公开(公告)号：US20060203867A1

公开(公告)日：2006-09-14

申请号：US11244363

申请日：2005-10-06

Applicant: Yuji Imai

Inventor： Yuji Imai

IPC: H01S5/00

CPC classification number: H01S5/2231 ,  H01S5/2214 ,  H01S5/2275 ,  H01S5/32316 ,  H01S5/32325 ,  H01S5/32333 ,  H01S5/32341 ,  H01S5/4031 ,  H01S5/4087

Abstract: Both lateral side portions of a laser diode chip separated by the central portions of a p-type capping layer and a p-type clad layer and parallel to the horizontal edges of the cleavage planes of the chip are cut away by etching, so that the p-type capping layer and the p-type clad layer take the shape of a mountain in cleavage planes which are the end faces of an active layer. The cut portions are provided with current restricting layers of oxide film made by baking a liquid oxide film. The thicknesses of the current restricting layers are increased with distance from the central portion of the laser diode chip.

Abstract translation: 通过蚀刻将由p型覆盖层和p型覆盖层的中心部分分离并平行于芯片的解理面的水平边缘的激光二极管芯片的两个侧面侧部分切除， p型覆盖层和p型覆盖层在作为有源层的端面的解理面中呈山形。 切割部分设置有通过烘焙液体氧化物膜制成的氧化膜的电流限制层。 电流限制层的厚度随着与激光二极管芯片的中心部分的距离而增加。

公开(公告)号：US20050218416A1

公开(公告)日：2005-10-06

申请号：US10898204

申请日：2004-07-26

Applicant: Dong Cho ,  Masayoshi Koike ,  Yuji Imai ,  Min Kim ,  Bang Oh ,  Hun Hahm

Inventor： Dong Cho ,  Masayoshi Koike ,  Yuji Imai ,  Min Kim ,  Bang Oh ,  Hun Hahm

IPC: H01L21/00 ,  H01L21/20 ,  H01L33/06 ,  H01L33/12 ,  H01L33/32 ,  H01L33/42 ,  H01L33/00

CPC classification number: H01L33/0075 ,  H01L21/02389 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/02639 ,  H01L21/02647

Abstract: Provided are a nitride semiconductor light-emitting device comprising a polycrystalline or amorphous substrate made of AlN; a plurality of dielectric patterns formed on the AlN substrate and having a stripe or lattice structure; a lateral epitaxially overgrown-nitride semiconductor layer formed on the AlN substrate having the dielectric patterns by Lateral Epitaxial Overgrowth; a first conductive nitride semiconductor layer formed on the nitride semiconductor layer; an active layer formed on the first conductive nitride semiconductor layer; and a second conductive nitride semiconductor layer formed on the active layer; and a process for producing the same.

Abstract translation: 提供一种氮化物半导体发光器件，其包括由AlN制成的多晶或非晶衬底; 形成在所述AlN基板上并具有条纹或格子结构的多个电介质图案; 通过横向外延生长形成在具有电介质图案的AlN衬底上的侧向外延氮化半导体层; 形成在所述氮化物半导体层上的第一导电氮化物半导体层; 形成在所述第一导电氮化物半导体层上的有源层; 以及形成在所述有源层上的第二导电氮化物半导体层; 及其制造方法。

公开(公告)号：US06862279B1

公开(公告)日：2005-03-01

申请号：US09590264

申请日：2000-06-09

Applicant: Yuji Imai ,  Masanobu Yuhara

Inventor： Yuji Imai ,  Masanobu Yuhara

IPC: H04M3/00 ,  H04L12/18 ,  H04L12/46 ,  H04L12/70 ,  H04L12/701 ,  H04L12/761 ,  H04L12/28

CPC classification number: H04L12/1854

Abstract: A multicast distribution system of packet comprises routers connected with each other by a cable. Nodes are connected to each of the routers. The routers or the nodes is provided with a unit for relaying a packet having a list of the plurality of destination addresses and its undistributed bit map to the packet header to be transferred, according to the unicast route.

