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公开(公告)号：US11675272B2
公开(公告)日：2023-06-13
申请号：US17460121
申请日：2021-08-27
发明人： Chih-Ping Yen , Yen-Shuo Su , Chieh Hsieh , Shang-Chieh Chien , Chun-Lin Chang , Li-Jui Chen , Heng-Hsin Liu
CPC分类号： G03F7/70033 , H05G2/006 , H05G2/008
摘要： Supersonic gas jets are provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by the lithography process away from a scanner side and towards a debris collection device. The gas jets can be positioned in a variety of useful orientations, with adjustable gas flow velocity and gas density in order to prevent up to nearly 100% of the tin debris from migrating to the reticle on the scanner side.
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公开(公告)号：US20230142835A1
公开(公告)日：2023-05-11
申请号：US18095114
申请日：2023-01-10
IPC分类号： G03F7/20 , G06T7/00 , H04N23/695
CPC分类号： G03F7/70591 , G03F7/70033 , G06T7/001 , H04N23/695 , G06T2207/20224 , H04N23/555
摘要： A method for inspecting an extreme ultraviolet (EUV) light source includes: removing a collector mirror of the EUV light source from a collector chamber; installing an inspection apparatus within the collector chamber, the apparatus including a selectively extendable and retractable member and a camera at one end of the member; operating a first actuator to extend the member along a path through the interior chamber of the EUV light source, thereby moving the camera to a given position within the interior chamber of the EUV light source; operating a second actuator to pan the camera about an axis of rotation, thereby establishing a given camera orientation within the interior of the EUV light source; and, capturing an image of the interior chamber of the EUV light source with the camera while the camera is at the given position and orientation established by the operation of the first and second actuators.
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公开(公告)号：US11605477B1
公开(公告)日：2023-03-14
申请号：US17460142
申请日：2021-08-27
摘要： An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
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公开(公告)号：US11533799B1
公开(公告)日：2022-12-20
申请号：US17372294
申请日：2021-07-09
发明人： Hsin-Feng Chen , Ming-Hsun Tsai , Li-Jui Chen , Shang-Chieh Chien , Heng-Hsin Liu , Cheng-Hao Lai , Yu-Huan Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Chiao-Hua Cheng
摘要： A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.
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公开(公告)号：US11520246B1
公开(公告)日：2022-12-06
申请号：US17461456
申请日：2021-08-30
发明人： Shih-Yu Tu , Shao-Hua Wang , Yen-Hao Liu , Chueh-Chi Kuo , Li-Jui Chen , Heng-Hsin Liu
IPC分类号： G03F7/20
摘要： In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.
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公开(公告)号：US11520243B2
公开(公告)日：2022-12-06
申请号：US17306631
申请日：2021-05-03
发明人： Shao-Hua Wang , Chueh-Chi Kuo , Kuei-Lin Ho , Zong-You Yang , Cheng-Wei Sun , Wei-Yuan Chen , Cheng-Chieh Chen , Heng-Hsin Liu , Li-Jui Chen
IPC分类号： G03F7/20
摘要： A method includes transferring a wafer over a wafer stage on a wafer table. The wafer table includes a table body, a wafer stage, a first sliding member, a second sliding member, a first cable, a first bracket and a second bracket, and a stopper. The second sliding member is movable along a first direction, in which the first sliding member is coupled to a track of the second sliding member, the first sliding member being movable along a second direction vertical to the first direction. The first bracket and the second bracket are connected by a leaf spring. The method includes moving the wafer stage toward the edge of the table body, such that the wafer stage pushes the first cable outwardly, such that the leaf spring is moved toward a first protective film on a surface of the stopper facing the leaf spring.
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公开(公告)号：US20220100100A1
公开(公告)日：2022-03-31
申请号：US17239952
申请日：2021-04-26
IPC分类号： G03F7/20
摘要： A particle removal device, along with methods of using such, are described. The device includes a handheld module having a body. A first one or more channels and a second one or more channels are formed in the body. The body includes a nozzle, and the handheld module is configured to provide suction by the nozzle and to inject an ionized fluid stream by the nozzle. The body further includes a handle attached to the nozzle.
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公开(公告)号：US20180128597A1
公开(公告)日：2018-05-10
申请号：US15864458
申请日：2018-01-08
IPC分类号： G01B11/02 , G03F9/00 , H01L23/544
CPC分类号： G01B11/02 , G03F9/7011 , G03F9/7084 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： A wafer alignment apparatus includes a light source, a light detection device, and a rotation device configured to rotate a wafer. The light source is configured to provide a light directed to the wafer. The light detection device is configured to detect reflected light intensity from the wafer to locate at least one wafer alignment mark of wafer alignment marks separated by a plurality of angles. At least two of those angles are equal.
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公开(公告)号：US09709904B2
公开(公告)日：2017-07-18
申请号：US14748543
申请日：2015-06-24
发明人： Tung-Li Wu , Chin-Hsiang Lin , Heng-Hsin Liu , Jui-Chun Peng
CPC分类号： G03F7/70725 , G03F7/70066 , G03F7/70283 , G03F7/70341 , G03F7/70641
摘要： A lithography apparatus includes a plurality reticle edge masking assemblies (REMAs), wherein each REMA of the plurality of REMAs is positioned to receive one of a plurality of light beams, and each REMA of the plurality of REMAs comprises a movable slit for passing the received light beam therethrough. The lithography apparatus includes a controller for controlling a speed of the movable slit based on a size of the movable slit, an intensity of the one or more collimated light beams, or a material to be patterned. The lithography apparatus further includes a single mask having a single pattern, wherein the mask is configured to receive light from every REMA of the plurality of REMAs. The lithography apparatus includes a projection lens configured to receive light transmitted through the single mask, wherein the lithography apparatus is configured to introduce an immersion liquid into a space adjacent to the projection lens.
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