公开(公告)号：US20050191790A1

公开(公告)日：2005-09-01

申请号：US11102295

申请日：2005-04-07

Applicant: Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

Inventor： Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/44 ,  H01L21/48

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20050170614A1

公开(公告)日：2005-08-04

申请号：US11093927

申请日：2005-03-29

Applicant: Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

Inventor： Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/301 ,  H01L21/00 ,  H01L21/44

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20050157375A1

公开(公告)日：2005-07-21

申请号：US11056752

申请日：2005-02-11

Applicant: Jonathan Doan ,  Andrew Huibers ,  Satyadev Patel ,  James Dunphy ,  Dmitri Simonian ,  Hongqin Shi ,  Jianglong Zhang

Inventor： Jonathan Doan ,  Andrew Huibers ,  Satyadev Patel ,  James Dunphy ,  Dmitri Simonian ,  Hongqin Shi ,  Jianglong Zhang

IPC: G02B26/00

CPC classification number: B82Y30/00

Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.

Abstract translation: 本文公开了一种具有面向可变形铰链的微反射镜装置，可偏转和反射的反射镜板附接到该反射镜。 响应于在镜板和与镜板相关联的寻址电极之间建立的静电场，镜板旋转到不同的角度。

公开(公告)号：US20050054135A1

公开(公告)日：2005-03-10

申请号：US10969380

申请日：2004-10-19

Applicant: Satyadev Patel ,  Jonathan Doan ,  Andrew Huibers

Inventor： Satyadev Patel ,  Jonathan Doan ,  Andrew Huibers

IPC: B81B7/00 ,  B81C20060101 ,  B81C1/00 ,  H01L21/00 ,  H01L21/76

CPC classification number: B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

Abstract: A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.

Abstract translation: 本文公开了一种用于处理微机电装置的方法。 该方法通过在连续的牺牲层和结构层之间提供选定的阻挡层来防止牺牲层与微机电器件的结构层之间的扩散和相互作用。

公开(公告)号：US07459402B2

公开(公告)日：2008-12-02

申请号：US11135699

申请日：2005-05-24

Applicant: Jonathan Doan ,  Satyadev Patel ,  Peter Heureux

Inventor： Jonathan Doan ,  Satyadev Patel ,  Peter Heureux

IPC: H01L21/302

CPC classification number: G02B26/0841 ,  G02B26/0833

Abstract: To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.

Abstract translation: 为了保护结构层在蚀刻过程中不被腐蚀，保护层沉积在微镜的暴露的结构层上。 在蚀刻之前沉积保护层并在蚀刻后除去。

公开(公告)号：US07459333B2

公开(公告)日：2008-12-02

申请号：US11332018

申请日：2006-01-12

Applicant: Peter Richards ,  Andrew Huibers ,  Satyadev Patel

Inventor： Peter Richards ,  Andrew Huibers ,  Satyadev Patel

IPC: G09G3/34

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A projection system is disclosed herein. The projection system employs a spatial light modulator comprising an array of individually addressable pixels for modulating the incident light based on image data. The modulated light is projected on a screen for viewing.

Abstract translation: 本文公开了一种投影系统。 投影系统采用包括可单独寻址的像素阵列的空间光调制器，用于基于图像数据调制入射光。 调制光投影在屏幕上以供观看。

公开(公告)号：US07312915B2

公开(公告)日：2007-12-25

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg·m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US07215458B2

公开(公告)日：2007-05-08

申请号：US10982259

申请日：2004-11-05

Applicant: Peter Richards ,  Satyadev Patel ,  Andrew G. Huibers ,  Michel Combes

Inventor： Peter Richards ,  Satyadev Patel ,  Andrew G. Huibers ,  Michel Combes

IPC: G02B26/00

CPC classification number: G09G3/346 ,  G09G2320/04

Abstract: A method and apparatus for operating spatial light modulator have been disclosed herein. The spatial light modulator comprises an array of micromirror devices, each of which further comprises a reflective deflectable mirror plate attached to a deformable hinge, and an addressing electrode for addressing and deflecting the mirror plate.

Abstract translation: 本文已经公开了用于操作空间光调制器的方法和装置。 空间光调制器包括微镜器件的阵列，每个微镜器件还包括连接到可变形铰链的反射偏转镜板，以及用于寻址和偏转镜板的寻址电极。

公开(公告)号：US20060262382A1

公开(公告)日：2006-11-23

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg.m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US20060232785A1

公开(公告)日：2006-10-19

申请号：US11110557

申请日：2005-04-19

Applicant: Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

Inventor： Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02058 ,  G01J3/453

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.