公开(公告)号：US06284427B1

公开(公告)日：2001-09-04

申请号：US09308582

申请日：1999-08-05

申请人： Hiroshi Okazaki ,  Georg Pawlowski ,  Satoru Funato ,  Yoshiaki Kinoshita ,  Yuko Yamaguchi

发明人： Hiroshi Okazaki ,  Georg Pawlowski ,  Satoru Funato ,  Yoshiaki Kinoshita ,  Yuko Yamaguchi

IPC分类号： G03C173

CPC分类号： G03F7/039 ,  C08F8/00 ,  C08F8/14 ,  C08F8/18 ,  C08F212/14 ,  C08F257/02 ,  C08F2800/20 ,  C08F2810/30 ,  C08L25/18 ,  C09D125/18 ,  G03F7/0045 ,  Y10S430/119 ,  C08F12/14 ,  C08F216/125 ,  C08F220/14 ,  C08F220/06 ,  C08F112/14

摘要： A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

摘要翻译： 抗蚀剂组合物通过使酸性催化剂存在下使非酚质子溶剂如丙二醇单甲醚乙酸酯中的具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物反应来制备， 加入碱，并将光致酸产生剂直接加入到反应溶液中。 当使用二碳酸二烷基酯代替乙烯基醚化合物时，通过在碱性催化剂的存在下进行反应并直接向反应中加入光致酸产生剂制备抗蚀剂组合物。 因此，可以在不分离或纯化已经被催化反应取代的碱溶性聚合物的情况下制备抗蚀剂组合物。

公开(公告)号：US5846690A

公开(公告)日：1998-12-08

申请号：US615831

申请日：1996-03-14

申请人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Hiroshi Okazaki ,  Seiya Masuda ,  Natsumi Kawasaki ,  Satoru Funato ,  Georg Pawlowski

发明人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Hiroshi Okazaki ,  Seiya Masuda ,  Natsumi Kawasaki ,  Satoru Funato ,  Georg Pawlowski

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/038 ,  G03F7/30

CPC分类号： G03F7/0045

摘要： A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.

摘要翻译： 公开了一种辐射敏感性组合物，其包括（a）不溶于水但可溶于或能够在碱性水溶液中溶胀或能够溶胀的粘合剂，（b）由（b1）聚（N，O-缩醛） ）具有以下通式：其中R 3是烷基或取代或未取代的芳基，R 4是选自亚烷基，亚环烷基，烯烃或炔烃的二价基团，R 5是烷基，烯烃，炔烃或环烷基，X是-OCO-， -CO-或-NHCO-，p为不小于1的数，和/或（b2）具有羟基的酚化合物，该羟基被酸可以被可被切割的基团保护，（c ）当暴露于活性辐射时能够产生酸的光敏化合物，（d）当暴露于活性辐射时能够分解以形成由其衍生的中性化合物的碱，（e）增塑剂，和（f） 溶剂。

公开(公告)号：US5773191A

公开(公告)日：1998-06-30

申请号：US685850

申请日：1996-07-24

申请人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Satoru Funato ,  Natsumi Kawasaki ,  Hiroshi Okazaki ,  Georg Pawlowski

发明人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Satoru Funato ,  Natsumi Kawasaki ,  Hiroshi Okazaki ,  Georg Pawlowski

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03F7/032 ,  G03F7/30

CPC分类号： G03F7/0045 ,  Y10S430/106 ,  Y10S430/11

摘要： A radiation-sensitive composition is disclosed which includes: (a) a copolymer represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, Ar is a substituted or unsubstituted phenylene group or a substituted or unsubstituted cyclohexylene group, X is a divalent group represented by --SO.sub.2 -- or --CO--, m and n are individually an integer not less than 1; (b) a dissolution inhibitor composed of a compound represented by the general formula: ##STR2## wherein R.sup.3 is an alkyl group or a substituted or unsubstituted aryl group, R.sup.4 is an alkylene group, a cycloalkylene group, an alkenylene group or an alkynylene group, R.sup.5 is an alkyl group or an cycloalkyl group, Y is --OCO--, --CO-- or --NHCO--, and p is an integer not less than 1, or (b') a cross-linking agent; (c) a photosensitive compound capable of generating an acid when exposed to a radiation; and (e) a solvent.

