公开(公告)号：US20210171867A1

公开(公告)日：2021-06-10

申请号：US16951106

申请日：2020-11-18

申请人： Nutrition & Biosciences USA 4, Inc.

发明人： Robert DiCosimo ,  Qiong Cheng ,  Rakesh Nambiar ,  Jayme L. Paullin ,  Mark S. Payne ,  Jahnavi Chandra Prasad ,  Zheng You

IPC分类号： C11D3/22 ,  C11D11/00 ,  C08L5/00 ,  C08B37/00 ,  C11D7/26

摘要： An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

公开(公告)号：US20210170445A1

公开(公告)日：2021-06-10

申请号：US16709441

申请日：2019-12-10

申请人： THE BOEING COMPANY

发明人： Randy J. GROVE ,  Scott M. Livingston ,  Dion P. Coleman ,  Timothy L. Whiteaker ,  Patrick J. Clayton ,  Khalid S. Alshobber ,  Michael D. Atkins

IPC分类号： B05D7/00 ,  B05D3/12 ,  B05D3/10 ,  B05D3/02 ,  C09D5/00 ,  C09D175/02 ,  C09D181/04 ,  C09D175/04 ,  C11D11/00 ,  C11D7/26 ,  C11D7/40 ,  C11D17/06 ,  C11D7/50

摘要： The present disclosure provides fluid barriers as well as systems and methods of forming fluid barriers. The method includes cleaning, via a blast media, a first side of a component and heating the component to a first temperature. Subsequently, the component is cleaned using a solvent. Subsequent to heating at least the component, a primer coating layer is formed on the first side of the component, and a topcoat layer is formed in contact with the primer coating layer. A primer coating material can be heated to a second temperature prior to formation of the primer coating layer. The first temperature can be different than the second temperature.

公开(公告)号：US20210163857A1

公开(公告)日：2021-06-03

申请号：US17248959

申请日：2021-02-15

申请人： ECOLAB USA INC.

发明人： Sukhwan Soontravanich ,  Stephan Hubig ,  Altony J. Miralles

IPC分类号： C11D11/00 ,  C11D7/32 ,  C11D7/08 ,  D06L1/16 ,  D06L1/20 ,  C11D17/06 ,  C11D3/33 ,  C11D7/26 ,  C11D3/37 ,  C11D3/04 ,  C11D3/00 ,  C11D3/20 ,  C11D17/00

摘要： Linen treatment compositions and linen processes are disclosed which help to prevent iron deposition from wash water, and/or redeposition after iron containing stain (such as blood) removal by alkaline detergents. The linen treatment composition is a combination of a hydroxycarboxylic acid and an acid source, which may be organic or inorganic. The invention provides for effective iron control in a phosphorus-free formula that is also free of toxic or hazardous chemicals and includes sustainable, environmentally friendly ingredients, while still providing effective iron control.

公开(公告)号：US10961485B2

公开(公告)日：2021-03-30

申请号：US15770241

申请日：2016-11-02

申请人： BASF SE

发明人： Arend Jouke Kingma ,  Diana Neumann ,  Henning Urch

IPC分类号： C11D1/72 ,  C11D3/20 ,  C11D3/33 ,  C11D3/36 ,  C11D3/00 ,  C11D3/04 ,  C11D3/16 ,  C11D3/34 ,  C11D7/26 ,  C11D3/37 ,  C11D7/34 ,  C11D7/36 ,  C11D7/32 ,  C11D1/34 ,  C11D7/08 ,  C11D1/66 ,  C11D1/02

摘要： Aqueous formulations comprising (A) at least one organic complexing agent selected from (A1) alkali metal salts of aminopolycarboxylic acids and (A2) polymers bearing at least two —CH2—N(CH2COOH)-units per molecule, partially or fully neutralized with alkali, (B) at least one salt of at least one of the following acids: nitric acid, sulphuric acid, sulphamic acid, methanesulfonic acid, C1-C2-carboxylic acids, C2-C4-hydroxymonocarboxylic acids, C2-C7-dicarboxylic acids, unsubstituted or substituted with hydroxyl, and C4-C6-tricarboxylic acids, each unsubstituted or substituted with hydroxyl, (C) at least one compound selected from (C1) phosphoric acid C2-C10-monoalkyl esters, (C2) a C3-C10-alkynol, optionally alkoxylated with one to 10 alkoxide groups per hydroxyl group, and (C3) a C4-C10-alkynediol, optionally alkoxylated with one to 10 alkoxide groups per hydroxyl group, said aqueous formulations having pH values in the range of from 7.5 to 10.

公开(公告)号：US10927328B2

公开(公告)日：2021-02-23

申请号：US15693828

申请日：2017-09-01

申请人： ECOLAB USA INC

发明人： Sukhwan Soontravanich ,  Stephan Hubig ,  Altony J. Miralles

IPC分类号： C11D3/04 ,  C11D3/20 ,  C11D3/33 ,  C11D3/37 ,  C11D11/00 ,  C11D7/32 ,  C11D17/00 ,  C11D17/06 ,  D06L1/20 ,  D06L1/16 ,  C11D3/00 ,  C11D7/08 ,  C11D7/26

摘要： Linen treatment compositions and linen processes are disclosed which help to prevent iron deposition from wash water, and/or redeposition after iron containing stain (such as blood) removal by alkaline detergents. The linen treatment composition is a combination of a hydroxycarboxylic acid and an acid source, which may be organic or inorganic. The invention provides for effective iron control in a phosphorus-free formula that is also free of toxic or hazardous chemicals and includes sustainable, environmentally friendly ingredients, while still providing effective iron control.

