公开(公告)号：USRE41697E1

公开(公告)日：2010-09-14

申请号：US11235648

申请日：2005-09-26

申请人： Chia-Tung Ho ,  Feng-Jia Shih ,  Jieh-Jang Chen ,  Ching-Sen Kuo ,  Shih-Chi Fu ,  Gwo-Yuh Shiau ,  Chia-Shiung Tsai

发明人： Chia-Tung Ho ,  Feng-Jia Shih ,  Jieh-Jang Chen ,  Ching-Sen Kuo ,  Shih-Chi Fu ,  Gwo-Yuh Shiau ,  Chia-Shiung Tsai

IPC分类号： H01L21/4763

CPC分类号： H01L21/76808 ,  G03F7/0035 ,  G03F7/09 ,  G03F7/16 ,  H01L21/0273 ,  H01L21/31144 ,  H01L21/32139

摘要： A method of forming a planarized photoresist coating on a substrate having holes with different duty ratios is described. A first photoresist preferably comprised of a Novolac resin and a diazonaphthoquinone photoactive compound is coated on a substrate and baked at or slightly above its Tg so that it reflows and fills the holes. The photoresist is exposed without a mask at a dose that allows the developer to thin the photoresist to a recessed depth within the holes. After the photoresist is hardened with a 250° C. bake, a second photoresist is coated on the substrate to form a planarized film with a thickness variation of less than 50 Angstroms between low and high duty ratio hole regions. One application is where the second photoresist is used to form a trench pattern in a via first dual damascene method. Secondly, the method is useful in fabricating MIM capacitors.

摘要翻译： 描述了在具有不同占空比的孔的基板上形成平坦化光致抗蚀剂涂层的方法。 优选将包含酚醛清漆树脂和重氮萘醌光敏化合物的第一光致抗蚀剂涂覆在基材上并在其Tg以上或略高于其Tg的温度下使其回流并填充孔。 以允许显影剂将光致抗蚀剂减薄到孔内的凹陷深度的剂量，光刻胶不用掩模曝光。 在250℃烘烤后光致抗蚀剂硬化后，在基板上涂覆第二光致抗蚀剂，以形成厚度变化小于50埃的低和高占空比孔区域的平坦化膜。 一种应用是第二光致抗蚀剂用于以通孔第一双镶嵌方法形成沟槽图案。 其次，该方法在制造MIM电容器方面是有用的。

公开(公告)号：US20100055626A1

公开(公告)日：2010-03-04

申请号：US12613165

申请日：2009-11-05

申请人： Masayuki Endou ,  Masaru Sasago

发明人： Masayuki Endou ,  Masaru Sasago

IPC分类号： G03F7/20

CPC分类号： G03F7/2022 ,  G03F7/09 ,  G03F7/203

摘要： A resist film made of a chemically amplified positive resist is formed on a substrate. On the resist film, a light absorbing film containing a fluoropolymer which is alkali-soluble and has an aromatic ring is formed. Thereafter, first pattern exposure is performed by irradiating the resist film through the light absorbing film with first exposure light containing extreme ultraviolet light having passed through a first mask. Thereafter, second pattern exposure is performed by irradiating the resist film through the light absorbing film with exposure light having passed through a second mask. After the substrate is heated, the resist film is developed to remove the light absorbing film and form a resist pattern made of the resist film. An opening portion of the second mask is formed in a region corresponding to a non-opening portion of the first mask in which an opening portion is not formed.

