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公开(公告)号：US08823920B2
公开(公告)日：2014-09-02
申请号：US13287733
申请日：2011-11-02
申请人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
发明人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。
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公开(公告)号：US20050018156A1
公开(公告)日：2005-01-27
申请号：US10873648
申请日：2004-06-23
申请人： Johannes Catharinus Mulkens , Antonius Theodorus Anna Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer , Bob Streefkerk
发明人： Johannes Catharinus Mulkens , Antonius Theodorus Anna Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F7/70341 , G03F9/7034
摘要： The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.
摘要翻译： 通过测量装置获得浸没式光刻设备的储液器中的液体的压力和/或高度。 压力和/或高度可用于确定基底的高度和/或倾斜度。
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公开(公告)号：US08913223B2
公开(公告)日：2014-12-16
申请号：US12795513
申请日：2010-06-07
申请人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
发明人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
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公开(公告)号：US20100302519A1
公开(公告)日：2010-12-02
申请号：US12795513
申请日：2010-06-07
申请人： Bob STREEFKERK , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
发明人： Bob STREEFKERK , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。
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公开(公告)号：US20070132972A1
公开(公告)日：2007-06-14
申请号：US11482121
申请日：2006-07-07
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。
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公开(公告)号：US07738074B2
公开(公告)日：2010-06-15
申请号：US10890400
申请日：2004-07-14
申请人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
发明人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如通过反馈电路来控制浸没液体流速和液体温度。
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公开(公告)号：US08711323B2
公开(公告)日：2014-04-29
申请号：US11482121
申请日：2006-07-07
申请人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
发明人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
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公开(公告)号：US20060232756A1
公开(公告)日：2006-10-19
申请号：US11239480
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen , Sjoerd Nicolaas Donders
发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen , Sjoerd Nicolaas Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号：US07038760B2
公开(公告)日：2006-05-02
申请号：US10873648
申请日：2004-06-23
申请人： Johannes Catharinus Hubertus Mulkens , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F9/7026 , G03F7/70341 , G03F9/7034
摘要： The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.
摘要翻译： 通过测量装置获得浸没式光刻设备的储液器中的液体的压力和/或高度。 压力和/或高度可用于确定基底的高度和/或倾斜度。
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公开(公告)号：US20050007569A1
公开(公告)日：2005-01-13
申请号：US10844575
申请日：2004-05-13
申请人： Bob Streefkerk , Levinus Bakker , Johannes Baselmans , Hendrikus Cox , Antonius Theodorus Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Johannes Mertens , Frits Van Der Meulen , Johannes Mulkens , Gerardus Van Nunen , Klaus Simon , Bernardus Slaghekke , Alexander Straaijer , Jan-Gerard Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Levinus Bakker , Johannes Baselmans , Hendrikus Cox , Antonius Theodorus Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Johannes Mertens , Frits Van Der Meulen , Johannes Mulkens , Gerardus Van Nunen , Klaus Simon , Bernardus Slaghekke , Alexander Straaijer , Jan-Gerard Van Der Toorn , Martijn Houkes
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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