专利检索 ap:("Bob Streefkerk" OR "Antonius Theodorus Derksen" OR "Joeri Lof" OR "Klaus Simon" OR "Alexander Straaijer") AND inv:"Klaus Simon" 第 1 页

1.

发明申请
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US20070132972A1

公开(公告)日：2007-06-14

申请号：US11482121

申请日：2006-07-07

申请人： Bob Streefkerk , Antonius Theodorus Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

发明人： Bob Streefkerk , Antonius Theodorus Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891

摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。

2.

发明申请
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US20060023189A1

公开(公告)日：2006-02-02

申请号：US11239493

申请日：2005-09-30

申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen

发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

3.

发明申请
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US20060232756A1

公开(公告)日：2006-10-19

申请号：US11239480

申请日：2005-09-30

申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen , Sjoerd Nicolaas Donders

发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen , Sjoerd Nicolaas Donders

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。在结构和衬底的表面之间使用气体以在空间中容纳液体。

4.

发明申请
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US20050007569A1

公开(公告)日：2005-01-13

申请号：US10844575

申请日：2004-05-13

申请人： Bob Streefkerk , Levinus Bakker , Johannes Baselmans , Hendrikus Cox , Antonius Theodorus Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Johannes Mertens , Frits Van Der Meulen , Johannes Mulkens , Gerardus Van Nunen , Klaus Simon , Bernardus Slaghekke , Alexander Straaijer , Jan-Gerard Van Der Toorn , Martijn Houkes

发明人： Bob Streefkerk , Levinus Bakker , Johannes Baselmans , Hendrikus Cox , Antonius Theodorus Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Johannes Mertens , Frits Van Der Meulen , Johannes Mulkens , Gerardus Van Nunen , Klaus Simon , Bernardus Slaghekke , Alexander Straaijer , Jan-Gerard Van Der Toorn , Martijn Houkes

IPC分类号： G03F7/20 , H01L21/027 , G03B27/52

CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。可以使用致动器来改变衬底表面上方的液体供应系统的高度。控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

5.

发明申请
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US20090002652A1

公开(公告)日：2009-01-01

申请号：US12153276

申请日：2008-05-15

申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。

6.

发明授权
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US09482966B2

公开(公告)日：2016-11-01

申请号：US13615190

申请日：2012-09-13

申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk

发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk

IPC分类号： G03B27/58 , G03F7/20

CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。

7.

发明授权
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US08823920B2

公开(公告)日：2014-09-02

申请号：US13287733

申请日：2011-11-02

申请人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

发明人： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

IPC分类号： G03B27/42 , G03B27/52 , G03F7/20

CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891

摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。