摘要翻译： 在基板上形成由化学放大型正性抗蚀剂制成的抗蚀剂膜。 在抗蚀剂膜上形成含有碱溶性且具有芳环的含氟聚合物的吸光膜。 此后，通过使含有通过第一掩模的极紫外光的第一曝光光通过光吸收膜照射抗蚀剂膜，进行第一图案曝光。 此后，通过经过第二掩模的曝光光通过光吸收膜照射抗蚀剂膜来进行第二图案曝光。 在加热基板之后，将抗蚀剂膜显影以除去光吸收膜并形成由抗蚀剂膜制成的抗蚀剂图案。 第二掩模的开口部形成在与不形成开口部的第一掩模的非开口部对应的区域中。

公开(公告)号：US07655381B2

公开(公告)日：2010-02-02

申请号：US10545261

申请日：2004-02-24

申请人： Wittich Kaule

发明人： Wittich Kaule

IPC分类号： G03C5/00

CPC分类号： G06K19/16 ,  G02B5/1857 ,  G03F7/0005 ,  G03F7/09 ,  G03F7/2059 ,  G03F7/2061 ,  G03H1/0244 ,  G03H1/0891 ,  G03H2001/0478 ,  G03H2224/04 ,  G03H2260/14 ,  G03H2260/63 ,  Y10S430/143

摘要： The invention relates to a method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure. The resist layer at least in certain areas adjoins a conductive layer, which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by means of an electron beam. With this method the material of the resist layer and the conductive layer and the exposure parameters are adjusted to each other such that the resist layer is also exposed outside the area impinged with the electron beam such that the flanks of the relief structure obtain an inclined form.

摘要翻译： 本发明涉及一种制造具有形式为浮雕结构的抗蚀剂层的基材的方法，其表示衍射结构。 至少在某些区域中的抗蚀剂层邻接导电层，当通过电子束暴露抗蚀剂层时，其传播一次电子和/或产生二次电子。 利用该方法，将抗蚀剂层和导电层的材料和曝光参数彼此调节，使得抗蚀剂层也暴露在与电子束撞击的区域的外部，使得浮雕结构的侧面获得倾斜形式 。

公开(公告)号：US07592124B2

公开(公告)日：2009-09-22

申请号：US11281371

申请日：2005-11-18

申请人： Tasuo Chiba ,  Tatsuya Ichikawa

发明人： Tasuo Chiba ,  Tatsuya Ichikawa

IPC分类号： B32B5/16 ,  B32B27/36 ,  G03F7/004

CPC分类号： G03F7/11 ,  G03F7/027 ,  G03F7/09 ,  G03F7/092 ,  Y10T428/25 ,  Y10T428/254 ,  Y10T428/31786

摘要： There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the polyester film;wherein a resin layer containing fine particles is formed on the opposite surface of the support film to which the photosensitive resin composition layer is formed, and said photosensitive resin composition comprises (A) a binder polymer having a carboxyl group, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photopolymerization initiator, a photosensitive element roll, a process for the preparation of a resist pattern using the same, the resist pattern, a resist pattern-laminated substrate, a process for the preparation of a wiring pattern and the wiring pattern.

摘要翻译： 公开了一种感光元件，其包括支撑膜，其包含双轴取向聚酯膜和形成在聚酯膜的一个表面上的感光性树脂组合物层; 其中在形成有感光性树脂组合物层的支撑膜的相对表面上形成含有微粒的树脂层，并且所述感光性树脂组合物包含（A）具有羧基的粘合剂聚合物，（B）光聚合性化合物 在分子中具有至少一个可聚合的烯属不饱和基团，和（C）光聚合引发剂，感光元件辊，使用其的抗蚀剂图案的制备方法，抗蚀剂图案，抗蚀剂图案层压基板， 用于制备布线图案和布线图案的工艺。

公开(公告)号：US07348131B2

公开(公告)日：2008-03-25

申请号：US11175518

申请日：2005-07-05

申请人： Gary Ganghui Teng

发明人： Gary Ganghui Teng

IPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/14 ,  G03F7/38 ,  G03F7/28

CPC分类号： G03F7/09 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  G03F7/027

摘要： A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a free radical initiator, and a sensitizing dye. Such dark aluminum substrate in combination with the hydrophilic treatment allows both clean background and good printing durability. Such plate can be exposed with a suitable laser at lower dosage to cause hardening in the exposed areas. The exposed plate can be developed with a regular liquid developer or with ink and/or fountain solution.

