公开(公告)号：US07508973B2

公开(公告)日：2009-03-24

申请号：US10809321

申请日：2004-03-26

申请人： Takafumi Okabe ,  Shunji Maeda ,  Yukihiro Shibata ,  Hidetoshi Nishiyama

发明人： Takafumi Okabe ,  Shunji Maeda ,  Yukihiro Shibata ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00 ,  G06F3/048

CPC分类号： G06T7/0004 ,  G06T2207/30148

摘要： A method of inspecting detects includes assigning a plurality of sets of image acquisition conditions, executing inspection using each of the sets of conditions, classifying all detected defects into real defects and false defects by use of an automatic defect classification function, and selecting, from the plurality of sets of conditions, a set of conditions ideal for detection.

摘要翻译： 检查检测方法包括：分配多组图像获取条件，使用每种条件执行检查，通过使用自动缺陷分类功能将所有检测到的缺陷分类为真实缺陷和假缺陷，并且从 多组条件，一套条件理想的检测。

公开(公告)号：US06566671B1

公开(公告)日：2003-05-20

申请号：US09593955

申请日：2000-06-15

申请人： Atsushi Yoshida ,  Shunji Maeda ,  Takafumi Okabe ,  Hisashi Mizumoto ,  Mitsunobu Isobe

发明人： Atsushi Yoshida ,  Shunji Maeda ,  Takafumi Okabe ,  Hisashi Mizumoto ,  Mitsunobu Isobe

IPC分类号： G01V800

CPC分类号： G01N21/95607

摘要： An apparatus and/or a method for inspecting fine defects on a substrate having minute patterns formed thereon as a target of inspection by detecting an image thereof with fine pixel size, wherein high speed processing is needed for position alignment over a wide region which is expanded equivalently therewith while obtaining a video processing circuit having a small size, wherein a video signal equal to or less than 0.2 &mgr;m in pixel size is obtained by using an optical system of DUV (far-ultraviolet) light or a video detection system of an electron beam. For instance, a search region for detecting position gaps is set at ±4 pixels, while on one substrate are mounted a plurality of video processing circuits, each being constructed with an LSI which can perform processing of k channels, thereby realizing a high-speed video processing portion having a small size.

摘要翻译： 一种用于通过以精细像素尺寸检测其图像来检查其上形成有微小图案的基板上的细小缺陷的装置和/或方法，其中检测其精细像素尺寸的图像，其中在扩展的广泛区域上需要高速处理以进行位置对准 同时获得具有小尺寸的视频处理电路，其中通过使用DUV（远紫外）光的光学系统或电子的视频检测系统获得像素尺寸等于或小于0.2μm的视频信号 光束。 例如，用于检测位置间隙的搜索区域被设置为±4像素，而在一个基板上安装有多个视频处理电路，每个视频处理电路由能够执行k个通道的处理的LSI构成，从而实现高速 视频处理部分具有小尺寸。

公开(公告)号：US06456951B1

公开(公告)日：2002-09-24

申请号：US09553944

申请日：2000-04-21

申请人： Shunji Maeda ,  Yasuhiro Yoshitake ,  Kenji Oka ,  Masataka Shiba ,  Atsushi Shimoda

发明人： Shunji Maeda ,  Yasuhiro Yoshitake ,  Kenji Oka ,  Masataka Shiba ,  Atsushi Shimoda

IPC分类号： G06F1132

CPC分类号： H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention is related to an inspection data processing method for processing inspection data composed of coordinates data and characteristic quantity data about a defect generated on a subject of inspection detected with a visual inspection apparatus. The inspection data processing method comprises the following steps: a preparation step of storing a first fatality judgment data group corresponding to the kinds of areas on the subject of inspection and a second fatality judgment data group corresponding to categories of defects beforehand; a first fatality judgment step of judging a first fatality level of a defect corresponding to the kind of an area where the defect exists; a category giving step of giving category to the defect in the inspection data; and a second fatality judgment step of judging a second fatality of the defect based on second fatality judgment data selected according to the category which are given based on the first fatality level of defects judged in the first fatality judgment step.

