摘要:
A gate electrode has a relatively long gate length of e.g., about 10 &mgr;m. In a region immediately above the gate electrode which is sandwiched between first-layer metals provided is a metal dummy pattern having a width in the first direction and extending in the second direction perpendicular to a direction of gate length (direction of current flow). Moreover, a geometric center of the metal dummy pattern in the second direction is equal to a geometric center of the gate electrode in the second direction. This maintains the symmetry in shape of the metal dummy pattern as viewed from the gate electrode. Such a structure can make deterioration in characteristics of a plurality of elements uniform while maintaining the essential effect of a metal CMP.
摘要:
A P well region formed on a buried N well region and a n+ active region that are connected each other through a lead wire, serve as one terminal T1, and a gate electrode and a buried N well region that are connected each other through a leading N well region and a lead wire, serve as the other terminal T2. Thereby, the voltage dependence of capacitance C1 formed between the gate electrode and the n+ active region is canceled out with the voltage dependence of capacitance C2 formed between the P well region and the buried N well region.
摘要:
An object is to obtain a voltage comparator capable of high-accuracy voltage comparison. An input voltage (VIN) and a reference voltage (VREF) are connected to one electrode of a capacitor (C1) through switches (S1) and (S2), respectively. The other electrode of the capacitor (C1) is connected to the input portion of an inverter (INV1). The output portion of the inverter (INV1) is connected to the input portion of an inverter (INV3) and is also fed back to the input through a switch (S3). An inverter (INV11) is further connected in parallel with the inverter (INV1), wherein the input/output characteristics of the inverters (INV1, INV3 and INV11) are set equal.
摘要:
Voltage comparators C.sub.1 -C.sub.N for comparing a first differential reference voltage obtained by dividing a first reference voltage V.sub.RT and a second reference voltage V.sub.RB by ladder resistors r.sub.1 -r.sub.N+1 and a second differential reference input voltage formed by a third voltage V.sub.i and a fourth voltage V.sub.i are arranged in first to N/2 and (N/2+1)-th to N-th voltage comparator rows in a folded manner and wiring area can be reduced as a result.
摘要:
Disclosed is a high-speed A/D converter (15) including an improved differential amplifier circuit. Each comparator (61) provided in the A/D converter directly receives a complementary or differential analog input voltage to be converted. A differential amplifier circuit provided in each comparator compares an applied analog input voltage difference and an applied reference voltage difference. A binary signal indicative of a comparison result is applied to an encoder (4) through a binarization circuit. An analog input voltage which is not to be converted is directly applied to the comparator, that is, to the differential amplifier circuit through none of resistor elements and components, whereby conversion time delay is prevented.
摘要:
In a controlled threshold type electric device having first and second transistors and a differential amplifier which receives a reference input voltage, a voltage corresponding to the threshold voltage of the first transistor itself is applied to the differential amplifier as a feedback input voltage. The differential amplifier compares the received feed back input voltage with the reference input voltage and applies a control voltage to the backgate of the first transistor so that the threshold value of the first transistor converges to a desired value. This control voltage is also applied to the backgate of the second transistor so that the threshold voltage of the second transistor also converges to a desired value. Since the voltage corresponding to the threshold value of the first transistor is applied to the differential amplifier, an accurate feed back control is made. Further, since the differential amplifier can be manufactured through the MOS standard process, the manufacturing cost can be reduced.
摘要:
To eliminate the substrate voltage dependences of the respective resistance values of resistor elements, in the resistor elements coupled in series to each other over respective substrate regions, the ends of the resistor elements are coupled to the corresponding substrate regions by respective bias wires such that respective average potentials between the substrate regions of the resistor elements and the corresponding resistor elements have opposite polarities, and equal magnitudes.
摘要:
There is provided a technique for reducing the adverse effect of idle tones in the channels in a ΔΣ-type A/D converter including a plurality of channels for converting analog input signals into digital signals. The ΔΣ-type A/D converter includes an L channel for converting a left analog input signal into a digital signal and an R channel for converting a right analog input signal into a digital signal. Each of the L channel and the R channel includes a DC dither circuit for generating a DC addition voltage for shifting the frequency of an idle tone. In the L channel and the R channel, DC addition voltages generated by DC dither circuits are different from each other.
摘要:
In an A/D converter including a switched capacitor integration circuit, to suppress an effect of a noise generated in the switched capacitor circuit while suppressing increase in a forming area of the circuit. A first-stage integrator of a differential input type A/D converter includes first and second switched capacitor circuits, and includes a noise cancel circuit for generating a noise cancel signal to cancel a kickback noise generated due to switching operation thereof.
摘要:
A semiconductor device includes a semiconductor substrate including a main surface; a plurality of first interconnections formed in a capacitance forming region defined on the main surface and extending in a predetermined direction; a plurality of second interconnections each adjacent to the first interconnection located at an edge of the capacitance forming region, extending in the predetermined direction, and having a fixed potential; and an insulating layer formed on the main surface and filling in between each of the first interconnections and between the first interconnection and the second interconnection adjacent to each other. The first interconnections and the second interconnections are located at substantially equal intervals in a plane parallel to the main surface, and located to align in a direction substantially perpendicular to the predetermined direction.