摘要翻译： 公开了一种辐射敏感性组合物，其包括：（a）由以下通式表示的共聚物：其中R 1为氢原子或甲基，R 2为取代或未取代的烷基或取代或未取代的芳基 Ar为取代或未取代的亚苯基或取代或未取代的亚环己基，X为-SO 2 - 或-CO-表示的二价基，m和n分别为1以上的整数， （b）由以下通式表示的化合物组成的溶解抑制剂：其中R3为烷基或取代或未取代的芳基，R4为亚烷基，亚环烷基，亚烯基或亚炔基 ，R5是烷基或环烷基，Y是-OCO-，-CO-或-NHCO-，p是不小于1的整数，或（b'）交联剂; （c）当暴露于辐射时能够产生酸的光敏化合物; 和（e）溶剂。

公开(公告)号：US5691100A

公开(公告)日：1997-11-25

申请号：US623735

申请日：1996-03-29

申请人： Takanori Kudo ,  Seiya Masuda ,  Yoshiaki Kinoshita ,  Klaus Przybilla ,  Natsumi Endo ,  Natsumi Suehiro ,  Hiroshi Okazaki

发明人： Takanori Kudo ,  Seiya Masuda ,  Yoshiaki Kinoshita ,  Klaus Przybilla ,  Natsumi Endo ,  Natsumi Suehiro ,  Hiroshi Okazaki

IPC分类号： G03F7/004 ,  G03C1/54 ,  G03C1/56 ,  G03C1/685

CPC分类号： G03F7/0045 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122

摘要： A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.

摘要翻译： 提供了用于形成图案的材料，其具有宽的曝光宽容度，并且不太可能导致图案的尺寸变化随着曝光的变化。 该材料包含（A）具有在活性束照射时产生酸的能力的化合物，（B）能够产生碱或增加其碱度的化合物，（C）具有至少一个键的化合物可以与 酸和/或（D）不溶于水但可溶于碱性水溶液的化合物。

公开(公告)号：US5663035A

公开(公告)日：1997-09-02

申请号：US420787

申请日：1995-04-12

申请人： Seiya Masuda ,  Munirathna Padmanaban ,  Takanori Kudo ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Klaus Jurgen Przybilla

发明人： Seiya Masuda ,  Munirathna Padmanaban ,  Takanori Kudo ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Klaus Jurgen Przybilla

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045

摘要： A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

摘要翻译： 用于生产半导体元件的辐射敏感性混合物，其具有高灵敏度和高分辨率，其可以通过碱性水溶液开发，并且其基于新的概念，其中稳定的酸潜像由 使用辐射分解碱。 该混合物的特征在于包含作为必需组分的a）不溶于水但可溶于碱性水溶液的粘合剂; b1）具有至少一个可被酸切割的键的化合物，或b2）具有至少一个键的化合物，其通过酸与化合物a）交联; c）当照射时产生酸的化合物; 和d）碱性碘鎓化合物。

公开(公告)号：US5641594A

公开(公告)日：1997-06-24

申请号：US507301

申请日：1995-08-25

申请人： Takanori Kudo ,  Yuko Nozaki ,  Kazuya Nagao ,  Yuki Nanjo ,  Hiroshi Okazaki ,  Yoshiaki Kinoshita ,  Seiya Masuda ,  Munirathna Padmanaban ,  Natsumi Suehiro

发明人： Takanori Kudo ,  Yuko Nozaki ,  Kazuya Nagao ,  Yuki Nanjo ,  Hiroshi Okazaki ,  Yoshiaki Kinoshita ,  Seiya Masuda ,  Munirathna Padmanaban ,  Natsumi Suehiro

IPC分类号： G03F7/00 ,  G03F7/008 ,  G03F7/031 ,  G03C5/56 ,  G03F7/012 ,  G03F7/033

CPC分类号： G03F7/008 ,  G03F7/0007 ,  G03F7/031

摘要： A colored, photosensitive resin composition of a pigment dispersing-type is disclosed.The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of producing a nitrene when irradiated with an actinic radiation, (c) a pigment, and (d) a solvent. Preferably, the composition further contains (e) a heat crosslinking agent and/or (f) a compound having a polymerizable double bond in addition to the above ingredients.According to the present invention, the production of a color filter need not be performed in an inert gas atmosphere, does not require an oxygen barrier film and does not require heating during the period of from the exposure step to the development step. Thus, the use of the composition permits the color filter production steps to be made significantly simple so that the composition provides a great value in industrial utilization.