摘要翻译： 本发明涉及一种用于处理检查数据的检查数据处理方法，该检查数据由关于在用目视检查装置检测到的检查对象上产生的缺陷的坐标数据和特征量数据组成。 检查数据处理方法包括以下步骤：预先存储与检查对象的区域的种类对应的第一死亡判定数据组和对应于缺陷类别的第二死亡判定数据组的准备步骤; 判断与存在缺陷的区域的种类相对应的缺陷的第一死亡水平的第一死亡判定步骤; 类别给出检查数据中的缺陷类别的步骤; 以及第二死亡判定步骤，基于根据在第一死亡判定步骤中判断的缺陷的第一死亡水平给出的根据类别选择的第二死亡判定数据来判断缺陷的第二死亡。

公开(公告)号：US08811712B2

公开(公告)日：2014-08-19

申请号：US13141375

申请日：2009-10-22

申请人： Shunji Maeda ,  Kaoru Sakai ,  Hidetoshi Nishiyama

发明人： Shunji Maeda ,  Kaoru Sakai ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G01N21/95623 ,  G06T7/001 ,  G06T2207/30148 ,  H01L22/12

摘要： The invention provides a defect inspection method and a defect inspection device which enable a defect to be inspected regardless of optical conditions. The invention comprises the steps of setting a target local region and a plurality of corresponding local regions in the image signals, the target local region including a target pixel and an area surrounding the target pixel, the corresponding local regions including pixels corresponding to the target pixel and areas surrounding the corresponding pixels; searching similarities between the image signal of the target local region and the image signals of the plurality of corresponding local regions; determining a plurality of image signals that represent corresponding local regions and are similar to the image signal of the target local region; and comparing the image signal of the target local region with the image signals that represent the corresponding local regions.

摘要翻译： 本发明提供一种缺陷检查方法和缺陷检查装置，其能够在不考虑光学条件的情况下检查缺陷。 本发明包括以下步骤：在图像信号中设置目标局部区域和多个对应的局部区域，目标局部区域包括目标像素和围绕目标像素的区域，对应的局部区域包括与目标像素对应的像素 和相应像素周围的区域; 搜索所述目标局部区域的图像信号与所述多个对应的局部区域的图像信号之间的相似度; 确定表示对应的局部区域并且与目标局部区域的图像信号相似的多个图像信号; 并将目标局部区域的图像信号与表示对应的局部区域的图像信号进行比较。

公开(公告)号：US20110182496A1

公开(公告)日：2011-07-28

申请号：US13058223

申请日：2009-07-13

申请人： Kaoru Sakai ,  Shunji Maeda

发明人： Kaoru Sakai ,  Shunji Maeda

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G01R31/311 ,  G06T7/001 ,  G06T2207/30121 ,  G06T2207/30148

摘要： A defect inspection method for inspecting a defect(s) on an object to be inspected, within a step for determining parameter includes: a step for extracting a defect candidate on the object to be inspected with using said discriminant function with determining an arbitrary parameter; and a step for automatically renewing the parameter of said discriminant function, upon basis of teaching of defect information relating to the defect candidate, which is extracted in the step for extracting the defect candidate.

摘要翻译： 在确定参数的步骤中，检查待检查对象的缺陷的缺陷检查方法包括：通过使用所述判别函数确定任意参数来提取待检查对象的缺陷候选的步骤; 以及基于在提取缺陷候选的步骤中提取的与缺陷候选相关的缺陷信息的教导，自动更新所述判别函数的参数的步骤。

公开(公告)号：US20100053319A1

公开(公告)日：2010-03-04

申请号：US12591179

申请日：2009-11-12

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00 ,  H04N7/18

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.

摘要翻译： 根据本发明，对于对相同的两个图案的相应区域中的图像进行比较并且确定图像之间的不匹配部分的图像的图案检查装置是缺陷，多个检测系统和多个对应的图像比较方法是 提供。 利用这种结构，可以降低由于膜厚度差异而产生的图案的不均匀亮度的影响，可以进行高灵敏度图案检查，可以显示各种缺陷，并且图案检查装置可以应用于 在广泛的范围内进行处理。 此外，图案检查装置还包括用于转换多个不同处理单元的比较图像的图像信号的色调的单元，并且当在相同图案中出现亮度差时，可以正确地检测缺陷。