摘要翻译： 激光平版印刷版包括具有0.30或更高的反射光密度的电化学颗粒，阳极氧化的亲水处理的铝基板; 自由基可聚合感光层; 和水溶性或分散性外涂层。 感光层包括聚合物粘合剂，可自由基聚合的单体，自由基引发剂和增感染料。 这种深色铝基板与亲水处理相结合，既可以清洁背景，又能提供良好的印刷耐久性。 这样的板可以以较低的剂量用合适的激光曝光以在暴露的区域中硬化。 暴露的板可以用常规液体显影剂或油墨和/或润版液显影。

公开(公告)号：US20070026343A1

公开(公告)日：2007-02-01

申请号：US11493517

申请日：2006-07-27

申请人： Shinji Tarutani

发明人： Shinji Tarutani

IPC分类号： G03C1/00

CPC分类号： G03F7/0382 ,  B01D61/145 ,  G03F7/0392 ,  G03F7/09 ,  Y10S430/115 ,  Y10S430/136

摘要： A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action of an acid; (C) a basic compound; (D) a surfactant; and (E) a solvent, the production process comprising: preparing a solution containing the component (A); and mixing the solution containing the component (A) with the components (B) to (E), and a chemical amplification-type resist composition produced by the production process.

摘要翻译： 化学放大型抗蚀剂组合物的制造方法，其是用于制造化学放大型组合物的方法，其包含：（A）能够在用光化射线或辐射照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解度在酸的作用下变化的树脂; （C）碱性化合物; （D）表面活性剂; 和（E）溶剂，所述制备方法包括：制备含有组分（A）的溶液; 并将含有成分（A）的溶液与成分（B）〜（E）混合，以及通过该制造方法制造的化学放大型抗蚀剂组合物。

公开(公告)号：US20060240358A1

公开(公告)日：2006-10-26

申请号：US11386958

申请日：2006-03-22

申请人： David Powell ,  Ahmad Naiini ,  N. Metivier ,  Donald Perry

发明人： David Powell ,  Ahmad Naiini ,  N. Metivier ,  Donald Perry

IPC分类号： G03C5/00

CPC分类号： G03F7/11 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/16

摘要： A pretreatment composition for treating a substrate to be subjected to forming a relief pattern thereon by exposure to actinic radiation, the pretreatment composition comprising: (a) at least one compound having Structure VI  wherein, V is selected from CH and N, Y is selected from O and NR3 wherein R3 is selected from H, CH3 and C2H5, R1 and R2 are each independently selected from H, a C1-C4 alkyl group, a C1-C4 alkoxy group, cyclopentyl and cyclohexyl, or alternatively, R1 and R2 can be fused to produce a substituted or unsubstituted benzene ring, with the proviso that the substituent is not an electron withdrawing group, (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is subsequently processed to form an image on the substrate. Processes for pretreatment of substrates and processes for forming relief images on pretreated substrates are disclosed.

摘要翻译： 一种预处理组合物，用于通过暴露于光化辐射来处理待形成浮雕图案的基底，所述预处理组合物包含：（a）至少一种具有结构VI的化合物，其中V选自CH和N，Y被选择 其中R 3选自H，CH 3和C 2 H 3，其中R 3选自H，CH 3和C 2 H 3， 5个，R 1和R 2各自独立地选自H，C 1 -C 4 - C 1 -C 4烷基，C 1 -C 4烷氧基，环戊基和环己基，或者R 1和R 2 可以融合以产生取代或未取代的苯环，条件是取代基不是吸电子基团，（b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中存在于组合物中的结构VI的化合物有效地抑制当将光敏组合物涂覆在基底上时形成的残留物和涂覆的基底，随后被处理以在基底上形成图像。 公开了用于预处理基板的处理和用于在预处理的基板上形成浮雕图像的工艺。

