公开(公告)号：US06259662B1

公开(公告)日：2001-07-10

申请号：US09210588

申请日：1998-12-14

Applicant: Shigeru Matsui ,  Kazuhiro Sugiyama ,  Yukari Hiratsuka ,  Noboru Yashima ,  Naoki Kizu

Inventor： Shigeru Matsui ,  Kazuhiro Sugiyama ,  Yukari Hiratsuka ,  Noboru Yashima ,  Naoki Kizu

IPC: G11B700

CPC classification number: G11B19/28

Abstract: When a detected value of the signal processing speed from a frequency comparator is larger than a prescribed value input from an input terminal, the rotation control of a disk is switched from constant linear velocity control to constant angular velocity control using an error signal from an arithmetic unit. Alternatively, when a detected value of the rotational velocity from a frequency comparator is larger than a prescribed value input form an input terminal, the rotation control of the disk is switched from the constant angular velocity control into the constant linear velocity control.

Abstract translation: 当来自频率比较器的信号处理速度的检测值大于从输入端子输入的规定值时，使用来自算术的误差信号将盘的旋转控制从恒定线速度控制切换到恒定角速度控制 单元。 或者，当来自频率比较器的旋转速度的检测值大于从输入端子输入的规定值时，盘的旋转控制从恒定角速度控制切换到恒定线速度控制。

公开(公告)号：US06256092B1

公开(公告)日：2001-07-03

申请号：US09198093

申请日：1998-11-23

Applicant: Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

Inventor： Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

IPC: G01N2188

CPC classification number: G01N21/9505 ,  G01N21/9501

Abstract: A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.

Abstract translation: 一种缺陷检查装置，用于根据来自通过将光束照射在样品上的样品的光信息，检测存在于半导体样品表面和/或样品内部的缺陷，该检测装置包括检测装置， 存在缺陷的深度方向和基于光信息的缺陷分布; 用于设置存在缺陷的深度方向上的位置的设定装置; 以及用于显示由检测装置获得的缺陷的分布的装置，显示装置显示与由设置装置设置的深度方向上的位置相对应的缺陷的分布。

公开(公告)号：US5892581A

公开(公告)日：1999-04-06

申请号：US936242

申请日：1997-09-24

Applicant: Toshihiko Sakaide ,  Masahito Ito ,  Yoshio Fujii ,  Shigeru Matsui

Inventor： Toshihiko Sakaide ,  Masahito Ito ,  Yoshio Fujii ,  Shigeru Matsui

IPC: G01N21/27 ,  G01N30/74 ,  G01N21/33

CPC classification number: G01N21/274 ,  G01N30/74

Abstract: In order to suppress base line drift due to change in a light source and to start analysis with a short waiting time so as to improve quantitative accuracy of analysis, a detected signal in a measurement wavelength and a detected signal in a reference wavelength are measured at each of arbitrary light intensity points by varying light intensity of a light source, and the corresponding relationship between the wavelengths is stored. An incident light intensity of the measurement wavelength is estimated from a detected signal in the reference wavelength based on the stored data.

Abstract translation: 为了抑制由于光源的变化引起的基线漂移并且以等待时间短的开始分析，以提高分析的定量精度，测量测量波长中的检测信号和参考波长的检测信号在 通过改变光源的光强度的任意光强度点中的每一个，并且存储波长之间的对应关系。 基于存储的数据，从参考波长的检测信号估计测量波长的入射光强度。

公开(公告)号：US4733188A

公开(公告)日：1988-03-22

申请号：US850113

申请日：1986-04-10

Applicant: Kensuke Sekihara ,  Shigeru Matsui ,  Hideki Kohno

Inventor： Kensuke Sekihara ,  Shigeru Matsui ,  Hideki Kohno

IPC: A61B10/00 ,  A61B5/055 ,  G01R33/48 ,  G01R33/561 ,  G01R33/20

CPC classification number: G01R33/5615 ,  G01R33/5616

Abstract: In imaging methods represented by the echo-planar method, i.e., in a method including a step of measuring the spin echos while applying a fixed gradient magnetic field to an object and applying a gradient field G.sub.Y periodically inverted in sense to the object and a step of obtaining the spin distribution image in the spatial domain by applying two-dimensional Fourier transform to the measured data, measurement is repeated a plurality of times while altering the phase of the applied waveform of G.sub.X, and the spin density image is derived by applying two-dimensional Fourier transform to a plurality of sets of data groups thus obtained.

