公开(公告)号：US07629594B2

公开(公告)日：2009-12-08

申请号：US11544930

申请日：2006-10-10

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

IPC分类号： G21K5/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US07515245B2

公开(公告)日：2009-04-07

申请号：US10942102

申请日：2004-09-16

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine

IPC分类号： G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an infrared radiation source for providing infrared radiation into a measurement zone within the lithographic apparatus, and a detector for receiving the infrared radiation from the infrared radiation source after having passed through the measurement zone, and for outputting a signal indicative of the presence of a gas present within the measurement zone.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于将红外辐射提供到光刻设备内的测量区域的红外辐射源，以及用于接收 来自红外线辐射源的红外辐射在经过测量区域之后，并且用于输出指示存在于测量区域内的气体的信号。

公开(公告)号：US07473908B2

公开(公告)日：2009-01-06

申请号：US11486386

申请日：2006-07-14

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

IPC分类号： A61N5/00 ,  A61N5/06 ,  G21G5/00 ,  G01J3/10 ,  H05G2/00

CPC分类号： G03F7/70925 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

摘要翻译： 光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。 该表面具有吸气剂的功能。 在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。 第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。

公开(公告)号：US07372623B2

公开(公告)日：2008-05-13

申请号：US11091923

申请日：2005-03-29

申请人： Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

发明人： Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

IPC分类号： G02B5/20

CPC分类号： G03F7/70916 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70941

摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.

摘要翻译： 多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。

公开(公告)号：US20080083885A1

公开(公告)日：2008-04-10

申请号：US11544930

申请日：2006-10-10

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anton Soer ,  Thomas Stein ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anton Soer ,  Thomas Stein ,  Kurt Gielissen

IPC分类号： G21K5/00 ,  G21G4/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US07251012B2

公开(公告)日：2007-07-31

申请号：US10748851

申请日：2003-12-31

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Givi Georgievitch Zukavishvili ,  Abraham Veefkind

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Givi Georgievitch Zukavishvili ,  Abraham Veefkind

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。

公开(公告)号：US07075620B2

公开(公告)日：2006-07-11

申请号：US10820103

申请日：2004-04-08

申请人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

发明人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

IPC分类号： G01B11/00

CPC分类号： G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λ1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.

摘要翻译： 光刻投影设备包括用于提供具有小于50nm的波长λ1的辐射的投影光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置还包括辐射传感器，其被定位成能够将辐射从投影光束中接收，所述传感器包括辐射敏感材料，其将波长λ1的入射辐射转换成二次辐射 ; 以及能够检测从所述层出射的所述次级辐射的感测装置。

公开(公告)号：US08610089B2

公开(公告)日：2013-12-17

申请号：US13449030

申请日：2012-04-17

申请人： Sjoerd Nicolaas Lambertus Donders ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

发明人： Sjoerd Nicolaas Lambertus Donders ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

IPC分类号： H01J5/00

CPC分类号： G03F7/70858 ,  F28D15/0266

摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.

摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。

公开(公告)号：US20130327955A1

公开(公告)日：2013-12-12

申请号：US13686633

申请日：2012-11-27

申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

IPC分类号： H05G2/00

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

摘要翻译： 辐射源被配置为产生极紫外辐射。 辐射源包括在其中使用中产生等离子体的腔室，以及蒸发表面，该蒸发表面构造成蒸发由等离子体形成的副产物并被发射到蒸发表面的材料。 用于在平版印刷设备的等离子体辐射源中除去或来自等离子体辐射源的副产物材料的方法包括在等离子体中蒸发在使用中发射到该表面的材料。

公开(公告)号：US08405055B2

公开(公告)日：2013-03-26

申请号：US12566060

申请日：2009-09-24

申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： H05H1/42

CPC分类号： H05G2/001 ,  H05G2/003

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。