Apparatus for measuring thin film refractive index and thickness with a spectrophotometer
    51.
    发明授权
    Apparatus for measuring thin film refractive index and thickness with a spectrophotometer 失效
    用分光光度计测量薄膜折射率和厚度的装置

    公开(公告)号:US08379228B1

    公开(公告)日:2013-02-19

    申请号:US12931890

    申请日:2011-02-14

    IPC分类号: G01B11/28

    摘要: A device is provided that can be inserted into a spectrophotometer, in order to measure the thickness and refractive index of a thin film that is on a sample plate. A pair of identical parallelogram prisms diverts the spectrophotometer beam to measure the attenuated total reflection, and returns an output beam that is in the original beam path, independent of wavelength and rotation angle. The attenuated total reflection of the thin film sample plate is measured in a prism coupling geometry, as a function of wavelength and angle. From this data, combined with normal incidence transmission data, the thickness and refractive index can be extracted.

    摘要翻译: 提供了可以插入分光光度计的装置,以便测量样品板上的薄膜的厚度和折射率。 一对相同的平行四边形棱镜转移分光光度计光束以测量衰减的全反射,并返回与原始光束路径无关的波长和旋转角度的输出光束。 以棱镜耦合几何形状测量薄膜样品板的衰减全反射作为波长和角度的函数。 根据该数据,结合正常入射透射数据,可以提取厚度和折射率。

    Film thickness measuring device and film thickness measuring method
    52.
    发明授权
    Film thickness measuring device and film thickness measuring method 失效
    膜厚测量装置和膜厚测量方法

    公开(公告)号:US08339617B2

    公开(公告)日:2012-12-25

    申请号:US12904494

    申请日:2010-10-14

    IPC分类号: G01B11/28 G01N21/25

    CPC分类号: G01N21/55 G01B11/0625

    摘要: A film thickness measuring device is provided with a light source, a spectroscopic sensor, a processor, and a storage unit, and configured in such a manner that light from the light source vertically enters a plane to be measured provided with a film and the light reflected by the plane to be measured enters the spectroscopic sensor. The storage unit stores theoretical values of reflectivity distributions of respective film thicknesses and theoretical values of color characteristic variables of the respective film thicknesses. The processor finds the thickness of the film of the plane to be measured from the reflectivity distribution measured by the spectroscopic sensor by using the theoretical values of the reflectivity distributions of the respective film thicknesses or the theoretical values of the color characteristic variables of the respective film thicknesses stored in the storage unit.

    摘要翻译: 膜厚测量装置设置有光源,光谱传感器,处理器和存储单元,并且被配置为使得来自光源的光垂直进入设置有被膜的待测平面,并且光 由待测平面反射的光进入光谱传感器。 存储单元存储各个膜厚度的各个膜厚度的反射率分布和各个膜厚度的色彩特性变量的理论值的理论值。 处理器通过使用各个膜厚度的反射率分布的理论值或各个膜的颜色特性变量的理论值,从由光谱传感器测量的反射率分布来求出要测量的平面的膜的厚度 存储在存储单元中的厚度。

    Method for measuring the thickness or curvature of thin films
    53.
    发明授权
    Method for measuring the thickness or curvature of thin films 失效
    测量薄膜厚度或曲率的方法

    公开(公告)号:US08310686B2

    公开(公告)日:2012-11-13

    申请号:US12594082

    申请日:2008-03-28

    申请人: Stephen Morris

    发明人: Stephen Morris

    IPC分类号: G01B11/28

    CPC分类号: G01B11/0625 G01B11/24

    摘要: A method and means for determining the thickness, or curvature, of a thin film or stack of thin films disposed on the surface of a substrate having a curvature comprising generating a beam of radiation, focusing the beam through the one or more films onto a surface of the substrate, measuring the intensity across the reflected beam as a function of the angle of incidence of a plurality of rays derived from the focussed beam, determining the path of each of the plurality of rays and determining the thickness, or curvature of the film, or films, from the angular dependent intensity measurement.

    摘要翻译: 一种用于确定设置在具有曲率的衬底的表面上的薄膜或薄膜层的厚度或曲率的方法和装置,包括产生辐射束,将光束通过一个或多个膜聚焦到表面上 测量作为来自聚焦光束的多个光线的入射角的函数的反射光束两端的强度,确定多个光线中的每一个的路径并确定膜的厚度或曲率 ,或电影,从角度依赖强度测量。

    Thickness detecting mechanism
    54.
    发明授权
    Thickness detecting mechanism 有权
    厚度检测机构

    公开(公告)号:US08274663B2

    公开(公告)日:2012-09-25

    申请号:US12560202

    申请日:2009-09-15

    申请人: Yung-Tai Pan

    发明人: Yung-Tai Pan

    IPC分类号: G01B11/28 B65H33/04

    CPC分类号: G01B5/06 G01B11/06

    摘要: A thickness detecting mechanism is provided for detecting a thickness of a to-be-measured article. The thickness detecting mechanism includes a detecting arm and an optical displacement sensing module. The detecting arm is moved as the to-be-measured article is sustained against the detecting arm. The detecting arm includes a surface. The optical displacement sensing module detects the surface of the detecting arm when the detecting arm is respectively located in a first position and a second position. According to the displacement amount of the detecting arm from the first position to the second position, the thickness of the to-be-measured article is acquired.

