公开(公告)号：US06765201B2

公开(公告)日：2004-07-20

申请号：US09764457

申请日：2001-01-19

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： G21K700

CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

公开(公告)号：US06355570B1

公开(公告)日：2002-03-12

申请号：US09260074

申请日：1999-03-02

申请人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

发明人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

IPC分类号： H01L21302

CPC分类号： G01N21/53 ,  G01N21/94 ,  G01N21/9501

摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

公开(公告)号：US4669875A

公开(公告)日：1987-06-02

申请号：US548516

申请日：1983-11-03

申请人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

发明人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

IPC分类号： G01N15/02 ,  G01N21/94 ,  G01N21/32

CPC分类号： G01N21/94 ,  G01N2015/0238 ,  G01N2021/4792 ,  G01N2201/1053

摘要： The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.

摘要翻译： 公开了一种外来粒子检测方法和装置，其中通过扫描装置使用激光束照射系统从相对于垂直于衬底表面的方向倾斜的方向发射的偏振激光束线性扫描衬底表面 相对于激光照射方向大约90°的方向; 并且通过偏振光分析仪和光电转换装置从基本上等于所述扫描方向的方向检测从基板表面上的异物引起的反射的激光，并且相对于垂直于基板表面的方向倾斜。

公开(公告)号：US07911601B2

公开(公告)日：2011-03-22

申请号：US12263682

申请日：2008-11-03

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N21/00

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

摘要翻译： 用于检查缺陷的方法和装置包括从紫外线光源发射紫外光，用紫外光的紫外线照射样本，其中控制紫外光的偏振条件，控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。 紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

公开(公告)号：US20110001972A1

公开(公告)日：2011-01-06

申请号：US12876709

申请日：2010-09-07

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

摘要翻译： 一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于 检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

公开(公告)号：US07751037B2

公开(公告)日：2010-07-06

申请号：US12435523

申请日：2009-05-05

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/958 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20070177136A1

公开(公告)日：2007-08-02

申请号：US11653322

申请日：2007-01-16

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.

摘要翻译： 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

公开(公告)号：US07218389B2

公开(公告)日：2007-05-15

申请号：US10223422

申请日：2002-08-20

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： G02N21/88

CPC分类号： G01N21/956 ,  G01N21/94 ,  G01N2021/9513 ,  G01N2201/10 ,  G01N2201/1045

摘要： A pattern defect inspection apparatus is capable of detecting defects, without being affected by non-uniform thickness of a thin film formed on a sample, even when using monochromatic light, such as a laser. The apparatus comprises a laser to illuminate a sample, coherence suppression optics to reduce laser beam coherence, a condenser to condense the laser beam onto a pupil plane of an objective lens, and a detector to detect the light reflected from a circuit pattern formed on a sample. The condenser is designed so that the intensity of light illuminating the sample under test can be partially adjusted according to the type of laser beam illumination condensed on the pupil of the objective lens. Variations in reflected light intensity caused by non-uniform film thickness on the surface of the sample are therefore reduced, and shading is minimized in the detected image to allow detecting of fine defects.

摘要翻译： 即使使用激光等单色光，图案缺陷检查装置也能够不受样品上形成的薄膜的不均匀的厚度的影响而检测缺陷。 该装置包括用于照亮样品的激光器，减少激光束相干性的相干抑制光学器件，将激光束冷凝到物镜的光瞳平面上的冷凝器，以及用于检测从形成在物镜上的电路图案反射的光的检测器 样品。 冷凝器被设计成使得照射待测试样品的光的强度可以根据在物镜的瞳孔上聚集的激光束照明的类型来部分地调节。 因此，在样品表面上由不均匀膜厚引起的反射光强度的变化因此减少，并且在检测图像中使阴影最小化以允许检测细小缺陷。

公开(公告)号：US20070057184A1

公开(公告)日：2007-03-15

申请号：US11478618

申请日：2006-07-03

申请人： Sachio Uto ,  Shunji Maeda

发明人： Sachio Uto ,  Shunji Maeda

IPC分类号： H01J37/22 ,  G01N21/01 ,  H01J37/28

CPC分类号： H01J37/226 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8825 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/2817

摘要： The invention provides an apparatus and a method each capable of highly accurately reviewing at a high speed very small foreign matters and pattern defects occurring during a device production process for forming a circuit pattern on a substrate of semiconductor devices, etc. An objective lens having high NA is installed inside a vacuum chamber for an inspection object having a transparent film formed on the surface thereof and an illumination optical path is formed inside the objective lens so that dark visual field illumination can be made and reflected and scattered light of foreign matters or defects on the surface of the inspection object can be detected with high sensitivity.

摘要翻译： 本发明提供一种能够高精度地高精度地检查在半导体器件等的基板上形成电路图案的器件制造工序中产生的非常小的异物和图案缺陷的装置和方法。具有高 NA被安装在用于具有形成在其表面上的透明膜的检查对象的真空室内，并且在物镜内部形成照明光路，使得可以进行暗视野照明和异物的反射和散射光 检测对象的表面可以灵敏度高。

公开(公告)号：US20060256328A1

公开(公告)日：2006-11-16

申请号：US11488620

申请日：2006-07-19

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N21/88

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.