公开(公告)号：US09978586B2

公开(公告)日：2018-05-22

申请号：US15087968

申请日：2016-03-31

申请人： FEI Company

发明人： Brian Roberts Routh, Jr. ,  Thomas G. Miller ,  Chad Rue ,  Noel Thomas Franco

IPC分类号： H01L21/00 ,  H01L21/02 ,  C23C14/22 ,  G01N1/32 ,  H01J37/305 ,  C23C14/30

CPC分类号： H01L21/02266 ,  C23C14/221 ,  C23C14/30 ,  G01N1/32 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/02164 ,  H01L21/02214 ,  H01L21/02362

摘要： A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.

公开(公告)号：US20180350558A1

公开(公告)日：2018-12-06

申请号：US15987847

申请日：2018-05-23

申请人： FEI Company

发明人： Noel Thomas Franco ,  Kenny Mani ,  Chad Rue ,  Joe Christian ,  Jeffrey Blackwood

IPC分类号： H01J37/305 ,  H01L21/67 ,  H01L21/263 ,  H01L21/3065 ,  H01J37/22 ,  G01N1/44 ,  G01N1/28

摘要： Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

公开(公告)号：US20210118678A1

公开(公告)日：2021-04-22

申请号：US17116504

申请日：2020-12-09

申请人： FEI Company

发明人： Brian Roberts Routh ,  Thomas G. Miller ,  Chad Rue ,  Noel Thomas Franco

IPC分类号： H01L21/02 ,  G01N1/32 ,  H01J37/305 ,  C23C14/22

摘要： A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.

公开(公告)号：US10347463B2

公开(公告)日：2019-07-09

申请号：US15374617

申请日：2016-12-09

申请人： FEI Company

发明人： Chad Rue ,  Joe Christian ,  Kenny Mani ,  Noel Thomas Franco

IPC分类号： H01L21/311 ,  H01J37/305 ,  H01J37/30 ,  H01L21/02 ,  G01N21/00

摘要： Method and system for enhanced charged particle beam processes for carbon removal. With the method and system for enhancing carbon removal, associated method and system for decreasing levels of carbon impurity in depositions, also using a precursor gas in charged particle beam processes (and particularly focused ion beam methodologies), are provided. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

公开(公告)号：US11798804B2

公开(公告)日：2023-10-24

申请号：US17116504

申请日：2020-12-09

申请人： FEI Company

发明人： Brian Roberts Routh ,  Thomas G. Miller ,  Chad Rue ,  Noel Thomas Franco

IPC分类号： H01L21/00 ,  H01L21/02 ,  G01N1/32 ,  H01J37/305 ,  C23C14/22 ,  C23C14/30

CPC分类号： H01L21/02266 ,  C23C14/221 ,  G01N1/32 ,  H01J37/3056 ,  H01L21/02164 ,  H01L21/02362 ,  C23C14/30 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/02214

摘要： A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.

公开(公告)号：US11062879B2

公开(公告)日：2021-07-13

申请号：US16719766

申请日：2019-12-18

申请人： FEI Company

发明人： Noel Thomas Franco ,  Kenny Mani ,  Chad Rue ,  Joe Christian ,  Jeffrey Blackwood

IPC分类号： H01J37/30 ,  H01L21/67 ,  H01L21/26 ,  H01J37/22 ,  G01N1/44 ,  H01L21/32 ,  H01J37/305 ,  H01L21/263 ,  H01L21/3065 ,  G01N1/28 ,  H01L21/3213

摘要： Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

公开(公告)号：US20180166272A1

公开(公告)日：2018-06-14

申请号：US15374617

申请日：2016-12-09

申请人： FEI Company

发明人： Chad Rue ,  Joe Christian ,  Kenny Mani ,  Noel Thomas Franco

IPC分类号： H01L21/02 ,  H01L21/3065 ,  H01J37/30

CPC分类号： H01J37/30 ,  G01N21/00 ,  H01J37/3056 ,  H01L21/02046 ,  H01L21/02057 ,  H01L21/02068 ,  H01L21/31122 ,  H01L21/31138

摘要： Method and system for enhanced charged particle beam processes for carbon removal. With the method and system for enhancing carbon removal, associated method and system for decreasing levels of carbon impurity in depositions, also using a precursor gas in charged particle beam processes (and particularly focused ion beam methodologies), are provided. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

公开(公告)号：US11069523B2

公开(公告)日：2021-07-20

申请号：US15985346

申请日：2018-05-21

申请人： FEI Company

发明人： Brian Roberts Routh, Jr. ,  Thomas G. Miller ,  Chad Rue ,  Noel Thomas Franco

IPC分类号： H01L21/00 ,  H01L21/02 ,  G01N1/32 ,  H01J37/305 ,  C23C14/22 ,  C23C14/30

摘要： A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.

公开(公告)号：US10546719B2

公开(公告)日：2020-01-28

申请号：US15987847

申请日：2018-05-23

申请人： FEI Company

发明人： Noel Thomas Franco ,  Kenny Mani ,  Chad Rue ,  Joe Christian ,  Jeffrey Blackwood

IPC分类号： H01J37/305 ,  H01L21/67 ,  H01L21/263 ,  H01L21/3065 ,  H01J37/22 ,  G01N1/44 ,  G01N1/28

摘要： Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

公开(公告)号：US20180277361A1

公开(公告)日：2018-09-27

申请号：US15985346

申请日：2018-05-21

申请人： FEI Company

发明人： Brian Roberts Routh, JR. ,  Thomas G. Miller ,  Chad Rue ,  Noel Thomas Franco

IPC分类号： H01L21/02 ,  G01N1/32 ,  H01J37/305 ,  C23C14/22 ,  C23C14/30

CPC分类号： H01L21/02266 ,  C23C14/221 ,  C23C14/30 ,  G01N1/32 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/02164 ,  H01L21/02214 ,  H01L21/02362

摘要： A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.