Plasmon-enhanced electromagnetic-radiation-emitting devices and methods for fabricating the same
    51.
    发明申请
    Plasmon-enhanced electromagnetic-radiation-emitting devices and methods for fabricating the same 有权
    等离子体增强型电磁辐射发射装置及其制造方法

    公开(公告)号:US20090028493A1

    公开(公告)日:2009-01-29

    申请号:US11881266

    申请日:2007-07-26

    IPC分类号: G02B6/12 H01L33/00 H01L21/00

    摘要: Various embodiments of the present invention are directed to surface-plasmon-enhanced electromagnetic-radiation-emitting devices and to methods of fabricating these devices. In one embodiment of the present invention, an electromagnetic-radiation-emitting device comprises a multilayer core, a metallic device layer, and a substrate. The multilayer core has an inner layer and an outer layer, wherein the outer layer is configured to surround at least a portion of the inner layer. The metallic device layer is configured to surround at least a portion of the outer layer. The substrate has a bottom conducting layer in electrical communication with the inner layer and a top conducting layer in electrical communication with the metallic device layer such that the exposed portion emits surface-plasmon-enhanced electromagnetic radiation when an appropriate voltage is applied between the bottom conducting layer and the top conducting layer.

    摘要翻译: 本发明的各种实施例涉及表面等离子体增强的电磁辐射发射装置以及制造这些装置的方法。 在本发明的一个实施例中,电磁辐射发射装置包括多层芯,金属器件层和衬底。 多层芯具有内层和外层,其中外层被构造成围绕内层的至少一部分。 金属器件层被配置为围绕外层的至少一部分。 衬底具有与内层电连通的底部导电层和与金属器件层电连通的顶部导电层,使得当在底部导电之间施加适当的电压时,暴露部分发射表面等离子体增强的电磁辐射 层和顶部导电层。

    Methods for coupling diamond structures to photonic devices
    53.
    发明申请
    Methods for coupling diamond structures to photonic devices 有权
    将金刚石结构耦合到光子器件的方法

    公开(公告)号:US20080303049A1

    公开(公告)日:2008-12-11

    申请号:US12228039

    申请日:2008-08-08

    IPC分类号: H01L33/00 H01L21/00

    CPC分类号: G02B6/122 G02F2202/32

    摘要: Various embodiments of the present invention are directed to methods for coupling semiconductor-based photonic devices to diamond. In one embodiment of the present invention, a photonic device is optically coupled with a diamond structure. The photonic device comprises a semiconductor material and is optically coupled with the diamond structure with an adhesive substance that adheres the photonic device to the diamond structure. A method for coupling the photonic device with the diamond structure is also provided. The method comprises: depositing a semiconductor material on the diamond structure; forming the photonic device in the semiconductor material so that the photonic device couples with the diamond structure; and adhering the photonic device to the diamond structure.

    摘要翻译: 本发明的各种实施例涉及将基于半导体的光子器件耦合到金刚石的方法。 在本发明的一个实施例中,光子器件与金刚石结构光学耦合。 光子器件包括半导体材料,并与金刚石结构光学耦合,粘合剂物质将光子器件粘附到金刚石结构上。 还提供了一种用于将光子器件与金刚石结构耦合的方法。 该方法包括:在金刚石结构上沉积半导体材料; 在半导体材料中形成光子器件,使得光子器件与金刚石结构耦合; 并将光子器件粘附到金刚石结构上。

    METHOD FOR SELECTIVELY CONTROLLING LENGTHS OF NANOWIRES
    54.
    发明申请
    METHOD FOR SELECTIVELY CONTROLLING LENGTHS OF NANOWIRES 失效
    用于选择性地控制纳米长度的方法

    公开(公告)号:US20080182424A1

    公开(公告)日:2008-07-31

    申请号:US11297900

    申请日:2005-12-09

    摘要: A method for selectively controlling lengths of nanowires in a substantially non-uniform array of nanowires includes establishing at least two different catalyzing nanoparticles on a substrate. A nanowire from each of the at least two different catalyzing nanoparticles is substantially simultaneously grown. At least one of the nanowires has a length different from that of at least another of the nanowires.

