公开(公告)号：US20090009753A1

公开(公告)日：2009-01-08

申请号：US12167570

申请日：2008-07-03

申请人： Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

发明人： Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/65 ,  G01N21/9505 ,  G01N2021/4711 ,  G01N2021/473 ,  G01N2021/8861 ,  G01N2021/8864

摘要： An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.

摘要翻译： 检查方法和检查装置或装置，其能够对由检查表面的弹性或sto kes散射光，检查面或缺陷检测到的缺陷或检​​查对象的表面上的缺陷进行组成分析 及其内在组成。 一种表面检查方法，用于光学检测来自检查对象的表面内的弹性或斯托克斯散射或非弹性或反射散射光，用于检测检查对象的缺陷的存在和缺陷的特征，用于检测检测到的缺陷的位置 在检查对象的表面上，根据缺陷的位置和缺陷的特征或缺陷的分类结果，根据其特征对检测到的缺陷进行分类和分析。

公开(公告)号：US20080046133A1

公开(公告)日：2008-02-21

申请号：US11882063

申请日：2007-07-30

申请人： Takahiro Jingu ,  Yusuke Miyazaki ,  Kazuhiro Zama

发明人： Takahiro Jingu ,  Yusuke Miyazaki ,  Kazuhiro Zama

IPC分类号： G05D16/00 ,  G01L13/00

CPC分类号： F24F3/161 ,  F24F11/30 ,  F24F11/77 ,  F24F2110/00 ,  F24F2110/40

摘要： The invention provides a mini environment apparatus, an inspection apparatus, a manufacturing apparatus and a cleaning method of a space which can suppress an influence of a cleanliness of an external environment and can keep a target cleanliness of a specific space. The invention is provided with an outer dust collecting filter 3a for covering an intake port 2b of a casing 2, an outer fan 3b for flowing an air from an external environment into the casing 2 via the outer dust collecting filter 3a, a clean chamber 4a arranged within the casing 2 and having an intake port 4b facing to a space within the casing 2, an inner dust collecting filter 5a for covering the intake port 4b, an inner fan 5b for flowing the air within the casing 2 into the clean chamber 4a via the inner dust collecting filter 5a, a pressure gauge 6a measuring a pressure in an external environment of the casing 2, a pressure gauge 6b measuring a pressure within the casing 2, a pressure gauge 6c measuring a pressure within the clean chamber 4a, and a control unit 7 for controlling rotating speeds of the fans 3a, 5a in such a manner that a measured pressure Pb within the casing 2 becomes higher at a set value P1 than a measured pressure Pa in the external environment, and a measured pressure Pc within the clean chamber 4a becomes higher at a set value P2 than the measured pressure Pb within the casing 2.

摘要翻译： 本发明提供了能够抑制外部环境的清洁度的影响的空间的微型环境装置，检查装置，制造装置和清洁方法，并且能够保持目标的特定空间的清洁度。 本发明设置有用于覆盖壳体2的进气口2b的外部集尘过滤器3a和用于使外部空气从外部环境经由外部集尘过滤器3a流入壳体2的外部风扇3b， 布置在壳体2内并且具有面向壳体2内的空间的进气口4b的清洁室4a，用于覆盖进气口4b的内部集尘过滤器5a，用于使空气流动的内部风扇5b 在壳体2内通过内部集尘过滤器5a进入清洁室4a，测量外壳2的外部环境中的压力的​​压力表6a，测量壳体2内的压力的压力计6b; 测量清洁室4a内的压力的压力表6c和用于控制风扇3a，5a的转速的控制单元7，使得壳体2内的测量压力Pb以设定值变高 P 1比外部环境中的测量压力Pa 并且清洁室4a内的测量压力Pc在设定值P 2下比在壳体2内测量的压力Pb高。

公开(公告)号：US07315363B2

公开(公告)日：2008-01-01

申请号：US10722531

申请日：2003-11-28

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus provided by the present invention comprises an illumination optical system which illuminates light to an object under inspection; a detection optical system which detects light reflected from said object and converts the detected light into an image signal; a spatial filter which is provided in said detection optical system to selectively shield diffracted light pattern coming from a circuit pattern existing on the object by combining light-shielding points of minute dots state; an arithmetic processing system which processes the image signal detected by said detection optical system; and a monitor which observes foreign matters/defects based on a signal processed by said arithmetic processing system.

