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108 条记录 (耗时 0.032 秒)

    Optical subassembly
    61.
    发明授权
    Optical subassembly 有权

    公开(公告)号：US06643420B2

    公开(公告)日：2003-11-04

    申请号：US10178337

    申请日：2002-06-25

    申请人： Hongtao Han ,  Michael R. Feldman

    发明人： Hongtao Han ,  Michael R. Feldman

    IPC分类号： G02B612

    CPC分类号： G02B6/4224 ,  G02B6/4204 ,  G02B6/4214 ,  G02B6/4231 ,  G02B6/424 ,  G02B6/4246 ,  G02B6/4249 ,  G02B6/4251 ,  G02B6/4259 ,  G02B6/4261

    摘要： An optical subassembly includes an opto-electronic device, an optics block and a spacer, separate from the optics block and providing spacing between the opto-electronic device and the optics block. The opto-electronic device, the optics block and the spacer are aligned and bonded together. This subassembly is particularly useful when coupling light between the opto-electronic device and a fiber. The optical subassembly may also include an opto-electronic device, an optics block and a sealing structure surrounding the opto-electronic device. The opto-electronic device, the optics block and the sealing structure are aligned and bonded together.

    Diffractive vertical cavity surface emitting laser power monitor and system
    64.
    发明授权
    Diffractive vertical cavity surface emitting laser power monitor and system 有权
    衍射垂直腔表面发射激光功率监视器和系统

    公开(公告)号：US06404959B1

    公开(公告)日：2002-06-11

    申请号：US09984915

    申请日：2001-10-31

    申请人： Robert Te Kolste ,  Alan D. Kathman ,  Eric G. Johnson ,  Michael R. Feldman

    发明人： Robert Te Kolste ,  Alan D. Kathman ,  Eric G. Johnson ,  Michael R. Feldman

    IPC分类号： G02B676

    CPC分类号： H01S5/02296 ,  G02B6/4201 ,  G02B6/4206 ,  G02B6/424 ,  G02B6/4245 ,  G02B6/4251 ,  G02B6/4255 ,  G02B6/4259 ,  G02B6/4263 ,  G02B6/4286 ,  H01S5/0683 ,  H01S5/183

    摘要： A power monitor for a light emitter emitting from a single face creates a monitor beam by deflecting a portion of the application beam and further manipulating the monitor beam to allow more efficient use of the monitor beam. For example, the monitor beam may be collimated to allow an increase in spacing between the light emitter and a detector for sensing the monitor beam. Alternatively or additionally, the monitor beam may be focused to allow use of a smaller detector and of a smaller percentage of the application beam. The diffractive element deflecting the beam may be either transmissive or reflective. The additionally manipulation of the monitor beam may be provided by the same diffractive element which deflects the beam, which is particularly useful when the diffractive element is reflective, and/or by additional optical elements.

    摘要翻译： 用于从单个面发射的发光体的功率监视器通过偏转施加光束的一部分而产生监视器光束，并进一步操纵监视器光束以允许更有效地使用监视器光束。 例如，监视器光束可以被准直，以允许光发射器和用于感测监视器光束的检测器之间的间隔的增加。 或者或另外，监视器光束可以被聚焦以允许使用较小的检测器和较小百分比的施加光束。 偏转光束的衍射元件可以是透射的或反射的。 监视器光束的附加操作可以由偏转光束的相同的衍射元件提供，当衍射元件是反射的时，该光束是特别有用的，和/或通过附加的光学元件。

    Beam homogenizer
    65.
    发明授权
    Beam homogenizer 有权
    梁匀浆机

    公开(公告)号：US06278550B1

    公开(公告)日：2001-08-21

    申请号：US09484050

    申请日：2000-01-18

    申请人： Alan D Kathman ,  Michael R. Feldman

    发明人： Alan D Kathman ,  Michael R. Feldman

    IPC分类号： G02B502

    CPC分类号： G02B5/0252 ,  B23K26/06 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/066 ,  B23K26/0665 ,  G02B5/0278 ,  G02B5/1819 ,  G02B5/1857 ,  G02B5/32 ,  G02B19/0014 ,  G02B19/0057 ,  G02B19/0095 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G03F7/70058 ,  G03H1/0236 ,  G03H2001/085 ,  G03H2001/303 ,  H04B10/50 ,  Y10S359/90

    摘要： A beam homogenizer that minimizes undesired intensity variations at the output plane caused by sharp breaks between facets in previous embodiments. The homogenizer includes a hologram made up of irregularly patterned diffractive fringes. An input beam illuminates at least part of the hologram. The hologram transmits a portion of the input beam onto an output plane. In doing so, the energy of the input beam is spatially redistributed at the output plane into a homogenized output beam having a preselected spatial energy distribution at the output plane. Thus, the illuminated portion of the output plane has a shape predetermined by the designer of the homogenizer.