公开(公告)号：US10894935B2

公开(公告)日：2021-01-19

申请号：US15984050

申请日：2018-05-18

申请人： SAMSUNG ELECTRONICS CO., LTD. ,  Dongwoo Fine-Chem Co., Ltd.

发明人： In-goo Kang ,  Sung-bae Kim ,  Baik-soon Choi ,  Sue-ryeon Kim ,  Young-taek Hong ,  Sang-tae Kim ,  Kyong-ho Lee ,  Hyung-pyo Hong ,  Seong-min Kim

IPC分类号： C11D1/00 ,  C11D3/28 ,  C11D3/20 ,  C11D3/30 ,  C11D7/50 ,  H01L21/683 ,  H01L21/02 ,  C11D7/32 ,  C11D11/00 ,  H01L21/311 ,  H01L21/768 ,  C11D3/00 ,  H01L21/304 ,  C11D3/43 ,  C11D3/24 ,  C09J183/04 ,  B32B43/00 ,  H01L21/67 ,  H01L25/065 ,  H01L23/00 ,  B32B38/10 ,  C11D7/26

摘要： Compositions for removing silicone resins and methods of thinning a substrate by using the same, as well as related methods, apparatus and systems for facilitating the removal of silicone resins are provided. The compositions for removing silicone resins, may include a heterocyclic solvent and an alkyl ammonium fluoride salt represented by a formula, (R)4N+F−, wherein R is a C1 to C4 linear alkyl group. Silicone resins may be effectively removed by using the compositions since the compositions exhibit an excellent decomposition rate with respect to the silicone resins that remain on a semiconductor substrate in a process of backside grinding of the semiconductor substrate, backside electrode formation, or the like.

公开(公告)号：US10858612B2

公开(公告)日：2020-12-08

申请号：US15797719

申请日：2017-10-30

申请人： Koninklijke Coöperatie Cosun UA ,  Dalli-Werke GmbH & Co. KG

发明人： Harry Raaijmakers ,  Tom Brooijmans ,  Robbert de Boer ,  Khalid Mahmud ,  René Mol

IPC分类号： C11D3/22 ,  C11D7/26 ,  C11D3/395 ,  C11D3/08 ,  C11D3/12 ,  C11D3/06 ,  C11D3/386 ,  C11D3/00 ,  C11D11/00 ,  A47L15/00

摘要： The invention relates to a detergent composition comprising at least one cationic derivate of a polysaccharide. The cationic derivate has an average molecular weight of less than 30000 g/mol, a degree of substitution ranging between 0.01 and 3. The invention further relates to a method of reducing, limiting or preventing the occurrence of spotting and/or filming on hard surface substrates during rinsing or washing and to the use of a detergent composition to reduce, limit or prevent the occurrence of spotting and/or filming on hard surface substrates during rinsing and/or washing.

公开(公告)号：US10827749B2

公开(公告)日：2020-11-10

申请号：US16410142

申请日：2019-05-13

申请人： GOJO Industries, Inc.

发明人： James Edmund Bingham ,  David R. Macinga

IPC分类号： A01N31/02 ,  C11D7/26 ,  C11D3/48 ,  C11D3/20 ,  A01N47/44 ,  A01N37/02 ,  A01N59/00 ,  A01N43/16 ,  A01N37/04 ,  A01N47/28

摘要： Compositions and methods for the disinfection of surfaces are provided. The compositions include a C1-6 alcohol, a primary enhancer, and an acidifying agent. The disinfectant composition is characterized by a pH of less than 3. Broad spectrum efficacy is achieved, and synergistic activity is exhibited against C. difficile spores.

公开(公告)号：US20200326629A1

公开(公告)日：2020-10-15

申请号：US16837745

申请日：2020-04-01

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Tomoya Kumagai ,  Takahiro Akiyoshi

IPC分类号： G03F7/42 ,  G03F7/004 ,  C11D7/26 ,  C11D7/50 ,  H01L21/02

摘要： A metal resist cleaning liquid including a solvent, an organic acid, and a compound (B) represented by general formula (b-1) shown below (In the formula, Rb1 and Rb2 each independently represents an alkyl group having 1 to 3 carbon atoms; Rb3 and Rb4 each independently represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; Yb1 represents a single bond, —O—, —S— or —N(Rb5)—; Rb5 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; Yb2 represents —O—, —S— or —N(Rb6)—; Rb6 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; and n represents an integer of 0 to 3).

公开(公告)号：US10790187B2

公开(公告)日：2020-09-29

申请号：US15873531

申请日：2018-01-17

申请人： Entegris, Inc.

发明人： Emanuel I. Cooper ,  Makonnen Payne ,  WonLae Kim ,  Eric Hong ,  Sheng-Hung Tu ,  Chieh Ju Wang ,  Chia-Jung Hsu

IPC分类号： C11D7/50 ,  H01L21/768 ,  B08B7/00 ,  H01L21/02 ,  C11D3/395 ,  C23G1/20 ,  C11D7/32 ,  C11D7/36 ,  C11D3/00 ,  C11D3/39 ,  C09K13/00 ,  G03F7/42 ,  C11D7/26 ,  C11D7/08 ,  C23G1/18 ,  C11D11/00 ,  C23G1/26 ,  H01L21/311

摘要： The disclosure relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing material, e.g., aluminum oxide, in the production of semiconductors that utilize an aluminum-containing etch stop layer. The compositions have a high selectivity for post-etch residue and aluminum-containing materials relative to low-k dielectric materials, cobalt-containing materials and other metals on the microelectronic device.