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    Method and apparatus for processing inspection data
    1.
    发明授权
    Method and apparatus for processing inspection data 有权
    检验数据处理方法和装置

    公开(公告)号：US06456951B1

    公开(公告)日：2002-09-24

    申请号：US09553944

    申请日：2000-04-21

    申请人： Shunji Maeda ,  Yasuhiro Yoshitake ,  Kenji Oka ,  Masataka Shiba ,  Atsushi Shimoda

    发明人： Shunji Maeda ,  Yasuhiro Yoshitake ,  Kenji Oka ,  Masataka Shiba ,  Atsushi Shimoda

    IPC分类号： G06F1132

    CPC分类号： H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

    摘要： The present invention is related to an inspection data processing method for processing inspection data composed of coordinates data and characteristic quantity data about a defect generated on a subject of inspection detected with a visual inspection apparatus. The inspection data processing method comprises the following steps: a preparation step of storing a first fatality judgment data group corresponding to the kinds of areas on the subject of inspection and a second fatality judgment data group corresponding to categories of defects beforehand; a first fatality judgment step of judging a first fatality level of a defect corresponding to the kind of an area where the defect exists; a category giving step of giving category to the defect in the inspection data; and a second fatality judgment step of judging a second fatality of the defect based on second fatality judgment data selected according to the category which are given based on the first fatality level of defects judged in the first fatality judgment step.

    摘要翻译： 本发明涉及一种用于处理检查数据的检查数据处理方法，该检查数据由关于在用目视检查装置检测到的检查对象上产生的缺陷的坐标数据和特征量数据组成。 检查数据处理方法包括以下步骤：预先存储与检查对象的区域的种类对应的第一死亡判定数据组和对应于缺陷类别的第二死亡判定数据组的准备步骤; 判断与存在缺陷的区域的种类相对应的缺陷的第一死亡水平的第一死亡判定步骤; 类别给出检查数据中的缺陷类别的步骤; 以及第二死亡判定步骤，基于根据在第一死亡判定步骤中判断的缺陷的第一死亡水平给出的根据类别选择的第二死亡判定数据来判断缺陷的第二死亡。

    Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods
    3.
    发明授权
    Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods 有权
    确定电路图案检查缺陷检测方法的选择方法及其检查方法

    公开(公告)号：US06334097B1

    公开(公告)日：2001-12-25

    申请号：US09225513

    申请日：1999-01-06

    申请人： Yasuhiro Yoshitake ,  Masataka Shiba ,  Atsushi Shimoda

    发明人： Yasuhiro Yoshitake ,  Masataka Shiba ,  Atsushi Shimoda

    IPC分类号： G06F1132

    CPC分类号： H01L22/20 ,  G01N21/95607 ,  H01L2924/0002 ,  H01L2924/00

    摘要： From the coordinate data of defects detected on the circuit patterns, the areas where the defects belong are identified. The sizes of the defects detected are compared with the data to determine the lethality to thereby determine the lethality of the defects. Further, the severity of the defects is calculated from the sizes of the defects to thereby select the review object in the descending order of the severity. Thereby, when inspecting the circuit patterns on a semiconductor wafer or the like, the lethality of the defects can automatically be determined even though the review is not carried out, enhancing the efficiency of the inspection. To perform the review with efficiency, the defects to be reviewed are automatically selected, while the quality of the inspection itself is maintained.

    摘要翻译： 根据在电路图案上检测到的缺陷的坐标数据，识别缺陷所在的区域。 将检测到的缺陷的大小与数据进行比较以确定致死率，从而确定缺陷的致死率。 此外，根据缺陷的大小计算缺陷的严重性，从而以严重性的降序选择检查对象。因此，当检查半导体晶片等上的电路图案时，缺陷的致死性可以 即使不进行审查，自动确定，提高检查效率。 为了有效地进行审查，将自动选择要检查的缺陷，同时保持检查质量。

    Method and apparatus for pattern detection
    6.
    发明授权
    Method and apparatus for pattern detection 失效
    模式检测方法和装置

    公开(公告)号：US4993837A

    公开(公告)日：1991-02-19

    申请号：US301962

    申请日：1989-01-25

    申请人： Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Naoto Nakashima ,  Masataka Shiba

    发明人： Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Naoto Nakashima ,  Masataka Shiba

    IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

    CPC分类号： G03F9/70

    摘要： A method and a system for pattern detection are disclosed in which a laser beam high in directivity is emitted from a laser beam source, the laser beam emitted from the laser beam source is irradiated on an uneven pattern to be detected on an object, the light component of a frequency corresponding to the cut-off frequency of an objective lens is removed from the light reflected from the object when an image of the pattern on the object is formed through an objective lens, the optical image thus formed is received by a photoelectric converting device for producing a signal waveform representing the pattern free of a signal of the frequency corresponding to the cut-off frequency, and the pattern is detected from a signal produced from the photoelectric converting device.

    摘要翻译： 公开了一种用于图案检测的方法和系统，其中从激光束源发射高方向性的激光束，从激光束源发射的激光束照射在待检测物体上的不均匀图案上，光 当通过物镜形成物体上的图案的图像时，从物体反射的光中除去与物镜的截止频率相对应的频率的分量，由此形成的光学图像由光电 用于产生表示没有与截止频率相对应的频率的信号的模式的信号波形的转换装置，并且根据从光电转换装置产生的信号检测图案。

    Illumination apparatus for exposure
    8.
    发明授权
    Illumination apparatus for exposure 失效
    曝光照明装置

    公开(公告)号：US4819033A

    公开(公告)日：1989-04-04

    申请号：US113514

    申请日：1987-10-28

    申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima

    发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima

    IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  H01S3/101 ,  H01S3/106 ,  G03B27/42 ,  G03B27/72

    CPC分类号： G03F7/70558 ,  G03F7/2006 ,  G03F7/70041 ,  G03F7/70058

    摘要： An illumination apparatus is disclosed which is suitable for use in a projection/exposure system for projecting an image of a circuit pattern of a reticle on a semiconductor wafer through a projection lens. The illumination apparatus includes an excimer laser for emitting a pulsed laser beam, an optical system for illuminating the reticle with a plurality of laser pulses emitted from the excimer laser so that laser pulses having passed through the reticle impinge on the semiconductor wafer in different directions through the projection lens, and a light intensity control device for controlling the light intensity of each of the laser pulses so that the laser pulses equally contribute to the reaction of a light sensitive material which is provided on the semiconductor wafer, with light.

    摘要翻译： 公开了一种适用于投影/曝光系统的照明装置，用于通过投影透镜在半导体晶片上投射标线片的电路图案的图像。 照明装置包括用于发射脉冲激光束的准分子激光器，用于从准分子激光器发射的多个激光脉冲照射标线片的光学系统，使得已经穿过掩模版的激光脉冲以不同方向穿过半导体晶片 投影透镜和用于控制每个激光脉冲的光强度的光强度控制装置，使得激光脉冲同样有助于设置在半导体晶片上的光敏材料与光的反应。