PULSED CFE ELECTRON SOURCE WITH FAST BLANKER FOR ULTRAFAST TEM APPLICATIONS

    公开(公告)号:US20210090846A1

    公开(公告)日:2021-03-25

    申请号:US16583163

    申请日:2019-09-25

    申请人: FEI Company

    发明人: Kun Liu Erik Kieft

    摘要: Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.

    LIGHT GUIDE ASSEMBLY FOR AN ELECTRON MICROSCOPE

    公开(公告)号:US20210082659A1

    公开(公告)日:2021-03-18

    申请号:US17011378

    申请日:2020-09-03

    申请人: FEI Company

    摘要: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.

    SYSTEM AND METHOD FOR BEAM POSITION VISUALIZATION

    公开(公告)号:US20210035775A1

    公开(公告)日:2021-02-04

    申请号:US16712553

    申请日:2019-12-12

    申请人: FEI Company

    IPC分类号: H01J37/28

    摘要: A charged-particle beam (CPB) is aligned to a primary axis of a CPB microscope by determining a first beam deflection drive to a beam deflector for directing the CPB passing a reference location displaced from the primary axis. The beam deflector is provided with a second beam deflection drive during the working mode of the CPB microscope to propagate the beam along the primary axis. The second beam deflection drive is determined based on the first beam deflection drive.

    METHOD OF MANUFACTURING A CHARGED PARTICLE DETECTOR

    公开(公告)号:US20210020400A1

    公开(公告)日:2021-01-21

    申请号:US16929752

    申请日:2020-07-15

    申请人: FEI Company

    IPC分类号: H01J37/28 H01J37/244

    摘要: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.

    METHODS AND SYSTEMS FOR ACQUIRING ELECTRON BACKSCATTER DIFFRACTION PATTERNS

    公开(公告)号:US20210005420A1

    公开(公告)日:2021-01-07

    申请号:US16460749

    申请日:2019-07-02

    申请人: FEI Company

    摘要: Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.

    MULTI-BEAM SCANNING ELECTRON MICROSCOPE
    68.
    发明申请

    公开(公告)号:US20200373115A1

    公开(公告)日:2020-11-26

    申请号:US16421192

    申请日:2019-05-23

    申请人: FEI Company

    摘要: Variable multi-beam charged particle devices for inspection of a sample include a multi-beam source that produces a plurality of charged particle beamlets, an objective lens, a sample holder for holding the sample between the objective lens and the multi-beam source, and a focusing column that directs the plurality of charged particle beamlets so that they are incident upon the sample. The focusing column directs the plurality of charged beams such that there are one or more crossovers of the plurality of charged particle beamlets, where each crossover corresponds to a point where the plurality of charged particle beamlets pass through a common location. The variable multi-beam charged particle devices also include a variable aperture that is configured to vary the current of the plurality of charged particle beamlets, and which is located at a final crossover of the one or more crossovers that is most proximate to the sample.

    Confocal chromatic sensor systems
    69.
    发明授权

    公开(公告)号:US10830586B1

    公开(公告)日:2020-11-10

    申请号:US16445974

    申请日:2019-06-19

    申请人: FEI Company

    发明人: Kelly Bruland

    IPC分类号: G01C3/08 H01J37/20 H01J37/26

    摘要: Confocal chromatic sensor systems for determining position of a sample include a beam emitter that emits a multichromatic beam incident on a surface of a sample, and a beam detector that is separate from the beam emitter and which detects a portion of the multichromatic beam reflected by the surface. The beam emitter is configured such that light of different wavelengths within the multichromatic beam have different corresponding focal lengths. The systems can include a memory storing computer readable instructions that cause a processing unit to determine which wavelength(s) are most prevalent in the detected portion of the multichromatic beam, and then determine the distance between the surface and the beam emitter based on the wavelength(s). When the surface is a sample within a charged particle beam system, a focus of the charged particle beam system or a sample position may be adjusted based on the position of the sample.

    Studying dynamic specimens in a transmission charged particle microscope

    公开(公告)号:US10825648B2

    公开(公告)日:2020-11-03

    申请号:US16364019

    申请日:2019-03-25

    申请人: FEI Comapny

    摘要: Methods and systems for examining a dynamic specimen using a Transmission Charged Particle Microscope are disclosed. An example method includes sparsifying a beam of charged particles to produce at detector an image of a sample comprising a distribution of sub-images that are mutually isolated from one another at least along an elected scan path, and using a scanning assembly to cause relative motion of said image and said detector along said scan path during a time interval Δt so as to smear out each sub-image into a detection streak on said detector, each such streak capturing temporal evolution of its associated sub-image during said time interval Δt.