    摘要翻译: 设置有用于检测待测物品的厚度的厚度检测机构。 厚度检测机构包括检测臂和光学位移检测模块。 随着被测物品被保持在检测臂上,检测臂被移动。 检测臂包括表面。 当检测臂分别位于第一位置和第二位置时,光学位移感测模块检测检测臂的表面。 根据检测臂从第一位置到第二位置的位移量,获得待测物品的厚度。

    Optical information medium measurement method, optical information medium, recording apparatus and reproducing apparatus
    55.
    发明授权
    Optical information medium measurement method, optical information medium, recording apparatus and reproducing apparatus 有权
    光信息介质测量方法,光信息介质,记录装置和再现装置

    公开(公告)号:US08228774B2

    公开(公告)日:2012-07-24

    申请号:US12559740

    申请日:2009-09-15

    摘要: An optical information medium measurement method measures a degree of modulation in an optical information medium of a multilayered structure having a plurality of information layers. The method includes measuring the modulation degree of each layer of the optical information medium, obtaining a thickness between layers of the optical information medium, obtaining a reflectance of each layer of the optical information medium, and converting the modulation degree of each layer. The modulation degree is measured based on a value indicative of the thickness between layers, and a value indicative of the reflectance of each layer.

    摘要翻译: 光信息介质测量方法测量具有多个信息层的多层结构的光信息介质中的调制度。 该方法包括测量光信息介质的各层的调制度,获得光信息介质的层之间的厚度,获得光信息介质的各层的反射率,以及转换各层的调制度。 基于表示层之间的厚度的值和表示各层的反射率的值来测量调制度。

    Measuring system for optical monitoring of coating processes
    56.
    发明授权
    Measuring system for optical monitoring of coating processes 有权
    涂层工艺光学监测测量系统

    公开(公告)号:US08184302B2

    公开(公告)日:2012-05-22

    申请号:US11908204

    申请日:2006-02-23

    IPC分类号: G01B11/28

    CPC分类号: C23C14/547 G01B11/0683

    摘要: The invention concerns a measuring system for optical monitoring of coating processes in a vacuum chamber, in which the light source is arranged inside the vacuum chamber between the substrate carrier and a shutter is arranged beneath the substrate carrier and the light-receiving unit is arranged outside the vacuum chamber in the optical path of the light source. The substrate carrier is designed to accept at least one substrate, and it can move across the coasting source in the vacuum chamber, preferably revolving about an axis, whereby the substrate or substrates cross(es) the optical path between the light source and the light-receiving unit for transmission measurement, and the shutter shades a measurement area across the coating source.

    摘要翻译: 本发明涉及一种用于光学监测真空室中的涂布过程的测量系统,其中光源布置在基板载体和快门之间的真空室内部,布置在基板载体下方,光接收单元布置在外部 在光源的光路中的真空室。 衬底载体被设计成接受至少一个衬底,并且其可以在真空室中移动穿过滑动源,优选围绕轴线旋转,由此衬底或衬底跨越光源和光之间的光路 接收单元用于透射测量,并且快门遮蔽涂层源上的测量区域。

    Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy
    57.
    发明授权
    Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy 失效
    激光表面声波光谱法降低探针波长的方法和装置

    公开(公告)号:US08184300B2

    公开(公告)日:2012-05-22

    申请号:US11721645

    申请日:2005-12-08

    IPC分类号: G01B9/02 G01B11/28

    CPC分类号: G01N21/49 G01N21/1702

    摘要: The penetration depth of surface acoustic wave scales with wavelength. To measure thinner films using impulse stimulated thermal scattering (ISTS) it is advantageous to reduce the measurement wavelength to on the order of 1 micron. One way to reduce the measurement wavelength is to employ a high numerical aperture lens to converge an excitation and probe laser beam in an optical system at wider angles. While doing this, the increased optical/mechanical tolerances can be reduced by fine-tuning the phase between an excitation laser pattern and a probe laser pattern by adjusting either a neutral-density filter or matching plate for a particular wavelength. Blocking unwanted diffraction order beams generated by the optical system with a specialized design beam block plate is needed to retain the long wavelength capability.