    摘要翻译: 用于选择性地控制纳米线的基本不均匀阵列中的纳米线长度的方法包括在衬底上建立至少两种不同的催化纳米颗粒。 来自所述至少两种不同催化纳米颗粒中的每一种的纳米线基本上同时生长。 纳米线中的至少一个具有与纳米线中至少另一个的长度不同的长度。

    Capacitively coupling layers of a multilayer device
    55.
    发明申请
    Capacitively coupling layers of a multilayer device 有权
    电容耦合多层器件的层

    公开(公告)号:US20080170820A1

    公开(公告)日:2008-07-17

    申请号:US11652220

    申请日:2007-01-11

    IPC分类号: G02B6/12

    摘要: A multilayer device includes an electronic device layer, a first electrode associated with the electronic device layer, an optical layer, a second electrode associated with the optical layer, and an insulator layer provided between the first and second electrodes. The first and second electrodes are capacitively coupled to each other to facilitate electrical communication between the electronic device layer and the optical layer through transmission of an electrical signal between the first and second electrodes. The electrical signal may be transmitted through the insulator layer. In addition, the electronic device layer and the optical layer may be in electrical communication with each other through capacitive coupling of the first electrode and the second electrode.

    摘要翻译: 多层器件包括电子器件层,与电子器件层相关联的第一电极,光学层,与光学层相关联的第二电极以及设置在第一和第二电极之间的绝缘体层。 第一和第二电极彼此电容耦合,以通过在第一和第二电极之间传输电信号来促进电子器件层与光学层之间的电连通。 电信号可以透过绝缘体层。 此外,电子器件层和光学层可以通过第一电极和第二电极的电容耦合而彼此电连通。

    Raman signal-enhancing structures and devices
    57.
    发明授权
    Raman signal-enhancing structures and devices 有权
    拉曼信号增强结构和器件

    公开(公告)号:US07359048B2

    公开(公告)日:2008-04-15

    申请号:US11413910

    申请日:2006-04-28

    IPC分类号: G01J3/44 G01N21/65

    CPC分类号: G01N21/658 G01J3/44

    摘要: Raman systems include a radiation source, a radiation detector, and a Raman device or signal-enhancing structure. Raman devices include a tunable resonant cavity and a Raman signal-enhancing structure coupled to the cavity. The cavity includes a first reflective member, a second reflective member, and an electro-optic material disposed between the reflective members. The electro-optic material exhibits a refractive index that varies in response to an applied electrical field. Raman signal-enhancing structures include a substantially planar layer of Raman signal-enhancing material having a major surface, a support structure extending from the major surface, and a substantially planar member comprising a Raman signal-enhancing material disposed on an end of the support structure opposite the layer of Raman signal-enhancing material. The support structure separates at least a portion of the planar member from the layer of Raman signal-enhancing material by a selected distance of less than about fifty nanometers.

    摘要翻译: 拉曼系统包括辐射源,辐射检测器和拉曼器件或信号增强结构。 拉曼器件包括耦合到空腔的可调谐谐振腔和拉曼信号增强结构。 空腔包括第一反射构件,第二反射构件和设置在反射构件之间的电光材料。 电光材料表现出响应于所施加的电场而变化的折射率。 拉曼信号增强结构包括具有主表面的基本平坦的拉曼信号增强材料层,从主表面延伸的支撑结构和包括设置在支撑结构的端部上的拉曼信号增强材料的基本上平面的构件 与拉曼信号增强材料层相对。 支撑结构将平面构件的至少一部分与拉曼信号增强材料层分开小于约五十纳米的选定距离。

    Binary arrays of nanoparticles for nano-enhanced Raman scattering molecular sensors
    58.
    发明授权
    Binary arrays of nanoparticles for nano-enhanced Raman scattering molecular sensors 有权
    用于纳米增强拉曼散射分子传感器的二元纳米颗粒阵列

    公开(公告)号:US07292334B1

    公开(公告)日:2007-11-06

    申请号:US11090352

    申请日:2005-03-25

    IPC分类号: G01J3/44

    CPC分类号: G01N21/658

    摘要: A nano-enhanced Raman scattering (NERS)-active structure includes a substrate, a monolayer of nanoparticles disposed on a surface of the substrate, and a spacer material surrounding each nanoparticle in the monolayer of nanoparticles. The monolayer of nanoparticles includes a first plurality of nanoparticles and a second plurality of nanoparticles. The nanoparticles of the second plurality are interspersed among the first plurality and exhibit a plasmon frequency that differs from any plasmon frequency exhibited by the first plurality. Also described are a method for forming such a NERS-active structure and a NERS system that includes a NERS-active structure, an excitation radiation source, and a detector for detecting Raman scattered radiation.