公开(公告)号：US20080292176A1

公开(公告)日：2008-11-27

申请号：US12153329

申请日：2008-05-16

申请人： Kaoru Sakai ,  Shunji Maeda

发明人： Kaoru Sakai ,  Shunji Maeda

IPC分类号： G06K9/64

CPC分类号： G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of areas corresponding to patterns each formed so as to be the same pattern and determining a non-coincident portion of the image as a defect, an image comparison processing unit configured with a processing system mounting a plurality of CPUs operating in parallel is provided, whereby an effect of brightness irregularity between the comparison images generated from a difference of a film thickness, a difference of a pattern thickness, and the like can be reduced, and a highly sensitive pattern inspection can be performed without setting parameters. Further, a feature amount of each pixel is calculated between the comparison images, and a plurality of feature amounts are compared, so that distinction between a defect and a noise, which is impossible by a luminance value, can be performed with high accuracy.

摘要翻译： 在图案检查装置中，对与各图形形成的图案相对应的图像的图像进行比较，并且将图像的非重合部分确定为缺陷，图像比较处理单元配置有安装了多个 提供了并行操作的CPU，由此可以减少从膜厚度差异，图案厚度差等产生的比较图像之间的亮度不均匀性的影响，并且可以不进行高灵敏度的图案检查而没有 设置参数。 此外，在比较图像之间计算每个像素的特征量，并且比较多个特征量，从而可以以高精度执行由亮度值不可能的缺陷和噪声之间的区别。

公开(公告)号：US20070177787A1

公开(公告)日：2007-08-02

申请号：US11655226

申请日：2007-01-19

申请人： Shunji Maeda ,  Kaoru Sakai

发明人： Shunji Maeda ,  Kaoru Sakai

IPC分类号： G06K9/00

CPC分类号： G06K9/00557 ,  G06T7/001

摘要： A fault inspection method and apparatus in which the scattergram is separated or objects of comparison are combined in such a manner as to reduce the difference between an inspection object image and a reference image. As a result, the difference between images caused by the thickness difference in the wafer can be tolerated and the false information generation prevented without adversely affecting the sensitivity.

摘要翻译： 将分散图分离的故障检查方法和装置或比较对象组合起来，以减少检查对象图像与参考图像之间的差异。 结果，可以容忍由晶片的厚度差导致的图像之间的差异，并且可以防止错误的信息产生而不会不利地影响灵敏度。

公开(公告)号：US20060159330A1

公开(公告)日：2006-07-20

申请号：US11328231

申请日：2006-01-10

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus, influences of pattern brightness variations that is caused in association with, for example, a film thickness difference or a pattern width variation can be reduced, high sensitive pattern inspection can be implemented, and a variety of defects can be detected. Thereby, the pattern inspection apparatus adaptable to a broad range of processing steps is realized. In order to realize this, the pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors capable of synchronously acquiring images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes means of detecting a statistical offset value from the feature amount to be a defect, thereby enabling the defect to be properly detected even when a brightness difference is occurring in association with film a thickness difference in a wafer.

摘要翻译： 在图案检查装置中，可以减少与膜厚差或图案宽度变化相关联引起的图案亮度变化的影响，可以实现高灵敏度图案检查，并且可以检测各种缺陷 。 由此，可以实现适应于广泛的处理步骤的图案检查装置。 为了实现这一点，本发明的图案检查装置对与形成为相同图案的图案相对应的区域的图像进行比较，从而确定跨越图像的不匹配部分是缺陷。 该装置包括能够同时获取彼此不同的可移动多个检测系统的图像的多个传感器，以及与其对应的图像比较部。 此外，该装置包括检测从特征量成为缺陷的统计偏移值的装置，从而即使当与膜中的厚度差相关联地发生亮度差时，也能够适当地检测缺陷。

公开(公告)号：US08427634B2

公开(公告)日：2013-04-23

申请号：US12647246

申请日：2009-12-24

申请人： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

发明人： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/956

摘要： A pattern inspection apparatus is provided to compare images of regions, corresponding to each other, of patterns that are formed so as to be identical and judge that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

摘要翻译： 提供了一种图案检查装置，用于将形成为相同的图案的彼此对应的区域的图像进行比较，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。