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公开(公告)号：US20090195762A1
公开(公告)日：2009-08-06
申请号：US12382162
申请日：2009-03-10
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.
摘要翻译： 浸没式光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间，从液体供应构件将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 物体的与工件不同的表面被设置成使得物体和光学元件的表面彼此相对。 在净化处理中，从液体供给部件将清洗液供给到物体的表面。
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公开(公告)号：US20090174872A1
公开(公告)日：2009-07-09
申请号：US12382078
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.
摘要翻译： 浸渍光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 与工件不同的物体的表面设置在光学元件的下方，供给口和回收口。 在净化过程中，清洁液体被供应到物体上，使得清洁液仅覆盖物体表面的一部分。
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公开(公告)号：US20090075211A1
公开(公告)日：2009-03-19
申请号：US12292251
申请日：2008-11-14
申请人： Derek Coon , Andrew J. Hazelton
发明人： Derek Coon , Andrew J. Hazelton
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70808
摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.
摘要翻译： 浸没式光刻设备包括光学构件，限定在光学构件和与填充有浸没液体的光学构件相对设置的表面之间的间隙，以及包括气体出口的流体控制装置，通过该气体出口供应气体以防止浸没 液体进入暴露区域外部的环绕区域。 从气体出口供给的气体的流速取决于浸没液体和表面之间的接触角。
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公开(公告)号：US20080105069A1
公开(公告)日：2008-05-08
申请号：US11666858
申请日：2005-11-04
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译： 公开了一种用于支撑物体的装置。 该装置包括联接到空气波纹管的空气轴承。 当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。
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55.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US07345742B2
公开(公告)日：2008-03-18
申请号：US11705001
申请日：2007-02-12
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid removal system having a conduit having an open end adjacent a volume in which liquid will be present, a porous member between the end of the conduit and the volume, and a suction device arranged to create a pressure differential across the porous member.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该设备还包括一个液体去除系统，该系统具有一个导管，该导管具有一个与其中存在液体的容积相邻的开口端，一个位于导管端部和该体积之间的多孔构件，以及一个抽吸装置， 多孔构件。
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56.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US07251017B2
公开(公告)日：2007-07-31
申请号：US11236713
申请日：2005-09-28
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier, an immersion fluid system, and a transport region. The fluid barrier is positioned near the device and maintains the transport region near the gap. The immersion fluid system delivers an immersion fluid that fills the gap. The transport region transports at least a portion of the immersion fluid that is near the fluid barrier and the device away from the device. The immersion fluid system can include a fluid removal system that is in fluid communication with the transport region. The transport region can be made of a porous material.
摘要翻译： 环境系统控制光学组件和装置之间的间隙中的环境，并且包括流体屏障，浸没流体系统和输送区域。 流体屏障定位在设备附近并保持输送区域靠近间隙。 浸液系统提供填充间隙的浸液。 输送区域将至少一部分浸入液体输送到靠近流体屏障并且该装置远离装置。 浸没流体系统可以包括与输送区域流体连通的流体去除系统。 输送区域可以由多孔材料制成。
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公开(公告)号：US07164466B2
公开(公告)日：2007-01-16
申请号：US10228813
申请日：2002-08-27
申请人： Andrew J. Hazelton
发明人： Andrew J. Hazelton
CPC分类号： H01L21/67109
摘要： Methods and apparatus for collecting heat within a precision stage system substantially without introducing significant disturbance forces to the system are disclosed. According to one aspect of the present invention, a method for substantially removing heat from a first location within an overall stage apparatus includes providing the heat from the first location to a heat transferring mechanism that carries the heat away from the first location. The heat is transferred from the heat transferring mechanism to a second location associated within the stage apparatus. The second location includes a material that is arranged to store the transferred heat. The method also includes storing the heat substantially within the material. In one embodiment, the heat is generated at the first location.
