摘要:
In a method for scanning edges of an object using a computing device, the computing device is connected to an image measuring machine including an image capturing device. A start point, an end point, a scan direction, and a scan distance interval are set. Scan points on the edges of the object are determined. For each scan point, the computing device aims the image capturing device at the scan point, controls the image capturing device to capture images of the object at different depths, and records focal points. Definition values of the images are calculated and an image with a highest definition value is determined. A focal point corresponds to the image with the highest definition value and so coordinates of the scan point are determined. Scanned edges of the object are formed based on all the scan points.
摘要:
A polishing apparatus and exception handling method thereof is disclosed, the exception handling method of polishing apparatus includes: sending an alarm signal when an alarm is generated because of an exception during polishing; and processing a wafer in the polishing apparatus with organic acid solution according to the received alarm signal. The method and apparatus prevent the metal material from corrosion which causes device failure, when there is an alarm generated because of an exception which stops the apparatus during polishing.
摘要:
Systems and methods for enhanced television interaction are disclosed. For example, one disclosed method includes receiving notification information, the notification information indicating an event associated with video content displayed by a television device; determining a haptic effect associated with the notification information; generating and transmitting a haptic signal to a haptic output device, the haptic signal configured to cause the haptic output device to output the haptic effect.
摘要:
A semiconductor device and a method for manufacturing the semiconductor device are provided. The semiconductor device uses an aluminum alloy, rather than aluminum, for a metal gate. Therefore, the surface of the high-k metal gate after the CMP is aluminum alloy rather than pure aluminum, which can greatly reduce defects, such as corrosion, pits and damage, in the metal gate and improve reliability of the semiconductor device.
摘要:
A method controls probe measurement using an electronic device. The method receives user-defined identification data of a probe if a preset configuration file is not stored in a storage device of the electronic device, and fits a three dimensional (3D) model of the probe according to the user-defined identification data of the probe. The method further updates the user-defined identification data of the probe if the fitted 3D model does not match the probe, or stores the user-defined identification data of the probe in a user-defined configuration file if the fitted 3D model matches the probe, and controls the probe to execute measurement according to the user-defined configuration file.
摘要:
An electro-chemical sensor for methane is described having a catalyst to react methane or other low molecular weight hydrocarbons and a detector to detect the turnover or reaction rate and using such information to determine the concentration of the methane or other low molecular weight species. The sensor is preferably used for measurements in a wellbore.
摘要:
A polishing method and a method for forming a gate are provided. The method includes forming a dummy gate on a semiconductor substrate including a sacrificial oxide layer and a polysilicon layer which covers the sacrificial oxide layer, forming spacers around the dummy gate, and successively forming a silicon nitride layer and a dielectric layer covering the silicon nitride layer. The method further includes polishing the dielectric layer until the silicon nitride layer is exposed, polishing the silicon nitride layer on a fixed abrasive pad until the polysilicon layer is exposed by using a polishing slurry with a PH value ranging from 10.5 to 11 and comprising an anionic surfactant or a zwitterionic surfactant. Additionally, the method includes forming an opening after removing the dummy gate, and forming a gate in the opening. The method eliminates potential erosion and dishing caused in the polishing of the silicon nitride layer.
摘要:
The invention provides a method for forming a metal gate and a method for forming a MOS transistor. The method for forming a metal gate includes: providing a substrate; forming a sacrificial oxide layer and a polysilicon gate on the substrate; forming a silicon oxide layer on sidewalls of the sacrificial oxide layer and the polysilicon gate; forming a stop layer that covers the substrate; removing a part of the stop layer in the spacers; forming a second interlayer dielectric layer that covers the first interlayer dielectric layer, the spacers and the polysilicon gate; polishing the second interlayer dielectric layer to expose the spacers and the polysilicon gate; removing the polysilicon gate to form a trench; removing the sacrificial oxide layer in the trench; and forming a metal gate in the trench. The invention prevents from recesses and therefore metal bridge and metal residuals in the recesses.
摘要:
The present invention is provided with an outlet mechanism with pulsing and rotating water effect, wherein comprising a body and a water processor, the body is disposed with an inlet end and an outlet end, a waterway connected to the inlet end and the outlet end is disposed inside the body, the waterway is disposed with a first cavity, the first cavity is disposed with an inlet hole connected to the inlet end, the section area of the inlet hole is smaller than the discharge area of the first cavity; the water processor is disposed with a corkscrew waterway, which is connected to the inlet end and the outlet end. The outlet mechanism is with simple structure, and it needs less components to be fitting to industrial production.
摘要:
Methods and systems for controlling combustion performance of an engine are provided. A desired fuel quantity for a first combustion cycle is determined. One or more engine actuator settings are identified that would be required during a subsequent combustion cycle to cause the engine to approach a target combustion phasing. If the identified actuator settings are within a defined acceptable operating range, the desired fuel quantity is injected during the first combustion cycle. If not, an attenuated fuel quantity is determined and the attenuated fuel quantity is injected during the first combustion cycle.