Abstract translation: 在由回波平面方法表示的成像方法中，即在包括测量自旋回波的步骤的方法中，同时向对象施加固定的梯度磁场，并且向对象施加周期性反转的渐变场GY，并且步骤 通过对测量数据应用二维傅里叶变换获得空间域中的自旋分布图像，在改变GX的施加波形的相位的同时重复测量多次，并且通过应用两个方法导出自旋密度图像 维数傅里叶变换到由此获得的多组数据组。

公开(公告)号：US4727325A

公开(公告)日：1988-02-23

申请号：US919767

申请日：1986-10-16

Applicant: Shigeru Matsui ,  Kensuke Sekihara ,  Hideki Kohno

Inventor： Shigeru Matsui ,  Kensuke Sekihara ,  Hideki Kohno

IPC: G01R33/54 ,  G01R33/561 ,  G01R33/20

CPC classification number: G01R33/54 ,  G01R33/5615 ,  G01R33/5616

Abstract: An NMR imaging method using a rotating field gradient is disclosed in which transverse magnetization is prepared in a portion of an object to be inspected, by the 90.degree.-180.degree. RF pulse excitation, a rotating field gradient is generated to perform a sampling operation for an output signal in a state that the position of signal in a phase space is revolved, the intensity or rotational speed of the rotating field gradient is varied stepwise or continuously to obtain data arranged on concentric circles or a spiral in the phase space, and the data thus obtained undergoes Fourier transformation in each of a plurality of radial directions or two-dimensional Fourier transformation, to form an image of spin distribution.

Abstract translation: 公开了使用旋转磁场梯度的NMR成像方法，其中通过90°-180°RF脉冲激励在待测物体的一部分中制备横向磁化，产生旋转场梯度以执行采样操作 在相位空间中的信号的位置旋转的状态下的输出信号，旋转场梯度的强度或旋转速度逐步或连续地变化，以获得布置在相空间中的同心圆或螺旋上的数据，并且 由此获得的数据在多个径向方向或二维傅里叶变换中进行傅里叶变换，以形成自旋分布的图像。

公开(公告)号：US4716369A

公开(公告)日：1987-12-29

申请号：US746663

申请日：1985-06-20

Applicant: Kensuke Sekihara ,  Shigeru Matsui ,  Hideki Kohno ,  Etsuji Yamamoto ,  Hidemi Shiono

Inventor： Kensuke Sekihara ,  Shigeru Matsui ,  Hideki Kohno ,  Etsuji Yamamoto ,  Hidemi Shiono

IPC: G01R33/485 ,  G01R33/561 ,  G01R33/20

CPC classification number: G01R33/485 ,  G01R33/5615 ,  G01R33/5616

Abstract: The present invention is an imaging method using three-dimensional NMR to which an echo-planar method is applied. After excitation of nuclear spins, the gradient magnetic field Gx for phase-encoding is applied and there is repeated a sequence of measuring and obtaining an echo train of spin-echoes with a constant gradient magnetic field Gx and a periodically-inverted gradient magnetic field Gy, as varying the amount of encoding, so as to obtain the three-dimensional imaging by the Fourier-conversion. Moreover, after the selective excitation of spins within an X-Y surface, a 180.degree. radio frequency pulse is applied. As varying the time difference .tau..sub..epsilon. between the interval from the excitation until the application of the 180.degree. radio frequency pulse and the interval from the application thereof until a peak of a first echo of an echo train, three-dimensional imaging is carried out with a chemical shift axis as one axis by repeating the sequence and accomplishing Fourier-conversion with .tau..sub..epsilon. as a numerical variable.

Abstract translation: 本发明是使用采用回波平面法的三维NMR的成像方法。 在激励核自旋之后，施加用于相位编码的梯度磁场Gx，并且重复测量并获得具有恒定梯度磁场Gx和周期性反转梯度磁场Gy的自旋回波回波序列的序列 ，因为改变编码量，从而通过傅里叶变换获得三维成像。 此外，在X-Y表面中的自旋选择性激发之后，施加180°射频脉冲。 随着从激励到施加180°射频脉冲的间隔与从应用到应用的间隔直到回波列的第一回波的峰值之间的时间差τεε改变，三维成像是 化学位移轴作为一个轴，通过重复该序列，并以tauε作为数值变量进行傅里叶变换。

公开(公告)号：US08878119B2

公开(公告)日：2014-11-04

申请号：US13544739

申请日：2012-07-09

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: H03K17/78 ,  G01N21/95 ,  G01N21/94

