-
公开(公告)号：US20080002173A1
公开(公告)日：2008-01-03
申请号：US11427439
申请日：2006-06-29
IPC分类号： G03B27/54
CPC分类号： G03B27/52 , G03F7/70066
摘要： Methods and apparatus for shielding a reticle within an illumination system are disclosed. According to one aspect of the present invention, a blind arrangement for shielding an object such as a reticle includes a coil assembly which has at least one coil, an air supply that supplies air, and a first blind portion. The first blind portion includes at least one magnet and is not in physical contact with the coil. The first blind portion is supported at a distance from the coil by the air, and the coil assembly cooperates with the magnet to cause the first blind portion to move. The first blind portion shields the object when the first blind portion is in a first position.
摘要翻译： 公开了用于屏蔽照明系统内的掩模版的方法和装置。 根据本发明的一个方面，用于屏蔽诸如掩模版的物体的盲装置包括具有至少一个线圈的线圈组件，供应空气的空气供应器和第一盲区部件。 第一盲部包括至少一个磁体并且不与线圈物理接触。 第一盲部通过空气与线圈支撑一定距离，并且线圈组件与磁体协作以使第一盲部移动。 当第一盲区部分处于第一位置时，第一盲区部分屏蔽物体。
-
公开(公告)号：US06815695B2
公开(公告)日：2004-11-09
申请号：US10056017
申请日：2002-01-28
申请人： W. Thomas Novak , Douglas C. Watson
发明人： W. Thomas Novak , Douglas C. Watson
IPC分类号： H01L2100
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70741 , G03F7/70975 , H01J37/16
摘要： A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.
摘要翻译： 与电子束系统一起使用的简化掩模版去除系统。 简化的掩模版去除系统包括具有成角度的开口的标线室和可拆卸地或可枢转地附接到其上的维护面板。 倾斜的开口提供了进入分隔板室内的掩模版阶段。 成角度的开口还允许从标线室移除光罩台，而不必拆卸和移除电子束系统的光学系统。 这样可以减少维护和修理成本，同时减少电子束系统的停机时间。
-
公开(公告)号：US06734947B2
公开(公告)日：2004-05-11
申请号：US09760797
申请日：2001-01-17
申请人： Douglas C. Watson , Michael Binnard
发明人： Douglas C. Watson , Michael Binnard
IPC分类号： G03B2752
CPC分类号： G03F7/70691 , G03B27/42 , G03F7/708
摘要： A chamber seal device is provided to seal a wafer stage chamber assembly to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from an atmospheric condition, so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber, a top wall and a base frame. The wafer stage chamber assembly is supported by an apparatus frame of an exposure apparatus via a plurality of body supports. The chamber seal device includes one or more o-ring seals positioned in between and surrounding the perimeter of the wafer stage chamber and the top wall, or the wafer stage chamber and the base frame to seal the wafer stage chamber assembly.
摘要翻译： 提供室密封装置以密封晶片台室组件以隔离半导体衬底，晶片台装置以及从大气条件制造半导体晶片的过程，使得所得到的晶片具有改进的质量并满足某些晶片制造规范 。 晶片台室组件包括晶片台室，顶壁和底架。 晶片台室组件经由多个主体支撑体由曝光装置的装置框架支撑。 腔室密封装置包括一个或多个O形环密封件，该密封件位于晶片载置台和顶壁之间并围绕晶片台室周边或围绕晶片台室和基座框架以密封晶片台室组件。
-
公开(公告)号：US06639654B2
公开(公告)日：2003-10-28
申请号：US09843077
申请日：2001-04-27
申请人： Michael Binnard , Douglas C. Watson
发明人： Michael Binnard , Douglas C. Watson
IPC分类号： G03B2758
CPC分类号： G03F7/70716 , G03F7/70825 , G03F7/709 , Y10S414/135
摘要： A device and method are provided to remove a wafer stage carrier carrying a wafer stage assembly from an exposure apparatus. The wafer stage carrier may be removably fastened to the apparatus frame of the exposure apparatus by any types of mechanical fasteners. The removal assembly includes a set of expandable supports and a set of removal supports. When the apparatus frame supports the wafer stage carrier, the wafer stage carrier hangs above a stationary surface, such as the ground. To remove the wafer stage carrier, the set of expandable supports is expanded until it reaches the ground and is capable of supporting the weight of the wafer stage carrier. At this juncture, the mechanical fasteners may be removed to allow the weight of the wafer stage carrier to transfer from the apparatus frame to the expandable supports. The set of expandable supports may reduce its expansion to lower the wafer stage carrier away from the exposure apparatus until the set of removal supports reaches the ground and supports the weight of the wafer stage carrier.
