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1.发明申请THERMAL CONDITIONING SYSTEM FOR THERMAL CONDITIONING A PART OF A LITHOGRAPHIC APPARATUS AND A THERMAL CONDITIONING METHOD 有权用于热调制的热调节系统是一种平面设备和热调节方法的一部分公开(公告)号：US20120267550A1
公开(公告)日：2012-10-25
申请号：US13449030
申请日：2012-04-17
申请人： Sjoerd Nicolaas Lambertus DONDERS , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Gerrit Van Donk , Henk Jan Van Gerner
发明人： Sjoerd Nicolaas Lambertus DONDERS , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Gerrit Van Donk , Henk Jan Van Gerner
CPC分类号： G03F7/70858 , F28D15/0266
摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.
摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。
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2.发明授权公开(公告)号：US08610089B2
公开(公告)日：2013-12-17
申请号：US13449030
申请日：2012-04-17
申请人： Sjoerd Nicolaas Lambertus Donders , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Gerrit Van Donk , Henk Jan Van Gerner
发明人： Sjoerd Nicolaas Lambertus Donders , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Gerrit Van Donk , Henk Jan Van Gerner
IPC分类号： H01J5/00
CPC分类号： G03F7/70858 , F28D15/0266
摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.
摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。
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3.发明授权Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权掩模处理装置，光刻投影装置，装置制造方法以及由此制造的装置公开(公告)号：US06781673B2
公开(公告)日：2004-08-24
申请号：US09934698
申请日：2001-08-23
申请人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Martinus Hendrikus Antonius Leenders , Henri Gerard Cato Werij , Hugo Matthieu Visser , Gerrit-Jan Heerens , Erik Leonardus Ham , Hans Meiling , Erik Roelof Loopstra , Sjoerd Nicolaas Lambertus Donders
发明人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Martinus Hendrikus Antonius Leenders , Henri Gerard Cato Werij , Hugo Matthieu Visser , Gerrit-Jan Heerens , Erik Leonardus Ham , Hans Meiling , Erik Roelof Loopstra , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B2762
CPC分类号： G03F7/70558 , G03F7/70741 , G03F7/7085 , G03F7/70908 , G03F7/70916 , G03F7/70983
摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
摘要翻译： 在光刻投影装置中，通过使用电磁场的粒子屏蔽物将诸如掩模的物体与杂散颗粒屏蔽。 这些场可以是均匀的电场，不均匀的电场或光学微风。 颗粒屏蔽固定在面罩支架而不是面罩上。
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公开(公告)号：US09632419B2
公开(公告)日：2017-04-25
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns , Hermanus Kreuwel , Johannes Hubertus Josephina Moors , Uwe Bruno Heini Stamm , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Andrei Mikhailovich Yakunin
发明人： Jan Bernard Plechelmus Van Schoot , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns , Hermanus Kreuwel , Johannes Hubertus Josephina Moors , Uwe Bruno Heini Stamm , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Andrei Mikhailovich Yakunin
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
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公开(公告)号：US07863591B2
公开(公告)日：2011-01-04
申请号：US12465118
申请日：2009-05-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC分类号： G21K5/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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公开(公告)号：US07528395B2
公开(公告)日：2009-05-05
申请号：US10664065
申请日：2003-09-17
申请人： Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine , Vladimir Vital'Evitch Ivanov , Erik René Kieft , Erik Roelof Loopstra , Lucas Henricus Johannes Stevens , Yurii Victorovitch Sidelkov , Vsevolod Grigorevitch Koloshnikov , Vladimir Mihailovitch Krivtsun , Robert Rafilevitch Gayazov , Olav Waldemar Vladimir Frijns
发明人： Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine , Vladimir Vital'Evitch Ivanov , Erik René Kieft , Erik Roelof Loopstra , Lucas Henricus Johannes Stevens , Yurii Victorovitch Sidelkov , Vsevolod Grigorevitch Koloshnikov , Vladimir Mihailovitch Krivtsun , Robert Rafilevitch Gayazov , Olav Waldemar Vladimir Frijns
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
摘要翻译： 辐射源包括阳极和阴极，其被构造和布置成在阳极和阴极之间的空间中的气体或蒸气中产生放电并且形成等离子体夹点以产生电磁辐射。 气体或蒸汽可以包括氙，铟，锂和/或锡。 辐射源可以包括多个放电元件，每个放电元件仅用于短间隔，之后选择另一个放电元件。 辐射源还可以包括触发装置，该装置可以有助于改善夹紧形成的精确定时并因此改善EUV辐射的脉冲。 辐射源也可以被构造为具有低电感，并以自触发方式操作。
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7.发明授权Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device 有权掠入射反射器，光刻设备，用于制造掠入射反射器的方法和用于制造器件的方法公开(公告)号：US09377695B2
公开(公告)日：2016-06-28
申请号：US13983214
申请日：2012-01-18
CPC分类号： G03F7/702 , B82Y10/00 , G02B5/0891 , G03F7/70058 , G21K1/062 , G21K2201/061
摘要： A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.
摘要翻译： 用于EUV辐射的掠入射反射器（300）包括第一镜层下面的第一镜层（310）和多层反射镜结构（320）。 第一镜层反射入射在反射器上的至少一部分EUV辐射，其具有在第一范围内的掠入射角，并且第一镜层在与入射角的第一范围重叠并延伸超过入射角的第二范围内传输EUV辐射 。 多层反射镜结构反射入射在反射器上的EUV辐射，其中掠射入射角在穿过第一镜层的第二范围内。 掠入射反射器可以用在光刻设备中并且通过光刻工艺制造器件。
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8.发明授权Device arranged to measure a quantity relating to radiation and lithographic apparatus 失效用于测量与辐射和光刻设备有关的数量的设备公开(公告)号：US07724349B2
公开(公告)日：2010-05-25
申请号：US11797358
申请日：2007-05-02
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derek Jan Wilfred Klunder
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derek Jan Wilfred Klunder
CPC分类号： G03F7/70916 , G03F7/70558 , G03F7/7085
摘要： A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
摘要翻译： 一个装置被安排来测量与辐射有关的数量。 该装置包括被配置为测量该数量的传感器，布置成保护传感器免受从被配置为发射极紫外辐射的源射出的入射颗粒的屏幕，以及被配置为重定向由该源发射的超过紫外线的过滤器， 到传感器。
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公开(公告)号：US20080074655A1
公开(公告)日：2008-03-27
申请号：US11527731
申请日：2006-09-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC分类号： G01N21/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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公开(公告)号：US07541603B2
公开(公告)日：2009-06-02
申请号：US11527731
申请日：2006-09-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC分类号： G21K5/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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