Apparatus and method for cleaning a semiconductor wafer
    61.
    发明申请
    Apparatus and method for cleaning a semiconductor wafer 审中-公开
    用于清洁半导体晶片的装置和方法

    公开(公告)号:US20060231125A1

    公开(公告)日:2006-10-19

    申请号:US11377963

    申请日:2006-03-17

    申请人: Hun-Jung Yi

    发明人: Hun-Jung Yi

    IPC分类号: C23G1/00 B08B3/00 B08B7/00

    摘要: A cleaning apparatus is provided comprising a process chamber defining a work space, a supporter apparatus for rotating a wafer, the supporter apparatus being located in the work space and the wafer being mounted on the supporter apparatus such that a processing surface of the wafer is upwardly facing, an organic solvent supplying nozzle for supplying an organic solvent into the work space to the processing surface of the wafer mounted on the supporter apparatus, and a dry gas supplying nozzle for supplying an organic solvent vapor into the work space and forming an organic solvent atmosphere therein. Thus, water remaining on the wafer may be readily removed.

    摘要翻译: 提供一种清洁装置,其包括限定工作空间的处理室,用于旋转晶片的支撑装置,所述支撑装置位于所述工作空间中,并且所述晶片安装在所述支撑装置上,使得所述晶片的处理表面向上 面向有机溶剂供给喷嘴,用于将有机溶剂供给到安装在支撑装置上的晶片的处理表面的工作空间,以及用于将有机溶剂蒸气供给到工作空间中并形成有机溶剂的干燥气体供给喷嘴 气氛。 因此,可以容易地去除残留在晶片上的水。

    Method of managing subcontracting for backend outsourcing business
    62.
    发明申请
    Method of managing subcontracting for backend outsourcing business 审中-公开
    后期外包业务分包管理方法

    公开(公告)号:US20050086120A1

    公开(公告)日:2005-04-21

    申请号:US10687224

    申请日:2003-10-16

    IPC分类号: G06Q10/00 G06F17/60

    CPC分类号: G06Q10/087 G06Q30/0601

    摘要: The present disclosure provides a method of business-to-business exchange between customers in a semiconductor manufacturing environment. In one embodiment, the method includes exchanging a product from a primary provider to a secondary provider, assigning event elements to the product through a virtual fab, and transmitting information associated with the product throughout the virtual fab, wherein the transmission of information occurs multi-directionally between the entities of the virtual fab and controlling the flow of information and the product through the virtual fab. The controlling flow is multi-directional throughout the virtual fab.

    摘要翻译: 本公开提供了半导体制造环境中的客户之间的企业对企业交换的方法。 在一个实施例中,该方法包括将产品从主提供商交换到辅助提供商,通过虚拟晶圆厂将事件元件分配给产品,以及在整个虚拟晶圆厂中传送与产品相关联的信息,其中, 定向地在虚拟晶圆的实体之间并且通过虚拟晶圆控制信息流和产品的流动。 整个虚拟晶圆厂的控制流程是多方向的。

    Variants of glycoside hydrolases
    63.
    发明申请
    Variants of glycoside hydrolases 审中-公开
    糖苷水解酶的变体

    公开(公告)号:US20050048619A1

    公开(公告)日:2005-03-03

    申请号:US10926223

    申请日:2004-08-25

    摘要: The present invention relates to variants of a parent glycoside hydrolase, comprising a substitution at one or more positions corresponding to positions 21, 94, 157, 205, 206, 247, 337, 350, 373, 383, 438, 455, 467, and 486 of amino acids 1 to 513 of SEQ ID NO: 2, and optionally further comprising a substitution at one or more positions corresponding to positions 8, 22, 41, 49, 57, 113, 193, 196, 226, 227, 246, 251, 255, 259, 301, 356, 371, 411, and 462 of amino acids 1 to 513 of SEQ ID NO: 2 a substitution at one or more positions corresponding to positions 8, 22, 41, 49, 57, 113, 193, 196, 226, 227, 246, 251, 255, 259, 301, 356, 371, 411, and 462 of amino acids 1 to 513 of SEQ ID NO: 2, wherein the variants have glycoside hydrolase activity. The present invention also relates to nucleotide sequences encoding the variant glycoside hydrolases and to nucleic acid constructs, vectors, and host cells comprising the nucleotide sequences.

