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    Positive resist composition and pattern forming method using the same
    51.
    发明申请
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US20070134589A1

    公开(公告)日：2007-06-14

    申请号：US11636517

    申请日：2006-12-11

    申请人： Kei Yamamoto ,  Shinichi Kanna ,  Hiromi Kanda

    发明人： Kei Yamamoto ,  Shinichi Kanna ,  Hiromi Kanda

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/122

    摘要： A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (C) a resin having at least one repeating unit selected from fluorine atom-containing repeating units represented by the following formulae (1-1), (1-2) and (1-3), the resin being stable to an acid and insoluble in an alkali developer, and (D) a solvent: wherein R1 represents a hydrogen atom or an alkyl group; R2 represents a fluoroalkyl group; R3 represents a hydrogen atom or a monovalent organic group; R4 to R7 each independently represents a hydrogen atom, a fluorine atom, an alkyl group, a fluoroalkyl group, an alkoxy group or a fluoroalkoxy group, provided that at least one of R4 to R7 represents a fluorine atom, and R4 and R5, or R6 and R7 may combine to form a ring; R8 represents a hydrogen atom, a fluorine atom or a monovalent organic group; Rf represents a fluorine atom or a fluorine atom-containing monovalent organic group; L represents a single bond or a divalent linking group; Q represents an alicyclic structure; and k represents an integer of 0 to 3.

    摘要翻译： 正型抗蚀剂组合物包括：（A）在酸性作用下在碱性显影剂中的溶解度增加的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有 选自由下式（1-1），（1-2）和（1-3）表示的含氟原子的重复单元中的至少一种重复单元，该树脂对酸稳定且不溶于碱性显影剂， 和（D）溶剂：其中R 1表示氢原子或烷基; R 2表示氟代烷基; R 3表示氢原子或一价有机基团; R 4至R 7各自独立地表示氢原子，氟原子，烷基，氟烷基，烷氧基或氟烷氧基，条件是至少 R 4至R 7中的一个表示氟原子，R 4和R 5，或R 5， SUB> 6和R 7可以结合形成环; R 8表示氢原子，氟原子或一价有机基团; Rf表示氟原子或含氟原子的一价有机基团; L表示单键或二价连接基团; Q表示脂环结构; k表示0〜3的整数。

    Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene
    53.
    发明授权
    Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene 有权
    （双 - 三氟甲基）甲基取代苯乙烯的正性抗蚀剂组合物

    公开(公告)号：US06743565B2

    公开(公告)日：2004-06-01

    申请号：US10156227

    申请日：2002-05-29

    申请人： Kazuyoshi Mizutani ,  Toru Fujimori ,  Shinichi Kanna

    发明人： Kazuyoshi Mizutani ,  Toru Fujimori ,  Shinichi Kanna

    IPC分类号： G03F7039

    CPC分类号： G03F7/0046 ,  G03F7/0392 ,  Y10S430/108 ,  Y10S430/115

    摘要： A positive resist composition is disclosed, comprising (A) a resin containing at least one repeating unit represented by the following formula (I) and at least one repeating unit represented by formula (VII), which decomposes under the action of an acid to increase the solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.

    摘要翻译： 公开了一种正型抗蚀剂组合物，其包含（A）含有至少一个由下式（I）表示的重复单元的树脂和至少一种由式（VII）表示的重复单元，其在酸的作用下分解以增加 在碱性显影剂中的溶解度，和（B）在用光化射线或辐射照射时能够产生酸的化合物。

    Positive resist composition
    54.
    发明授权
    Positive resist composition 有权

    公开(公告)号：US06605409B2

    公开(公告)日：2003-08-12

    申请号：US09860440

    申请日：2001-05-21

    申请人： Kunihiko Kodama ,  Shinichi Kanna

    发明人： Kunihiko Kodama ,  Shinichi Kanna

    IPC分类号： G03F7004

    CPC分类号： C07D275/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

    摘要： A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.

    Color filter and production method thereof, and solid-state image sensor using the same
    55.
    发明授权
    Color filter and production method thereof, and solid-state image sensor using the same 有权
    滤色器及其制造方法以及使用其的固体摄像元件

    公开(公告)号：US08968973B2

    公开(公告)日：2015-03-03

    申请号：US12533019

    申请日：2009-07-31

    申请人： Shinichi Kanna ,  Kazuya Oota ,  Yosuke Murakami

    发明人： Shinichi Kanna ,  Kazuya Oota ,  Yosuke Murakami

    IPC分类号： G02B5/20

    CPC分类号： G03F7/0007 ,  G02B5/201 ,  G03F7/40

    摘要： A method of producing a color filter includes (a) forming a colored pattern on a substrate by exposing and developing a colored curable composition containing a dye, a polymerizable monomer and an organic solvent, (b) forming a transparent protective film on the colored pattern, and (c) irradiating at least the transparent protective film with light after forming the transparent protective film on the colored pattern.

    摘要翻译： 制造滤色器的方法包括：（a）通过曝光和显影含有染料，可聚合单体和有机溶剂的着色可固化组合物在基底上形成着色图案，（b）在着色图案上形成透明保护膜 ，（c）在着色图案上形成透明保护膜之后，至少用透明保护膜照射光。