公开(公告)号：US20060078824A1

公开(公告)日：2006-04-13

申请号：US11281371

申请日：2005-11-18

申请人： Tatsuo Chiba ,  Tatsuya Ichikawa

发明人： Tatsuo Chiba ,  Tatsuya Ichikawa

IPC分类号： G03C1/76

CPC分类号： G03F7/11 ,  G03F7/027 ,  G03F7/09 ,  G03F7/092 ,  Y10T428/25 ,  Y10T428/254 ,  Y10T428/31786

摘要： There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the polyester film; wherein a resin layer containing fine particles is formed on the opposite surface of the support film to which the photosensitive resin composition layer is formed, and said photosensitive resin composition comprises (A) a binder polymer having a carboxyl group, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photopolymerization initiator, a photosensitive element roll, a process for the preparation of a resist pattern using the same, the resist pattern, a resist pattern-laminated substrate, a process for the preparation of a wiring pattern and the wiring pattern.

公开(公告)号：US20060057499A1

公开(公告)日：2006-03-16

申请号：US11267435

申请日：2005-11-04

申请人： David Roberts ,  Geoffrey Hu

发明人： David Roberts ,  Geoffrey Hu

IPC分类号： G03F7/00

CPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/091

摘要： An improved digitally imageable relief printing element having an increased direct-cure imaging speed upon exposure to lasers and other digital sources of actinic radiation. The printing elements of the invention comprise a reflective layer beneath a photosensitive resin layer so that instead of being absorbed by the reflective layer, photons of actinic radiation are reflected back up into the photosensitive layer, thereby speeding up the curing rate of the printing element.

摘要翻译： 一种改进的可数字成像的凸版印刷元件，其在暴露于激光和其它数量的光化辐射源时具有增加的直接固化成像速度。 本发明的印刷元件包括在感光树脂层下面的反射层，使得不是被反射层吸收，光化辐射的光子被反射回到感光层中，从而加速了印刷元件的固化速度。

公开(公告)号：US20050084776A1

公开(公告)日：2005-04-21

申请号：US11004535

申请日：2004-12-03

申请人： Hironori Kobayashi ,  Masato Okabe ,  Manabu Yamamoto

发明人： Hironori Kobayashi ,  Masato Okabe ,  Manabu Yamamoto

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/09 ,  G03F9/00

CPC分类号： G02B3/0012 ,  G02B5/201 ,  G03F7/0007 ,  G03F7/0042 ,  G03F7/0043 ,  G03F7/09 ,  G03F7/11

摘要： A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body. In the present invention, the above problem can be solved by providing a process for the production of a pattern-forming body, the process comprising disposing a catalyst-containing layer-side substrate containing at least a photocatalyst-containing layer and a pattern-forming body substrate containing a characteristic-changeable layer which is changed in characteristics by the action of the photocatalyst in at least said photocatalyst-containing layer such that the photocatalyst-containing layer is in contact with the characteristic-changeable layer, followed by performing exposure to thereby change the characteristics of the exposed portion of the characteristic-changeable layer and thereafter dismounting the photocatalyst-containing layer-side substrate, thereby obtaining a pattern-forming body having a pattern which has been changed in characteristics on the characteristic-changeable layer.

摘要翻译： 本发明的主要目的是提供一种用于生产图案形成体的方法，该方法能够形成高精度图案，不需要曝光后处理，并且不会对于劣化 图案形成体本身，因为在所产生的图案形成体中不含有光催化剂。 在本发明中，上述问题可以通过提供一种用于制造图案形成体的方法来解决，该方法包括设置含有至少含有光催化剂层的含催化剂层侧基材和图案形成 其特征在于，所述特征变化层通过所述光催化剂层的至少所述光催化剂层的作用而变化，使得所述光催化剂层与所述特征变化层接触，然后进行曝光 改变特征变化层的露出部分的特性，然后拆卸含光催化剂的层侧基板，从而获得具有在特征可变层上的特性变化的图案的图案形成体。