摘要翻译： 本发明提供一种检查装置和检查方法。 本发明提供的检查装置包括照明光学系统，其将光照射到被检查物体; 检测光学系统，其检测从所述对象反射的光并将检测到的光转换为图像信号; 设置在所述检测光学系统中的空间滤波器，通过组合微点状态的遮光点来选择性地屏蔽来自存在于物体上的电路图案的衍射光图案; 算术处理系统，处理由所述检测光学系统检测到的图像信号; 以及基于由所述算术处理系统处理的信号来观察异物/缺陷的监视器。

公开(公告)号：US09588054B2

公开(公告)日：2017-03-07

申请号：US13882542

申请日：2011-10-14

申请人： Yuta Urano ,  Toshifumi Honda ,  Takahiro Jingu

发明人： Yuta Urano ,  Toshifumi Honda ,  Takahiro Jingu

IPC分类号： G01N21/86 ,  H01J3/14 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC分类号： G01N21/8806 ,  G01N21/4795 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8835

摘要： A defect inspection method includes an illumination light adjustment step of adjusting light emitted from a light source, an illumination intensity distribution control step of forming light flux obtained in the illumination light adjustment step into desired illumination intensity distribution, a sample scanning step of displacing a sample in a direction substantially perpendicular to a longitudinal direction of the illumination intensity distribution, a scattered light detection step of counting the number of photons of scattered light emitted from plural small areas in an area irradiated with illumination light to produce plural scattered light detection signals corresponding to the plural small areas, a defect judgment step of processing the plural scattered light detection signals to judge presence of a defect, a defect dimension judgment step of judging dimensions of the defect in each place in which the defect is judged to be present and a display step of displaying a position on sample surface and the dimensions of the defect in each place in which the defect is judged to be present.

摘要翻译： 缺陷检查方法包括调整从光源发出的光的照明光调节步骤，将在所述照明光调节步骤中获得的光束形成为期望的照度分布的照度分布控制步骤，将样品置换的样本扫描步骤 在与照明强度分布的长度方向大致正交的方向上，对从照明光照射的区域的多个小区域发射的散射光的光数进行计数，生成与多个散射光检测信号对应的散射光检测信号的散射光检测步骤 多个小区域，处理多个散射光检测信号以判断缺陷的存在的缺陷判断步骤，判断存在缺陷的每个位置的缺陷的尺寸的缺陷维度判断步骤和显示 显示位置的步骤o n样品表面和缺陷的每个位置的缺陷的尺寸。

公开(公告)号：US08831899B2

公开(公告)日：2014-09-09

申请号：US13127051

申请日：2009-10-15

申请人： Kazunori Nemoto ,  Akira Hamamatsu ,  Hideo Ota ,  Kenji Oka ,  Takahiro Jingu

发明人： Kazunori Nemoto ,  Akira Hamamatsu ,  Hideo Ota ,  Kenji Oka ,  Takahiro Jingu

IPC分类号： G01C19/00 ,  G01N21/00 ,  B82Y35/00 ,  G01N21/93 ,  G01B11/30 ,  G01N21/95 ,  G01N21/88 ,  H01L21/66

CPC分类号： G01B11/303 ,  B82Y35/00 ,  G01N21/93 ,  G01N21/9501 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A system and method for determining measurement results of a dark-field inspection apparatus up to a microscopic area. A dark-field inspection apparatus is calibrated using a reference wafer having microroughness of an irregular asperity pattern accurately formed on a surface, and the microroughness of the surface having an ensured microroughness degree. This microroughness is measured by using an AFM, and an expected haze value is obtained based on the measured value. Then, haze of the surface of the reference wafer is measured by the dark-field inspection apparatus to be inspected to obtain an actually-measured haze value, and a difference between the expected haze value and the actually-measured haze value is obtained. Based on this difference, a haze measurement parameter of the dark-field inspection apparatus is adjusted so that the actually-measured haze value and the expected haze value match each other.

