摘要:
In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V2 of the tank, and a gas pressure detector and a gas temperature detector for gas inside the tank, joined in a branched form to a gas supply line, with the valve V2 connected to vacuum. The calibration unit is used to calibrate a flow rate controller based on performing a first measurement of gas temperature and pressure inside the tank, and then building-up gas into the tank, and then performing a second measurement of gas temperature and pressure, and from respective measured values, calculating gas flow rate Q and by comparing a set gas flow rate and calculated gas flow rate Q, performing flow rate calibration.
摘要:
A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要:
A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要:
To provide a fluid control apparatus capable of reducing the space, while reducing the cost.A fluid control apparatus 1 has a fluid controlling unit 2 and a fluid introducing unit 3. The fluid introducing unit 3 is divided into three parts: a first and a second inlet-side shutoff/open parts 5, 6 disposed on the inlet side, each made up of 2×N/2 on-off valves 23, and a fluid controlling unit-side shutoff/open part 7 made up of 4×M on-off valves 23, disposed between the first and second inlet-side shutoff/open parts 5, 6 and the fluid controlling unit 2.
摘要:
An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.
摘要:
The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P2 of the control pressure detector and a set value Pst for control pressure are input, wherein the controller supplies a control signal to a piezoelectric element driving unit of the pressure regulating valve using a proportional control system to perform valve opening regulation, in which the proportional control system of the controller is set to control to bring about a residual deviation in control pressure by disabling an integral action.
摘要:
A pressure control valve piezoelectric element driving circuit is provided for a pressure type flow rate control device provided with a flow rate self-diagnosis function for comparing initial pressure drop characteristics data measured and with pressure drop characteristics data in a flow rate diagnosis which are measured under conditions that are the same for both measurements to detect malfunction in flow rate control from a difference between both characteristics data, wherein a first discharge circuit slowly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a step-down command signal from a CPU, through a step-down command circuit to step down the voltage, and a second discharge circuit that rapidly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a high-speed step-down command signal from the CPU, through a high-speed step-down command circuit to step down the voltage.
摘要:
A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.
摘要:
In a step motor driven cam valve a stem freely ascends and descends within a body having an in-flow passage, an out-flow passage, a valve chamber, and a valve seat. The stem is descended by an actuator, composed of a step motor and a cam mechanism located at a position above the stem, that changes a rotational motion of the step motor to a linear motion and transmits the linear motion to the stem. A diaphragm within a valve chamber or a valve body at a lower end part of the stem rests on the valve seat. A lift support mechanism that supports the actuator to freely ascend and descend is arranged at a bonnet that covers the valve chamber. A height fine-adjustment mechanism, arranged at the lift supporting mechanism, finely adjusts the height of the actuator relative to the stem so as to perform zero-point adjustment of the valve.
摘要:
With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value.