摘要翻译： 公开了一种在精密平台系统内收集热量的方法和装置，基本上不会对系统引入明显的干扰力。 根据本发明的一个方面，用于从总体设备中的第一位置基本上去除热量的方法包括将热量从第一位置提供给将热量从第一位置传送的热传递机构。 热量从传热机构转移到与舞台装置相关联的第二位置。 第二位置包括被布置成存储转移的热量的材料。 该方法还包括将热量基本上储存在材料内。 在一个实施例中，在第一位置处产生热量。
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58.发明授权Vibration-attenuation devices and methods using pressurized bellows exhibiting substantially zero lateral stiffness 失效使用加压波纹管的振动衰减装置和方法，其表现出基本上为零的横向刚度公开(公告)号：US06870600B2
公开(公告)日：2005-03-22
申请号：US10342019
申请日：2003-01-13
申请人： Andrew J. Hazelton
发明人： Andrew J. Hazelton
CPC分类号： G03B27/48 , G03F7/70716 , G03F7/709
摘要： Vibration-attenuation devices and methods are disclosed that utilize a bellows situated between a first and second mass and pressurized with a fluid to an internal fluid pressure substantially equal to a zero-stiffness pressure such that the bellows exhibits a substantially zero lateral stiffness. The devices may include various components configured to measure, regulate, and control the internal pressure of the bellows in order to maintain a desired pressure. The devices may include an active support, such as a secondary bellows or linear actuator, that provides a secondary support force. The active support may be connected to various components configured to measure and control the secondary support force. The vibration-attenuation devices disclosed may be used in a lithography exposure apparatus to attenuate vibrations between: (1) a support frame and a support surface; (2) a base and a stage-supporting platform; and (3) a supporting stage and a wafer stage.
摘要翻译： 公开了使用位于第一和第二质量块之间的波纹管并用流体加压到基本上等于零刚度压力的内部流体压力使得波纹管呈现基本上零横向刚度的振动衰减装置和方法。 装置可以包括被配置为测量，调节和控制波纹管的内部压力以便保持所需压力的各种部件。 这些装置可以包括提供辅助支撑力的主动支撑件，例如次级波纹管或线性致动器。 主动支撑件可以连接到被配置成测量和控制辅助支撑力的各种部件。 所公开的振动衰减装置可以用在光刻曝光装置中以减弱以下之间的振动：（1）支撑框架和支撑表面; （2）底座和舞台支撑平台; 和（3）支撑台和晶片台。
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公开(公告)号：US06841956B2
公开(公告)日：2005-01-11
申请号：US10244893
申请日：2002-09-17
CPC分类号： G03F7/70716 , G03F7/70758 , H02K41/03 , H02K2201/18
摘要： Methods and apparatus for adjusting a push point of an actuator such that the push point more closely corresponds to a center-of-gravity of a stage being driven by the actuator are disclosed. According to one aspect of the present invention, a method for scanning a stage device which includes a stage, as well as an actuator which has a first coil and a second coil, includes driving the stage using the actuator and determining when driving the stage using the actuator includes driving the stage through a first location associated with the stage. The actuator is arranged to drive the stage through a push point associated with the first coil and the second coil. The method also includes altering the push point when it is determined that driving the stage using the actuator does not result in the stage being driven through the first location associated with the stage.
摘要翻译： 公开了用于调节致动器的推动点的方法和装置，使得推动点更接近地对应于由致动器驱动的平台的重心。 根据本发明的一个方面，一种用于扫描包括舞台的舞台装置以及具有第一线圈和第二线圈的致动器的方法包括使用致动器驱动舞台并且确定何时使用 致动器包括通过与该台相关联的第一位置驱动该台。 致动器被布置成通过与第一线圈和第二线圈相关联的推动点来驱动平台。 该方法还包括当确定使用致动器驱动平台不导致通过与台架相关联的第一位置被驱动的阶段时改变推动点。
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公开(公告)号：US06593997B1
公开(公告)日：2003-07-15
申请号：US09713911
申请日：2000-11-16
申请人： Doug Watson , Andrew J. Hazelton , Mike Binnard
发明人： Doug Watson , Andrew J. Hazelton , Mike Binnard
IPC分类号： G03B2742
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70716 , G03F7/70766
摘要： A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction assembly (18) counteracts and reduces the reaction forces created by the stage mover assembly (16) in two degrees of freedom that are transferred to a reaction base (102). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).
摘要翻译： 本文提供了用于移动和定位装置（26）的平台组件（10）。 舞台组件（10）包括舞台基座（12），舞台（14），舞台推动器组件（16）和反作用组件（18）。 台架动子组件（16）使台架（14）沿着X轴线并相对于舞台底座（12）沿着Y轴移动。 反应组件（18）联接到载物台移动器组件（16）。 独特地，反应组件（18）在转移到反应基体（102）的两个自由度上抵消并减少由载物台移动器组件（16）产生的反作用力。 通过这种设计，平台移动器组件（16）对舞台底座（12）的位置的影响较小。 这些特征允许通过平台组件（10）更准确地定位设备（26）并且使台架组件（10）具有更好的性能。
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