacity of the sensor is possible. The sensor structure provides enhanced mechanical stability, processability, and possibilities of shaping, and it can be integrated, in particular, in a bipolar process or mixed process (bipolar-CMOS, bipolar-CMOS-DMOS).
摘要:
A method for manufacturing semiconductor components having micromechanical structures, micromechanical structures being patterned in a wafer for detecting a physical quantity acting on micromechanical structures, and semiconductor components for converting the physical quantity into an electrical signal proportional to the physical quantity being produced. The semiconductor components and the micromechanical structures are defined in a self-aligning manner by process steps acting on one side of the wafer to produce semiconductor components.