摘要:
A device is provided that can be inserted into a spectrophotometer, in order to measure the thickness and refractive index of a thin film that is on a sample plate. A pair of identical parallelogram prisms diverts the spectrophotometer beam to measure the attenuated total reflection, and returns an output beam that is in the original beam path, independent of wavelength and rotation angle. The attenuated total reflection of the thin film sample plate is measured in a prism coupling geometry, as a function of wavelength and angle. From this data, combined with normal incidence transmission data, the thickness and refractive index can be extracted.
摘要:
A film thickness measuring device is provided with a light source, a spectroscopic sensor, a processor, and a storage unit, and configured in such a manner that light from the light source vertically enters a plane to be measured provided with a film and the light reflected by the plane to be measured enters the spectroscopic sensor. The storage unit stores theoretical values of reflectivity distributions of respective film thicknesses and theoretical values of color characteristic variables of the respective film thicknesses. The processor finds the thickness of the film of the plane to be measured from the reflectivity distribution measured by the spectroscopic sensor by using the theoretical values of the reflectivity distributions of the respective film thicknesses or the theoretical values of the color characteristic variables of the respective film thicknesses stored in the storage unit.
摘要:
A method and means for determining the thickness, or curvature, of a thin film or stack of thin films disposed on the surface of a substrate having a curvature comprising generating a beam of radiation, focusing the beam through the one or more films onto a surface of the substrate, measuring the intensity across the reflected beam as a function of the angle of incidence of a plurality of rays derived from the focussed beam, determining the path of each of the plurality of rays and determining the thickness, or curvature of the film, or films, from the angular dependent intensity measurement.
摘要:
A thickness detecting mechanism is provided for detecting a thickness of a to-be-measured article. The thickness detecting mechanism includes a detecting arm and an optical displacement sensing module. The detecting arm is moved as the to-be-measured article is sustained against the detecting arm. The detecting arm includes a surface. The optical displacement sensing module detects the surface of the detecting arm when the detecting arm is respectively located in a first position and a second position. According to the displacement amount of the detecting arm from the first position to the second position, the thickness of the to-be-measured article is acquired.
摘要:
An optical information medium measurement method measures a degree of modulation in an optical information medium of a multilayered structure having a plurality of information layers. The method includes measuring the modulation degree of each layer of the optical information medium, obtaining a thickness between layers of the optical information medium, obtaining a reflectance of each layer of the optical information medium, and converting the modulation degree of each layer. The modulation degree is measured based on a value indicative of the thickness between layers, and a value indicative of the reflectance of each layer.
摘要:
The invention concerns a measuring system for optical monitoring of coating processes in a vacuum chamber, in which the light source is arranged inside the vacuum chamber between the substrate carrier and a shutter is arranged beneath the substrate carrier and the light-receiving unit is arranged outside the vacuum chamber in the optical path of the light source. The substrate carrier is designed to accept at least one substrate, and it can move across the coasting source in the vacuum chamber, preferably revolving about an axis, whereby the substrate or substrates cross(es) the optical path between the light source and the light-receiving unit for transmission measurement, and the shutter shades a measurement area across the coating source.
摘要:
The penetration depth of surface acoustic wave scales with wavelength. To measure thinner films using impulse stimulated thermal scattering (ISTS) it is advantageous to reduce the measurement wavelength to on the order of 1 micron. One way to reduce the measurement wavelength is to employ a high numerical aperture lens to converge an excitation and probe laser beam in an optical system at wider angles. While doing this, the increased optical/mechanical tolerances can be reduced by fine-tuning the phase between an excitation laser pattern and a probe laser pattern by adjusting either a neutral-density filter or matching plate for a particular wavelength. Blocking unwanted diffraction order beams generated by the optical system with a specialized design beam block plate is needed to retain the long wavelength capability.
摘要:
An optical film thickness meter capable of measurement of an optical film thickness and spectroscopic characteristics with high accuracy and a thin film forming apparatus provided with the optical film thickness meter are provided. The optical film thickness meter includes a light projector (11), a reflection mirror (17), a light receiver (19), and a monochromator (20), and the reflection mirror (17) has a reflection surface disposed substantially perpendicularly to the optical axis of measurement light on the side opposite to an actual substrate (S) with respect to an incident direction of the measurement light. Also, the actual substrate (9) is disposed having a predetermined inclination angle (α) with respect to the optical axis of the measurement light. The measurement light (outgoing light and reflection light) passes through the actual substrate (S) twice, whereby a change amount in transmissivity (light amount) can be increased, and control accuracy of film thickness measurement can be improved. Also, occurrence of a measurement error caused by a difference in transmission positions can be prevented, and since the measurement light which has not passed through the measurement substrate twice along a predetermined path is no longer detected on the light receiver (19) side, the optical film thickness and spectroscopic characteristics can be measured with high accuracy.
摘要:
A method and system are provided for controlling processing of a structure. First measured data is provided being indicative of at least one of: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of: a thickness of the processed structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is indicative of the quality of processing.
摘要:
A technique for optical measurement of a thickness of a layer on a surface uses diffuse reflections at opposite boundaries of the layer, operates on transparent, or translucent layers. The thickness is determined by computing a separation between the centers of the two diffuse reflections, and using the index of refraction of the layer, and geometric properties of a beam and detector with respect to the surface. The technique is useful for quantifying thickness of a layer of rime ice, glaze ice, frosted ice, or water, for example.