Compact low-noise dynodes incorporating semiconductor secondary electron
emitting materials
    51.
    发明授权
    Compact low-noise dynodes incorporating semiconductor secondary electron emitting materials 失效
    结合半导体二次电子发射材料的紧凑型低噪声倍增电极

    公开(公告)号:US5680008A

    公开(公告)日:1997-10-21

    申请号:US417010

    申请日:1995-04-05

    CPC classification number: H01J43/10 H01J1/32

    Abstract: This invention relates to electron emitting semiconductor materials for use in dynodes, dynode devices incorporating such materials, and methods of making the dynode devices. In particular, the invention relates to emissive materials having an electron affinity that is negative and which have low resistivity. The invention also relates to electronic devices such as electron multipliers, ion detectors, and photomultiplier tubes incorporating the dynodes comprising the materials, and to methods for fabricating the electronic devices. The secondary electron emitters of the present invention comprise wide bandgap semiconductor films selected from diamond, AlN, BN, Ga.sub.1-y Al.sub.y N where 0.ltoreq.y.ltoreq.1 and (AlN).sub.x (SiC).sub.1-x where 0.2.ltoreq.x.ltoreq.1. The films are preferably single crystal or polycrystalline. The films may be continuous or patterned.

    Abstract translation: 本发明涉及用于倍增极的电子发射半导体材料,结合这种材料的倍增极装置以及制造倍增极装置的方法。 特别地,本发明涉及电子亲和力为负的且具有低电阻率的发射材料。 本发明还涉及电子装置,例如电子倍增器,离子检测器和结合包含材料的倍增电极的光电倍增管,以及用于制造电子装置的方法。 本发明的二次电子发射体包括选自金刚石,AlN,BN,Ga1-yAlyN,其中0≤y≤1和(AlN)x(SiC)1-x的宽带隙半导体膜,其中0.2 < x

    Production of thin films
    56.
    发明授权
    Production of thin films 失效
    生产薄膜

    公开(公告)号:US3159442A

    公开(公告)日:1964-12-01

    申请号:US9518961

    申请日:1961-03-13

    Applicant: NAT RES DEV

    Abstract: An electrode includes an electron or irradiation transmissive conducting layer and an electron-emissive layer of insulating material in spongy form. This layer may be of BaF2, LiF2, MgF2, MgO, Al2O2, CsI, KCl or NaCl and preferably has a density of only about 1% of the same material in bulk form, e.g. 0.01 to 0.1 gms. per cc. with a thickness of 10 to 100 m . The layer may be formed by deposition in a gaseous atmosphere, e.g. argon at 1 to 2 mm. of Hg pressure, with a spacing of about 3 inches between the evaporator and the receiver, which may be rotating. Alternatively magnesium may be burnt in air at atmospheric pressure about 14 inches from the receiver. The receiver may be an aluminium film supported by a metal ring and formed by vacuum deposition of aluminium on to a film of thermally removable cellulose nitrate to a thickness of 140 to 1000 . Specifications 792,507, 862,211 and 898,433 are referred to.

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