    摘要翻译: 纳米增强拉曼散射(NERS)活性结构包括底物,设置在基底表面上的单层纳米颗粒,以及围绕纳米颗粒单层中的每个纳米颗粒的间隔物。 纳米颗粒的单层包括第一多个纳米颗粒和第二多个纳米颗粒。 第二多个纳米颗粒散布在第一多个中,并且表现出与第一多个表现出的任何等离子体频率不同的等离子体激元频率。 还描述了形成这样的NERS-活性结构的方法和包括NERS-活性结构,激发辐射源和用于检测拉曼散射辐射的检测器的NERS系统。

    Nanowires for surface-enhanced Raman scattering molecular sensors
    59.
    发明授权
    Nanowires for surface-enhanced Raman scattering molecular sensors 有权
    纳米线用于表面增强拉曼散射分子传感器

    公开(公告)号:US07245370B2

    公开(公告)日:2007-07-17

    申请号:US11030733

    申请日:2005-01-06

    IPC分类号: G01J3/44 G01N21/65

    CPC分类号: G01N21/658

    摘要: A SERS-active structure is disclosed that includes a substrate and at least two nanowires disposed on the substrate. Each of the at least two nanowires has a first end and a second end, the first end being attached to the substrate and the second end having a SERS-active tip. A SERS system is also disclosed that includes a SERS-active structure. Also disclosed are methods for forming a SERS-active structure and methods for performing SERS with SERS-active structures.

    摘要翻译: 公开了一种SERS-活性结构,其包括衬底和设置在衬底上的至少两个纳米线。 所述至少两个纳米线中的每一个具有第一端和第二端,所述第一端附接到所述基底,所述第二端具有SERS活性末端。 还公开了包括SERS活性结构的SERS系统。 还公开了形成SERS活性结构的方法和用SERS活性结构进行SERS的方法。

    Integrated circuit substrate that accommodates lattice mismatch stress
    60.
    发明授权
    Integrated circuit substrate that accommodates lattice mismatch stress 有权
    集成电路基板,适应晶格失配应力

    公开(公告)号:US06429466B2

    公开(公告)日:2002-08-06

    申请号:US09774199

    申请日:2001-01-29

    IPC分类号: H01L31072

    摘要: A method for growing a crystalline layer that includes a first material on a growth surface of a crystalline substrate of a second material, wherein the first material and the second material have different lattice constants. A buried layer is generated in the substrate such that the buried layer isolates a layer of the substrate that includes the growth surface from the remainder of the substrate. The second material is then deposited on the growth surface at a growth temperature. The isolated layer of the substrate has a thickness that is less than the thickness at which defects are caused in the crystalline lattice of the first material by the second material crystallizing thereon. The buried layer is sufficiently malleable at the growth temperature to allow the deformation of the lattice of the isolated layer without deforming the remainder of the substrate. The present invention may be utilized for growing III-V semiconducting material layers on silicon substrates. In the case of silicon-based substrates, the buried layer is preferably SiO2 that is sufficiently malleable at the growth temperature to allow the deformation of the isolated substrate layer.

    摘要翻译: 一种用于生长晶体层的方法,其包括在第二材料的晶体衬底的生长表面上的第一材料,其中第一材料和第二材料具有不同的晶格常数。 在衬底中产生掩埋层,使得掩埋层将衬底的包含生长表面的衬底与衬底的其余部分隔离。 然后将第二种材料在生长温度下沉积在生长表面上。 衬底的隔离层的厚度小于在其上结晶第二材料时在第一材料的晶格中产生缺陷的厚度。 掩埋层在生长温度下具有足够的延展性,以允许隔离层的晶格变形,而不使基底的其余部分变形。 本发明可用于在硅衬底上生长III-V半导体材料层。 在硅基基板的情况下,掩埋层优选是在生长温度下足够有韧性的SiO 2,以允许隔离的基底层的变形。