Abstract translation: 分组的组播分发系统包括通过电缆相互连接的路由器。 节点连接到每个路由器。 路由器或节点具有一个单元，用于根据单播路由将具有多个目的地地址列表的分组及其未分配的位图中继到要传送的分组报头。

公开(公告)号：US06763235B2

公开(公告)日：2004-07-13

申请号：US09778871

申请日：2001-02-08

Applicant: Yuji Imai

Inventor： Yuji Imai

IPC: H04Q720

CPC classification number: H04L29/12311 ,  H04L61/2084 ,  H04W8/26

Abstract: A management server managing a fixed address of a mobile terminal, at least two dynamic addresses dynamically allotted to the mobile terminal when it exists in two service areas at one time. A host transmits a packet with the fixed address of the mobile terminal used as a header. If the mobile terminal exist in at least the two service areas (apart from other areas), it notifies a management server of the dynamic addresses of the two service areas in real time. If the packet is transmitted from the host and the two dynamic addresses are allotted to the mobile terminal, the management server transfers a packet with these two dynamic addresses used as a header.

Abstract translation: 管理移动终端的固定地址的管理服务器，当一次存在于两个服务区域时动态分配给移动终端的至少两个动态地址。 主机发送具有用作报头的移动终端的固定地址的分组。 如果移动终端存在于至少两个服务区域（除其他区域之外），则实时地向管理服务器通知两个服务区域的动态地址。 如果从主机发送分组，并且将两个动态地址分配给移动终端，则管理服务器传送具有用作报头的这两个动态地址的分组。

公开(公告)号：US06624879B2

公开(公告)日：2003-09-23

申请号：US09883925

申请日：2001-06-20

Applicant: Yuji Imai

Inventor： Yuji Imai

IPC: G03B2742

CPC classification number: G03F7/70641 ,  G03F7/7065 ,  G03F7/70916 ,  G03F9/7034

Abstract: An exposure apparatus and method for a photolithographic process uses a projection optical system that transfers an image of a reticle pattern onto a first shot area on a wafer, the first shot area being made coincident with an image plane within an exposure field of the system. When moving a second shot area into the exposure field, variations in the vertical position of the wafer are compensated by a Z/levelling-stage. Focusing and exposure are performed for the second shot area after an AF sensor system measures and stores a defocus amount of the second shot area relative to the image plane. Repeating this procedure for shot areas on the wafer yields a plurality of defocus amounts, from which any foreign matter existing on the bottom of the wafer is detected. Alternatively, for exposing the first shot area, the vertical position and tilt angle of the wafer are made coincident with those of the image plane. When positioning the second shot area into the exposure field, the tilt angle is kept unchanged, and is measured and stored. Before exposing the second shot area, the vertical position and tilt angle of the wafer is made coincident with those of the image plane. Foreign matter on the wafer is detected from a distribution of the tilt angles on the surface of the wafer.

Abstract translation: 用于光刻工艺的曝光装置和方法使用投影光学系统，其将掩模版图案的图像转印到晶片上的第一照射区域上，使第一照射区域与系统的曝光区域内的图像平面一致。 当将第二拍摄区域移动到曝光区域中时，通过Z /调平阶段补偿晶片的垂直位置的变化。 在AF传感器系统测量并存储相对于图像平面的第二拍摄区域的散焦量之后，对第二拍摄区域进行聚焦和曝光。 对晶片上的拍摄区域重复该过程产生多个散焦量，从晶片底部存在任何杂质。 或者，为了曝光第一拍摄区域，使晶片的垂直位置和倾斜角与图像平面的垂直位置和倾斜角一致。 当将第二拍摄区域定位到曝光场中时，倾斜角度保持不变，并被测量和存储。 在曝光第二照射区域之前，使晶片的垂直位置和倾斜角与图像平面的垂直位置和倾斜角一致。 从晶片表面上的倾斜角度的分布来检测晶片上的异物。