-
公开(公告)号：US20120320362A1
公开(公告)日：2012-12-20
申请号：US13527206
申请日：2012-06-19
CPC分类号： F16F7/082
摘要： An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region. When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so as to provide relatively high stiffness in first and second orthogonal directions (e.g., z- and y-directions) and relatively low stiffness in a third orthogonal direction (e.g., x-direction). The device can be used in coordination with an actuator, wherein operation of the actuator and compression of the overlap region are automated.
摘要翻译： 示例性装置包括分别由重叠区域彼此交错的多个叶片的第一和第二组可移动地连接在一起的第一和第二部分。 当重叠区域被压缩时，防止第一和第二部分相对于彼此的位移，以便在第一和第二正交方向（例如，z和y方向）上提供相对高的刚度，并且在第三 正交方向（例如，x方向）。 该装置可以与致动器协调使用，其中致动器的操作和重叠区域的压缩是自动化的。
-
公开(公告)号：US08059258B2
公开(公告)日：2011-11-15
申请号：US12232513
申请日：2008-09-18
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.
摘要翻译： 液浸光刻设备包括具有最后元件的投影系统。 投影系统将图像投影到工件上，以通过填充在最后一个元件和工件之间的空间中的液体来暴露工件。 液体供应装置包括在曝光期间将液体从供应入口供应到工件和最后元件之间的空间的供应入口。 最后一个元件包括光学元件和板。 该板防止可能受液体接触影响的光学元件的劣化。
-
67.发明申请Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US20110235007A1
公开(公告)日：2011-09-29
申请号：US13067464
申请日：2011-06-02
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，其包括具有可渗透构件的液体收集构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体，其中可渗透构件具有多个通道，其产生毛细管 力。
-
68.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US07969552B2
公开(公告)日：2011-06-28
申请号：US11819689
申请日：2007-06-28
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括一种液体收集系统，该液体收集系统包括具有芯结构构件的液体收集构件，从与液体收集构件相对的物体的表面收集液体。
-
69.发明授权公开(公告)号：US07965376B2
公开(公告)日：2011-06-21
申请号：US11819691
申请日：2007-06-28
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.
-
公开(公告)号：US07830046B2
公开(公告)日：2010-11-09
申请号：US11725024
申请日：2007-03-16
IPC分类号： H02K41/00
摘要： A stage assembly (220) that moves a work piece (200) along a first axis includes a stage base (236), a guide bar (238), a device table (240) that retains the work piece (200), a mover assembly (242), and a damper (225). The damper (225) can be a passive, electromagnetic damper that passively dampens movement of the guide bar (238) relative to the stage base (236) along a second axis that is orthogonal to the first axis. The damper (225) can include a magnet array (356) and a conductor (366) that is positioned in a magnetic field that surrounds the magnet array (356). With this design, relative movement between the guide bar (238) and the stage base (236) along the second axis induces the flow of current in the conductor (366) and eddy current damping. The damper (225) can include a first damper subassembly (252A) that is coupled to the guide bar (238) and a second damper subassembly (252B) that is coupled to the stage base (236).
摘要翻译： 沿着第一轴线移动工件（200）的台架组件（220）包括台架（236），导杆（238），保持工件（200）的装置台（240） 组件（242）和阻尼器（225）。 阻尼器（225）可以是被动的电磁阻尼器，其被动地抑制导向杆（238）相对于载置台（236）沿着与第一轴线正交的第二轴线的运动。 阻尼器（225）可以包括位于围绕磁体阵列（356）的磁场中的磁体阵列（356）和导体（366）。 利用这种设计，沿着第二轴的引导杆（238）和台架（236）之间的相对运动引起导体（366）中的电流流动和涡流阻尼。 阻尼器（225）可以包括联接到导杆（238）的第一阻尼器子组件（252A）和耦合到平台基座（236）的第二阻尼器子组件（252B）。
-
-
-
-
-
-
-
-
-
搜索结果
101 条记录 (耗时 0.028 秒)