    摘要翻译: 表面声波的穿透深度随波长而变化。 为了使用脉冲激发热散射(ISTS)测量更薄的薄膜,有利的是将测量波长减小到1微米量级。 降低测量波长的一种方法是使用高数值孔径透镜以更宽的角度将激发和探针激光束会聚在光学系统中。 在这样做时,通过调整特定波长的中性密度滤光器或匹配板,可以通过微调激发激光图案和探针激光图案之间的相位来降低增加的光学/机械容差。 需要用专门的设计光束阻挡板阻挡由光学系统产生的不想要的衍射光束,以保持长波长能力。

    OPTICAL FILM THICKNESS METER AND THIN FILM FORMING APPARATUS PROVIDED WITH OPTICAL FILM THICKNESS METER
    58.
    发明申请
    OPTICAL FILM THICKNESS METER AND THIN FILM FORMING APPARATUS PROVIDED WITH OPTICAL FILM THICKNESS METER 有权
    光学薄膜厚度计和薄膜形成装置的光学薄膜厚度计

    公开(公告)号:US20120105872A1

    公开(公告)日:2012-05-03

    申请号:US13381032

    申请日:2010-06-29

    IPC分类号: G01B11/28

    摘要: An optical film thickness meter capable of measurement of an optical film thickness and spectroscopic characteristics with high accuracy and a thin film forming apparatus provided with the optical film thickness meter are provided. The optical film thickness meter includes a light projector (11), a reflection mirror (17), a light receiver (19), and a monochromator (20), and the reflection mirror (17) has a reflection surface disposed substantially perpendicularly to the optical axis of measurement light on the side opposite to an actual substrate (S) with respect to an incident direction of the measurement light. Also, the actual substrate (9) is disposed having a predetermined inclination angle (α) with respect to the optical axis of the measurement light. The measurement light (outgoing light and reflection light) passes through the actual substrate (S) twice, whereby a change amount in transmissivity (light amount) can be increased, and control accuracy of film thickness measurement can be improved. Also, occurrence of a measurement error caused by a difference in transmission positions can be prevented, and since the measurement light which has not passed through the measurement substrate twice along a predetermined path is no longer detected on the light receiver (19) side, the optical film thickness and spectroscopic characteristics can be measured with high accuracy.

    摘要翻译: 提供了能够高精度地测量光学膜厚度和光谱特性以及设置有光学膜厚计的薄膜形成装置的光学膜厚计。 光学薄膜厚度计包括光投影仪(11),反射镜(17),光接收器(19)和单色仪(20),反射镜(17)具有基本垂直于 相对于测量光的入射方向与实际基板(S)相反的一侧的测量光的光轴。 此外,实际的基板(9)相对于测量光的光轴具有预定的倾斜角(α)。 测量光(出射光和反射光)通过实际基板(S)两次,从而可以提高透射率(光量)的变化量,并且可以提高膜厚测量的控制精度。 此外,可以防止由于发送位置的差异而引起的测量误差的发生,并且由于在光接收器(19)侧不再检测未沿着预定路径通过测量基板的测量光两次, 可以高精度地测量光学膜厚度和光谱特性。

    THIN FILMS MEASUREMENT METHOD AND SYSTEM
    59.
    发明申请
    THIN FILMS MEASUREMENT METHOD AND SYSTEM 有权
    薄膜测量方法和系统

    公开(公告)号:US20120044506A1

    公开(公告)日:2012-02-23

    申请号:US13270647

    申请日:2011-10-11

    IPC分类号: G01B11/28

    摘要: A method and system are provided for controlling processing of a structure. First measured data is provided being indicative of at least one of: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of: a thickness of the processed structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is indicative of the quality of processing.

    摘要翻译: 提供了一种用于控制结构的处理的方法和系统。 提供了首先测量的数据,其指示以下至少一个:在结构处理之前的结构的至少一些选定的位置中的结构W的至少一层(L2)的厚度(d2)和表面轮廓 处理前的结构。 在处理之后至少对结构的选定部位进行光学测量,并且生成第二测量数据,指示处理结构(d')的厚度和处理结构的表面轮廓中的至少一个。 通过使用第一测量数据解释第二测量数据来分析第二测量数据,以确定至少一层处理结构的厚度(d'1或d'2)。 该确定的厚度表示处理的质量。

    Method and apparatus for layer thickness measurement
    60.
    发明授权
    Method and apparatus for layer thickness measurement 有权
    层厚度测量方法和装置

    公开(公告)号:US08102542B2

    公开(公告)日:2012-01-24

    申请号:US12379608

    申请日:2009-02-25

    申请人: Robert E. Gagnon

    发明人: Robert E. Gagnon

    IPC分类号: G01B11/28

    CPC分类号: B64D15/20 G01B11/0625

    摘要: A technique for optical measurement of a thickness of a layer on a surface uses diffuse reflections at opposite boundaries of the layer, operates on transparent, or translucent layers. The thickness is determined by computing a separation between the centers of the two diffuse reflections, and using the index of refraction of the layer, and geometric properties of a beam and detector with respect to the surface. The technique is useful for quantifying thickness of a layer of rime ice, glaze ice, frosted ice, or water, for example.

    摘要翻译: 用于光学测量表面上的层的厚度的技术在层的相对边界处使用漫反射,在透明或半透明层上操作。 通过计算两个漫反射的中心之间的间隔,并使用层的折射率以及光束和检测器相对于表面的几何特性来确定厚度。 该技术可用于量化例如霜冰,釉冰,磨砂冰或水的层的厚度。