摘要翻译： 用于确定暗视场检查装置的测量结果直到微观区域的系统和方法。 使用具有精确形成在表面上的不规则凹凸图案的微粗糙度的参考晶片校准暗场检查装置，并且具有确保的微粗糙度的表面的微粗糙度。 通过使用AFM测量该微粗糙度，并且基于测量值获得预期雾度值。 然后，通过需要检查的暗视野检查装置测量参考晶片的表面的雾度，以获得实际测得的雾度值，并获得预期雾度值和实际测得的雾度值之间的差。 基于该差异，调整暗场检查装置的雾度测量参数，使得实际测量的雾度值和预期雾度值彼此匹配。

公开(公告)号：US08035071B2

公开(公告)日：2011-10-11

申请号：US12116241

申请日：2008-05-07

申请人： Masami Makuuchi ,  Ritsurou Orihashi ,  Masayoshi Takahashi ,  Wen Li ,  Kengo Imagawa ,  Takahiro Jingu

发明人： Masami Makuuchi ,  Ritsurou Orihashi ,  Masayoshi Takahashi ,  Wen Li ,  Kengo Imagawa ,  Takahiro Jingu

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N2201/1241

摘要： The detection part has: a subtraction module for calculating correction data from data of detection systems when a reference-voltage generation module applies a reference voltage to the detection systems; a data-holding module for holding the correction data; an addition module for making a correction of detection data; a comparison module for comparing the detection data with switching data; and a selector for switching data of the detection systems including data subjected to the correction according to the output of the comparison module.

摘要翻译： 检测部具有：减法模块，用于当参考电压产生模块向检测系统施加参考电压时，从检测系统的数据计算校正数据; 用于保持校正数据的数据保持模块; 用于对检测数据进行校正的加法模块; 比较模块，用于将检测数据与切换数据进行比较; 以及选择器，用于根据比较模块的输出来切换包括经过校正的数据的检测系统的数据。

公开(公告)号：US07791721B2

公开(公告)日：2010-09-07

申请号：US11878197

申请日：2007-07-23

申请人： Kazuo Takahashi ,  Takahiro Jingu

发明人： Kazuo Takahashi ,  Takahiro Jingu

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/8851

摘要： A semiconductor wafer, which is an inspection object, is stuck by vacuum on a chuck and this chuck is mounted on an inspection object movement stage consisting of a rotational stage and a translational stage, located on a Z-stage. The rotational stage provides a rotational movement and the translational stage provides a translational movement. And when a foreign particle or a defect on an inspection object surface is detected, the parameter of digital filtering is dynamically changed during inspection, and the foreign particle or the defect is differentiated using the result after removing a low frequency fluctuation component to be a noise component.

摘要翻译： 作为检查对象的半导体晶片通过真空卡在卡盘上，该卡盘安装在由位于Z平台上的旋转台和平移台构成的检查对象移动台上。 旋转台提供旋转运动，平移台提供平移运动。 并且当检测到异物或检查物体表面的缺陷时，在检查期间动态地改变数字滤波的参数，并且在将低频波动分量除去为噪声之后，使用结果将异物或缺陷区分开来 零件。

公开(公告)号：US07768634B2

公开(公告)日：2010-08-03

申请号：US12192578

申请日：2008-08-15

申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。

公开(公告)号：US20090323054A1

公开(公告)日：2009-12-31

申请号：US12555530

申请日：2009-09-08

申请人： Akira HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

发明人： Akira HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC分类号： G01N21/88 ,  G06F19/00

CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

公开(公告)号：US07369223B2

公开(公告)日：2008-05-06

申请号：US11086442

申请日：2005-03-23

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.

摘要翻译： 用于检查图案以检测小图案缺陷的装置具有照明光源，作为具有多个照明部的照明光学系统，所述照明光学系统具有多个照明部分，用于将照明光束的光路从多个照明部分切换到构成被检查物体的板的表面 方向不同的检测光学系统，使用用于聚焦来自照明板的反射衍射光的物镜具有可变放大倍数的检测光学系统，具有可变倍率的聚焦光学系统，其能够通过会聚的反射衍射光聚焦光学图像，具有期望的 聚焦放大率和用于检测由聚焦光学系统聚焦的光学图像以将其转换成图像信号的光学检测器，用于将图像信号转换为数字图像信号的A / D转换器和用于处理数字图像信号的图像信号处理器 图像信号来检测缺陷。