    摘要翻译: 本发明涉及母体糖苷水解酶的变体,其包含在对应于位置21,94,157,205,206,247,337,350,373,383,438,455,467的一个或多个位置的取代,和 486,SEQ ID NO:2的氨基酸1至513,并且任选地还包含在对应于位置8,22,41,49,57,113,193,196,226,227,246,29的一个或多个位置的取代, SEQ ID NO:2的氨基酸1至513的251,255,259,301,356,371,411和462在对应于位置8,22,41,49,57,113, SEQ ID NO:2的氨基酸1至513的193,196,226,227,246,251,255,259,301,356,371,411和462,其中所述变体具有糖苷水解酶活性。 本发明还涉及编码变体糖苷水解酶的核苷酸序列以及包含核苷酸序列的核酸构建体,载体和宿主细胞。

    Apparatus and method for cleaning semiconductor substrates
    64.
    发明申请
    Apparatus and method for cleaning semiconductor substrates 审中-公开
    用于清洁半导体衬底的装置和方法

    公开(公告)号:US20050039776A1

    公开(公告)日:2005-02-24

    申请号:US10827512

    申请日:2004-04-19

    CPC分类号: B08B3/02 B08B3/048

    摘要: An apparatus for cleaning semiconductor substrates includes a chamber having a cleaning room and a drying room disposed over the cleaning room. The cleaning room and the drying room are separated or placed in communication with one another by a separation plate. An exhaust path is formed at a central portion of the separation plate. As de-ionized water (DI water) filling the cleaning room is drained during a dry process, the inside of the drying room is decompressed, and a drying fluid in the drying room flows from the drying room to the cleaning room along the exhaust path.

    摘要翻译: 用于清洁半导体衬底的设备包括具有清洁室和设置在清洁室上方的干燥室的室。 清洁室和干燥室通过分隔板彼此分离或放置成彼此连通。 排气路径形成在分离板的中心部分。 由于在干燥过程中排出填充清洁室的去离子水(去离子水),干燥室内部被减压,干燥室内的干燥液沿着排气通路从干燥室流向清洗室 。

    DEVICE FOR ADJUSTING WATER FLOW AND WATER TURBINE MACHINE USING THE SAME

    公开(公告)号:US20210301780A1

    公开(公告)日:2021-09-30

    申请号:US17210175

    申请日:2021-03-23

    申请人: Jung-Yi Lai

    发明人: Jung-Yi Lai

    IPC分类号: F03B15/06 F03B1/00

    摘要: A flow channel adjusting device comprises a flow channel having an inlet and a nozzle outlet corresponding to a water turbine machine, and an adjusting device for adjusting opening dimension of the nozzle outlet, comprising a driving unit, a pivoting part, and a following part. The pivoting part has a first side rotatably coupled to a first rotating element, and is driven to rotate by the driving unit for adjusting the opening dimension of the nozzle outlet. The following part has a third side rotatably coupled to a second side of the pivoting part, and a fourth side rotatably coupled to a second rotating element which translates along a second axis perpendicular to the first axis when the pivoting part is driven to rotate. The flow channel adjusting device could be utilized in water turbine machine and generator using the water turbine for adjusting amount of water flow.

    Semiconductor device formation
    66.
    发明授权
    Semiconductor device formation 有权
    半导体器件形成

    公开(公告)号:US08872260B2

    公开(公告)日:2014-10-28

    申请号:US13489227

    申请日:2012-06-05

    IPC分类号: H01L29/00

    CPC分类号: H01L21/76237

    摘要: An apparatus of and method for making a semiconductor structure having a shallow trench isolation (STI) trench with a substantially v-shaped profile, that is the distance between top portions is greater than the distance between bottom portions of shallow trench isolation (STI) structure sidewalls adjacent to the trench, provides for substantially seamless and substantially void-free gate structures. The semiconductor structures are formed by implanting an implantation species into the sidewalls, which allows for the top portions of the sidewalls to be etched away at a greater rate than that of the bottom portions, resulting in the substantially v-shaped profile. And the substantially v-shaped profile allows for subsequent device layers to more easily and smoothly fill in the v-shaped trenches, due to a wider opening toward the tops of the trenches.