摘要翻译： PCT No.PCT / JP94 / 02085 Sec。 371日期1995年8月25日 102（e）日期1995年8月25日PCT 1994年12月12日PCT PCT。 公开号WO95 / 18399 日期：1995年7月6日公开了一种着色的颜料分散型感光性树脂组合物。 着色的感光性树脂组合物的特征在于，含有（a）具有异羟基或酚羟基的聚合物，（b）当用光化辐射照射时能够产生硝酸的化合物，（c）颜料，（d） 溶剂。 优选地，除了上述成分之外，组合物还含有（e）热交联剂和/或（f）具有可聚合双键的化合物。 根据本发明，滤色器的制造不需要在惰性气体气氛中进行，在从曝光步骤到显影步骤的期间，不需要氧阻隔膜，不需要加热。 因此，使用该组合物可以使滤色器制造步骤显着简单，从而使组合物在工业应用中提供了巨大的价值。

公开(公告)号：US5051941A

公开(公告)日：1991-09-24

申请号：US478511

申请日：1990-02-12

申请人： Yoshio Takamine ,  Shunsuke Miyamoto ,  Takayuki Nakagawa ,  Yoshiharu Kazama ,  Yoshiaki Kinoshita

发明人： Yoshio Takamine ,  Shunsuke Miyamoto ,  Takayuki Nakagawa ,  Yoshiharu Kazama ,  Yoshiaki Kinoshita

IPC分类号： G06F17/50

CPC分类号： G06F17/5022

摘要： A method of logic simulation for simulating operation of a logic circuit by using basic signal values corresponding to states of output signals of elements of the logic circuit to be simulated and expanded signal values including the basic signal values. The logic circuit to be simulated is divided into a portion to be simulated by using the basic signal values and the expanded signal values and a portion to be simulated by using the basic signal values without using the expanded signal values. The elements for which definition of calculation method for output signal values for the input signal values including the expanded signal values is not easy are included in the latter portion, and other elements are included in the former portion. A virtual signal conversion element for converting the expanded signal into the basic signal is provided at a position where a signal is sent from the former portion to the latter portion so that the expanded signal value outputted from the element of the former portion is converted into the basic signal value before it is sent to the element of the latter portion.

摘要翻译： 一种逻辑仿真方法，用于通过使用与要被仿真的逻辑电路的元件的输出信号的状态对应的基本信号值和包括基本信号值的扩展信号值来模拟逻辑电路的操作。 要模拟的逻辑电路通过使用基本信号值和扩展信号值以及通过使用基本信号值而不使用扩展信号值而要被仿真的部分来划分为要被模拟的部分。 对于包括扩展信号值的输入信号值的输出信号值的计算方法的定义不容易的元件包括在后一部分中，并且其它元件包括在前一部分中。 将扩展信号转换为基本信号的虚拟信号转换元件设置在信号从前一部分发送到后一部分的位置，使得从前一部分的元件输出的扩展信号值被转换为 基本信号值被发送到后一部分的元素之前。

公开(公告)号：US4169131A

公开(公告)日：1979-09-25

申请号：US886475

申请日：1978-03-14

申请人： Yoshiaki Kinoshita ,  Toshiaki Kurihara ,  Yoshiyuki Imagire

发明人： Yoshiaki Kinoshita ,  Toshiaki Kurihara ,  Yoshiyuki Imagire

IPC分类号： C01G49/02 ,  C01D1/04 ,  C01D1/22 ,  C01D1/28 ,  C01G49/00 ,  D21C11/00 ,  D21C11/04

CPC分类号： D21C11/0092 ,  C01D1/04 ,  C01D1/28

摘要： A process for recovering caustic alkali from spent alkali liquor, in which a spent alkali liquor and iron oxide are roasted to obtain a product containing alkali ferrate and the product of roasting is hydrolyzed at a temperature over 110.degree. C. and under pressurized conditions where liquid phase is retained, thereby recovering caustic alkali in the form of an aqueous solution of a concentration higher than approximately 15 wt% containing dissolved iron in an extremely small concentration.

摘要翻译： 从废碱液中回收苛性碱的方法，其中焙烧废碱液和氧化铁以获得含有碱金属铁酸盐的产品，焙烧产物在110℃以上和加压条件下水解，其中液体 从而以非常小的浓度回收浓度高于约15重量％的溶解铁的水溶液形式的苛性碱。