公开(公告)号：US06287734B1

公开(公告)日：2001-09-11

申请号：US09739627

申请日：2000-12-20

Applicant: Yuji Imai

Inventor： Yuji Imai

IPC: G03F900

Abstract: An exposure method for a photolithographic process uses a projection exposure apparatus including a projection optical system. The surface of a first shot area on a wafer is caused to be coincident with an image plane of the projection optical system within an exposure field thereof so as to achieve focused condition, and an image of a reticle pattern is transferred onto the first shot area. Then, a second shot area is moved into the exposure field, during which the vertical position of the wafer is corrected by means of a Z/levelling-stage so as to compensate for the variation in the vertical position of the wafer W which could otherwise occur depending on the angle formed between the running plane of the wafer stage and the image plane. Then, an AF sensor system is used to measure and store a defocus amount of the second shot area relative to the image plane. Then, focusing and exposure are performed for the second shot area. This procedure is repeated for the shot areas on the wafer so as to obtain a plurality of defocus amounts, from which any foreign matter existing on the bottom of the wafer are detected. In another embodiment, the vertical position and tilt angle of the wafer are caused to be coincident with those of the image plane, and the first shot area is exposed. Then, the wafer is moved so as to position the second shot area into the exposure field, during which the tilt angle of the surface of the wafer is kept unchanged. Then, the tilt angle of the wafer is measured and stored. Thereafter, the vertical position and tilt angle of the wafer are caused to be coincident with those of the image plane, and the second shot area is exposed. Foreign matter are detected from a distribution of the tilt angles on the surface of the wafer.

公开(公告)号：US06247855B1

公开(公告)日：2001-06-19

申请号：US09239402

申请日：1999-01-28

Applicant: Katsumi Motohashi ,  Yuji Kobayashi ,  Naohiro Tsuchida ,  Takashi Muroi ,  Yuji Imai ,  Yasuo Asakura

Inventor： Katsumi Motohashi ,  Yuji Kobayashi ,  Naohiro Tsuchida ,  Takashi Muroi ,  Yuji Imai ,  Yasuo Asakura

IPC: G03B1702

CPC classification number: G03B17/02

Abstract: A lens protecting cover-attached camera includes a moving mechanism. Thus, a simple mechanism is used to turn on or off a main power switch and for opening or closing a lens protecting cover responsively to manipulations performed on a single manipulating member. A supporting shaft for supporting the lens protecting cover is placed so as to be parallel to a plane substantially perpendicular to the optical axis of a photographic lens. When the supporting shaft is moved along the optical axis of the photographic lens, the moving mechanism causes the lens protecting cover to rotate around the supporting shaft at the center from a closed position to an open position. At the closed position, the lens protecting cover shields the face of the photographic lens. At the open position, the lens protecting cover exposes the face of the lens. Moreover, the moving mechanism turns on or off the power switch in response to a movement made along the optical axis of the photographic lens.

Abstract translation: 镜头保护盖附件摄像机包括移动机构。 因此，使用简单的机构来打开或关闭主电源开关，以及响应于在单个操作构件上执行的操作而打开或关闭镜头保护盖。 用于支撑镜片保护罩的支撑轴被放置成平行于基本上垂直于摄影镜片的光轴的平面。 当支撑轴沿着摄影镜头的光轴移动时，移动机构使得镜片保护罩在关闭位置到打开位置的中心处围绕支撑轴旋转。 在关闭位置，透镜保护盖遮住摄影镜头的表面。 在打开位置，镜头保护盖露出镜头的脸部。 此外，移动机构响应于沿摄影透镜的光轴的移动而导通或断开电源开关。

公开(公告)号：US06195154B1

公开(公告)日：2001-02-27

申请号：US09323042

申请日：1999-06-01

Applicant: Yuji Imai

Inventor： Yuji Imai

IPC: G03B2742

CPC classification number: G03F9/7026 ,  G03F9/7034

Abstract: A projection exposure apparatus detects positions at the measurement points (P1-P5) in the Z-direction on the shot area of the wafer W, and obtains the distribution of the irregularity of the shot area based on the detected result and the pre-known process structure data. For example, when the pattern having the narrowest line width is exposed in the pattern area (40B), the pattern area (40B) is made as a focusing reference plane and the difference in level (ZA-ZB) of another area of which reference is pattern area (40B) is added to the level of the best image plane (42) as an offset value. The pattern area (40B) is focused to the best image plane (42) by fitting image plane (42A) to the exposure surface.