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

Abstract translation: 在常规污染物颗粒/缺陷检查方法中，如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下，则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置，其中使用脉冲激光器作为光源，并且激光束通量被分割成多个激光束，其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

公开(公告)号：US20140302679A1

公开(公告)日：2014-10-09

申请号：US14350314

申请日：2012-09-13

Applicant: Kazuyuki Kakuta ,  Toshihiko Onozuka ,  Shigeru Matsui ,  Yoshisada Ebata ,  Norio Hasegawa

Inventor： Kazuyuki Kakuta ,  Toshihiko Onozuka ,  Shigeru Matsui ,  Yoshisada Ebata ,  Norio Hasegawa

IPC: H01L21/3065 ,  G03F1/26 ,  H01L21/308

CPC classification number: H01L21/3065 ,  G03F1/0046 ,  G03F1/26 ,  G03F1/28 ,  G03F1/30 ,  H01L21/3085

Abstract: A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.

Abstract translation: 通过使用相移掩模形成非对称图案的技术，以及制造衍射光栅和半导体器件的技术，能够提高产品的精度并能缩短制造时间。 在通过使用相移掩模（其中周期性地布置有遮光部分和透光部分）制造衍射光栅的方法中，从照明光源发射的光透射穿过相移掩模，并且光致抗蚀剂在 通过提供由通过该相移掩模的透射产生的零衍射级光和正的第一衍射级光之间的干涉而暴露于Si晶片的表面到Si晶片的表面上的衍射光栅和具有闪耀十字 在Si晶片上形成截面形状。

公开(公告)号：US20130222789A1

公开(公告)日：2013-08-29

申请号：US13879816

申请日：2011-11-14

Applicant: Shigeru Matsui ,  Shuhei Yamamura ,  Hideyuki Akiyama ,  Yoshisada Ebata

Inventor： Shigeru Matsui ,  Shuhei Yamamura ,  Hideyuki Akiyama ,  Yoshisada Ebata

IPC: G01J3/42

CPC classification number: G01J3/42 ,  G01J3/0218 ,  G01J3/28 ,  G01J2003/2866 ,  G01N21/05 ,  G01N21/3151

Abstract: In a spectrophotometer of the single-beam type, highly stable transmission and absorption spectra can be obtained with a high SNR while drifting is suppressed and for a long time even when the amount of light from the light source is varied over time. The spectrophotometer includes: a light source; a sample cell; a polychromator that generates a transmission spectrum of a sample in the sample cell by dispersing a portion of light from the light source that has passed through the sample into a plurality of spectral components; an image sensor that detects the transmission spectrum of the sample; a light source monitoring photodetector that detects a portion of the light from the light source that has not passed through the sample cell; and an operation unit that corrects the transmission spectrum of the sample by using an output signal from the light source monitoring photodetector.

Abstract translation: 在单光束型分光光度计中，即使当来自光源的光量随时间变化时，也可以以高信噪比获得漂移时的高稳定的透射和吸收光谱。 分光光度计包括：光源; 样品池; 多色分光器，其通过将来自已经通过所述样品的光源的一部分光分散到多个光谱分量中而在所述样品池中产生样品的透射光谱; 检测样品的透射光谱的图像传感器; 光源监测光电检测器，其检测未通过样品池的来自光源的光的一部分; 以及通过使用来自光源监视光电检测器的输出信号来校正样品的透射光谱的操作单元。

公开(公告)号：US08493557B2

公开(公告)日：2013-07-23

申请号：US13202681

申请日：2010-01-22

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2201/103

Abstract: A surface inspecting apparatus rotates a semiconductor wafer 100 (inspection object) as a main scan while translating the semiconductor wafer 100 as an auxiliary scan, illuminates the surface of the semiconductor wafer 100 with illuminating light 21, thereby forms an illumination spot 3 as the illumination area of the illuminating light 21, detects scattered or diffracted or reflected light from the illumination spot, and detects a foreign object existing on the surface of the semiconductor wafer 100 or in a part of the semiconductor wafer 100 in the vicinity of the surface based on the result of the detection. In the surface inspecting apparatus, the translation speed of the auxiliary scan is controlled according to the distance from the rotation center of the semiconductor wafer 100 in the main scan to the illumination spot. With this control, the inspection time can be shortened while the deterioration in the detection sensitivity and the increase in the thermal damage during the surface inspection are suppressed.