    摘要翻译: 用于制造具有基本上V形轮廓的浅沟槽隔离(STI)沟槽的半导体结构的装置和方法,即,顶部之间的距离大于浅沟槽隔离(STI)结构的底部之间的距离 邻近沟槽的侧壁提供基本上无缝且基本上无空隙的栅极结构。 半导体结构通过将注入物质注入到侧壁中形成,这允许侧壁的顶部以比底部部分更高的速率被蚀刻掉,从而形成基本上V形的轮廓。 并且由于朝向沟槽的顶部的更宽的开口,基本上V形的轮廓允许随后的器件层更容易且平滑地填充在V形沟槽中。

    SEMICONDUCTOR DEVICE FORMATION
    68.
    发明申请
    SEMICONDUCTOR DEVICE FORMATION 有权
    半导体器件形成

    公开(公告)号:US20130320484A1

    公开(公告)日:2013-12-05

    申请号:US13489227

    申请日:2012-06-05

    IPC分类号: H01L29/00 H01L21/76

    CPC分类号: H01L21/76237

    摘要: An apparatus of and method for making a semiconductor structure having a shallow trench isolation (STI) trench with a substantially v-shaped profile, that is the distance between top portions is greater than the distance between bottom portions of shallow trench isolation (STI) structure sidewalls adjacent to the trench, provides for substantially seamless and substantially void-free gate structures. The semiconductor structures are formed by implanting an implantation species into the sidewalls, which allows for the top portions of the sidewalls to be etched away at a greater rate than that of the bottom portions, resulting in the substantially v-shaped profile. And the substantially v-shaped profile allows for subsequent device layers to more easily and smoothly fill in the v-shaped trenches, due to a wider opening toward the tops of the trenches.

    摘要翻译: 用于制造具有基本上V形轮廓的浅沟槽隔离(STI)沟槽的半导体结构的装置和方法,即,顶部之间的距离大于浅沟槽隔离(STI)结构的底部之间的距离 邻近沟槽的侧壁提供基本上无缝且基本上无空隙的栅极结构。 半导体结构通过将注入物质注入到侧壁中形成,这允许侧壁的顶部以比底部部分更高的速率被蚀刻掉,从而形成基本上V形的轮廓。 并且由于朝向沟槽的顶部的更宽的开口,基本上V形的轮廓允许随后的器件层更容易且平滑地填充在V形沟槽中。

    Bacillus licheniformis and method for detoxification of zearalenone
    70.
    发明授权
    Bacillus licheniformis and method for detoxification of zearalenone 有权
    地衣芽孢杆菌和玉米赤霉烯酮解毒方法

    公开(公告)号:US08404477B2

    公开(公告)日:2013-03-26

    申请号:US12790322

    申请日:2010-05-28

    IPC分类号: C12N1/20

    摘要: The present invention discloses an isolated pure culture of a novel strain CK1 of Bacillus licheniformis, DSM 025954, capable of detoxification of zearalenone (ZEN). Using physiological, biochemical, morphological identification and 16S rRNA gene sequence analysis methods, the strain CK1 was identified as Bacillus licheniformis. Through extracellular xylanase, CMCase protease assays and evaluations for zearalenone detoxification, the strain CK1 strain was identified to possess good ZEN-detoxifying ability, to be non-hemolytic, non-enterotoxin producing, and displayed high levels of extracellular xylanase, cellulase, and protease activities. Accordingly, Bacillus licheniformis CK1 can be applied as food and feed supplement for bio-detoxification of ZEN.

    摘要翻译: 本发明公开了能够解毒玉米赤霉烯酮(ZEN)的地衣芽孢杆菌DSM 025954的新型菌株CK1的分离纯培养物。 利用生理,生化,形态鉴定和16S rRNA基因序列分析方法,鉴定出菌株CK1为地衣芽孢杆菌。 通过细胞外木聚糖酶,CMCase蛋白酶测定和玉米赤霉烯酮解毒评估,鉴定出菌株CK1菌株具有良好的ZEN解毒能力,为非溶血性,非肠毒素产生,并显示高水平的细胞外木聚糖酶,纤维素酶和蛋白酶 活动 因此,地衣芽孢杆菌CK1可作为食品和饲料添加剂用于ZEN的生物解毒。