Abstract translation: 投影曝光装置检测晶片W的拍摄区域的Z方向上的测量点（P1-P5）的位置，并根据检测结果和预先知道的方式获得拍摄区域的不规则性的分布 过程结构数据。 例如，当在图案区域（40B）中露出具有最窄线宽的图案时，将图案区域（40B）作为聚焦基准面，并将其参考的另一区域的水平差（ZA-ZB） 将图案区域（40B）添加到最佳图像平面（42）的水平作为偏移值。 图案区域（40B）通过将图像平面（42A）装配到曝光表面而聚焦到最佳图像平面（42）。

公开(公告)号：US6094542A

公开(公告)日：2000-07-25

申请号：US263164

申请日：1999-03-05

Applicant: Junichi Itoh ,  Yuji Imai ,  Yasuo Tambara

Inventor： Junichi Itoh ,  Yuji Imai ,  Yasuo Tambara

IPC: G03B17/24 ,  G11B15/02 ,  G11B31/00

CPC classification number: G11B31/00 ,  G03B17/24 ,  G03B2217/244 ,  G11B15/02

Abstract: A camera of this invention detects the presence or absence of magnetic data and prevents at least occurrence of a frame of double exposure or unexposed frame even under the influence of an electromagnetic noise. The position of a perforation of a film is detected by a position detecting section and whether a magnetic head is set in contact with a recording area adjacent to an exposed frame or a recording inhibition area adjacent to a portion between the adjacent exposed frames is determined. A threshold value used for determining the presence or absence of magnetic data is set in a threshold setting circuit based on an output generated when the position detecting circuit determines that the magnetic head is set in contact with the recording inhibition area. An output of the magnetic head is compared with the threshold value by a determination circuit and the presence or absence of magnetic data in the recording area is determined when the position detecting circuit determines that the magnetic head is set in contact with the recording area. Whether the operation of the magnetic head is permitted or inhibited is determined based on an output of the determination circuit.

Abstract translation: 本发明的照相机即使在电磁噪声的影响下，也可以检测是否存在磁数据，并且至少防止发生双曝光或未曝光的帧。 通过位置检测部分检测胶片穿孔的位置，以及确定磁头是否设置为与暴露的框架相邻的记录区域或与相邻的曝光框架之间的部分相邻的记录禁止区域接触。 用于确定磁数据的存在或不存在的阈值是基于当位置检测电路确定磁头被设置为与记录禁止区域接触时产生的输出而设置在阈值设置电路中。 通过确定电路将磁头的输出与阈值进行比较，并且当位置检测电路确定磁头被设置为与记录区域接触时，确定记录区域中是否存在磁数据。 基于确定电路的输出确定磁头的操作是允许还是禁止。

公开(公告)号：US6033130A

公开(公告)日：2000-03-07

申请号：US178708

申请日：1998-10-26

Applicant: Takashi Muroi ,  Yuji Kobayashi ,  Katsumi Motohashi ,  Sumio Kawai ,  Yuji Imai ,  Yasuo Asakura ,  Tatsuya Suzuki

Inventor： Takashi Muroi ,  Yuji Kobayashi ,  Katsumi Motohashi ,  Sumio Kawai ,  Yuji Imai ,  Yasuo Asakura ,  Tatsuya Suzuki

IPC: G03B17/04

CPC classification number: G03B17/04

Abstract: A lens cover mounted camera with a lens cover movable to selectively assume at least a closing condition that covers a front surface of a photographing lens and an opening condition that exposes the front surface of the photographing lens, and further having a lens cover operating member for conducting the opening and closing operations of the lens cover and further for shifting the lens cover in directions of the optical axis of the photographing lens. When the camera is switched to a using condition or a non-using condition, the lens cover is respectively shifted to an opening position or a closing position through the lens cover operating member. This design minimizes the protruding quantity of the lens cover from a camera body and prevents the lens cover from being easily broken even if a careless external force or shock works on the lens cover during the use of the camera.

Abstract translation: 一种具有透镜盖的透镜盖安装的相机，其可移动以选择性地呈现覆盖拍摄镜头的前表面的至少一个关闭状态和暴露拍摄镜头的前表面的打开状态，并且还具有镜头盖操作构件， 进行透镜盖的打开和关闭操作，并进一步使透镜盖沿摄影镜头的光轴方向移动。 当相机切换到使用状态或非使用状态时，透镜盖分别通过透镜盖操作部件移动到打开位置或关闭位置。 这种设计使得相机机身的镜头盖的突出量最小化，并且即使在使用相机期间在镜头盖上产生粗心的外力或震动，也能防止镜头盖容易损坏。