    摘要翻译： 一种光束均化器，其最小化在先前实施例中由小面之间的尖锐断裂引起的在输出平面处的不期望的强度变化。 均化器包括由不规则图案化的衍射条纹构成的全息图。 输入光束照亮全息图的至少一部分。 全息图将输入光束的一部分传输到输出平面上。 在这样做时，输入光束的能量在输出平面处被空间重新分布成具有在输出平面处的预选的空间能量分布的均质输出光束。 因此，输出平面的照明部分具有由均化器的设计者预定的形状。

    Fabricating optical elements using a photoresist formed from contact printing of a gray level mask
    67.
    发明授权
    Fabricating optical elements using a photoresist formed from contact printing of a gray level mask 失效
    使用由灰度级掩模的接触印刷形成的光致抗蚀剂制造光学元件

    公开(公告)号：US6071652A

    公开(公告)日：2000-06-06

    申请号：US44864

    申请日：1998-03-20

    申请人： Michael R. Feldman ,  Thomas J. Suleski ,  William F. Delaney

    发明人： Michael R. Feldman ,  Thomas J. Suleski ,  William F. Delaney

    IPC分类号： G02B3/00 ,  G03F1/00 ,  G03F9/00

    CPC分类号： G02B3/0012 ,  G03F1/50 ,  G02B3/0056

    摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto photoresist. The photoresist is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist. The etched photoresist is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresists. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.

    摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变光吸收层的厚度来产生期望的灰度图案。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂上。 然后蚀刻光致抗蚀剂，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂中。 然后将蚀刻的光致抗蚀剂光刻地制造用于注射成型或其它复制技术的光学元件本身或主元件。 可以重复使用灰度掩模本身以产生光刻胶。 该成像对于形成具有多个折射元件阵列的光学元件特别有用。

    Projection pointer
    69.
    发明授权
    Projection pointer 失效

    公开(公告)号：US5718496A

    公开(公告)日：1998-02-17

    申请号：US668976

    申请日：1996-06-25

    申请人： Michael R. Feldman ,  Alan D. Kathman

    发明人： Michael R. Feldman ,  Alan D. Kathman

    IPC分类号： G02B5/18 ,  G02B5/32 ,  G02B27/20 ,  G02B27/58 ,  G03B21/00

    CPC分类号： G02B27/20 ,  G02B27/58 ,  G02B5/1842 ,  G02B5/1871 ,  G02B5/32

    摘要： An improved optical system is disclosed for projecting light in the form of an image to a remote target. The laser light source and a holographic optical element are mounted together in optical alignment. The optical element is created using iterative discrete computer encoding for optimum efficiency. In alternate embodiments, the diffractive optical element has a collimating lens encoded into the grating levels and it also performs soft aperture circularizing using either amplitude or phase control over the coherent light. An embossed diffractive optical element laminated to an injection-molded refractive element is also disclosed.

    Integrated optical imaging systems including an interior space between opposing substrates and associated methods
    70.
    发明授权
    Integrated optical imaging systems including an interior space between opposing substrates and associated methods 有权
    集成光学成像系统，包括相对基板之间的内部空间和相关方法

    公开(公告)号：US08153957B2

    公开(公告)日：2012-04-10

    申请号：US11928060

    申请日：2007-10-30

    申请人： Michael R. Feldman ,  Brian Harden ,  Alan D. Kathman ,  W. Hudson Welch

    发明人： Michael R. Feldman ,  Brian Harden ,  Alan D. Kathman ,  W. Hudson Welch

    IPC分类号： H01J40/14

    CPC分类号： H01L27/14632 ,  H01L25/167 ,  H01L27/14618 ,  H01L27/14625 ,  H01L31/02325 ,  H01L31/02327 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An integrated optical imaging system includes a first substrate having first and second opposing surfaces, a second substrate having third and fourth opposing surfaces, a spacer between a substantially planar portion of the third surface of the second substrate and a substantially planar portion of the second surface of the first substrate, at least two of the spacer, the first substrate and the second substrate sealing an interior space between the third surface of the second substrate and the second surface of the first substrate, and an optical imaging system having n surfaces, where n is greater than or equal to two, at least two of the n surfaces of the optical imaging system are on respective ones of the first, second, third and fourth surfaces.

    摘要翻译： 集成光学成像系统包括具有第一和第二相对表面的第一衬底，具有第三和第四相对表面的第二衬底，在第二衬底的第三表面的基本上平面部分与第二表面的基本上平面部分之间的间隔物 所述第一基板中的至少两个，所述隔离物，所述第一基板和所述第二基板中的至少两个密封所述第二基板的第三表面和所述第一基板的第二表面之间的内部空间，以及具有n个表面的光学成像系统， n大于或等于2，光学成像系统的n个表面中的至少两个表面在第一，第二，第三和第四表面中的相应的一个上。