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    Processes for forming backplanes for electro-optic displays
    62.
    发明授权
    Processes for forming backplanes for electro-optic displays 有权
    用于形成电光显示器背板的工艺

    公开(公告)号：US07785988B2

    公开(公告)日：2010-08-31

    申请号：US12243411

    申请日：2008-10-01

    申请人： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    发明人： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    IPC分类号： H01L21/30

    CPC分类号： H01L27/1266 ,  B60C23/04 ,  G02F1/133305 ,  G02F1/1362 ,  G02F1/167 ,  G02F2001/13613 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/78603

    摘要： A non-linear element is formed on a flexible substrate by securing the substrate to a rigid carrier, forming the non-linear element, and then separating the flexible substrate from the carrier. The process allows flexible substrates to be processed in a conventional fab intended to process rigid substrates. In a second method, a transistor is formed on a insulating substrate by forming gate electrodes, depositing a dielectric layer, a semiconductor layer and a conductive layer, patterning the conductive layer to form source, drain and pixel electrodes, covering the channel region of the resultant transistor with an etch-resistant material and etching using the etch-resistant material and the conductive layer as a mask, the etching extending substantially through the semiconductor layer between adjacent transistors. The invention also provides a process for forming a diode on a substrate by depositing on the substrate a first conductive layer, and a second patterned conductive layer and a patterned dielectric layer over parts of the first conductive layer, and etching the first conductive layer using the second conductive layer and dielectric layer as an etch mask. Finally, the invention provides a process for driving an impulse-sensitive electro-optic display.

    摘要翻译： 通过将基板固定到刚性载体上，形成非线性元件，然后将柔性基板与载体分离，在柔性基板上形成非线性元件。 该方法允许柔性基底在旨在处理刚性基底的常规晶圆中进行加工。 在第二种方法中，通过形成栅电极，沉积介电层，半导体层和导电层，在绝缘基板上形成晶体管，图案化导电层以形成源极，漏极和像素电极，覆盖该沟道区 具有耐蚀刻材料的合成晶体管和使用耐蚀刻材料和导电层作为掩模的蚀刻，蚀刻基本上延伸通过相邻晶体管之间的半导体层。 本发明还提供了一种通过在衬底上沉积第一导电层以及第二图案化导电层和在第一导电层的部分上的图案化电介质层在衬底上形成二极管的工艺，并且使用 第二导电层和介电层作为蚀刻掩模。 最后，本发明提供一种驱动脉冲敏感电光显示器的方法。

    MULTI-LAYER SHEET FOR USE IN ELECTRO-OPTIC DISPLAYS
    63.
    发明申请
    MULTI-LAYER SHEET FOR USE IN ELECTRO-OPTIC DISPLAYS 有权
    用于电子显示屏的多层纸

    公开(公告)号：US20100118384A1

    公开(公告)日：2010-05-13

    申请号：US12635082

    申请日：2009-12-10

    申请人： Guy M. Danner ,  Sandra Rifai

    发明人： Guy M. Danner ,  Sandra Rifai

    IPC分类号： G02B26/00 ,  H01L21/50

    CPC分类号： G02B1/14 ,  G02B1/105 ,  G02F1/1333 ,  G02F1/133305 ,  G02F2001/133311 ,  G02F2001/133562 ,  G02F2201/50 ,  Y10T156/10 ,  Y10T428/31504

    摘要： A multi-layer film, useful as a front sub-assembly in electro-optic displays, comprises, in this order: a light-transmissive electrically-conductive layer (114); a light-transmissive first protective layer (112); a light-transmissive moisture barrier layer (108); and a light-transmissive second protective layer (106). This multi-layer film can be used in forming an electro-optic display by the processes described in U.S. Pat. No. 6,982,179 or Patent Publication No. 2007/0109219.

    摘要翻译： 用作电光显示器中的前子组件的多层膜按以下顺序包括：透光导电层（114）; 透光的第一保护层（112）; 透光防潮层（108）; 和透光性第二保护层（106）。 这种多层膜可以用于通过美国专利No。 No.6,982,179或专利公开号2007/0109219。

    Multi-layer sheet for use in electro-optic displays
    64.
    发明授权
    Multi-layer sheet for use in electro-optic displays 有权
    用于电光显示器的多层薄片

    公开(公告)号：US07667886B2

    公开(公告)日：2010-02-23

    申请号：US12017586

    申请日：2008-01-22

    申请人： Guy M. Danner ,  Sandra Rifai

    发明人： Guy M. Danner ,  Sandra Rifai

    IPC分类号： G02B26/00 ,  G09G3/34 ,  H01L21/00

    CPC分类号： G02B1/14 ,  G02B1/105 ,  G02F1/1333 ,  G02F1/133305 ,  G02F2001/133311 ,  G02F2001/133562 ,  G02F2201/50 ,  Y10T156/10 ,  Y10T428/31504

    摘要： A multi-layer film, useful as a front sub-assembly in electro-optic displays, comprises, in this order: a light-transmissive electrically-conductive layer (114); a light-transmissive first protective layer (112); a light-transmissive moisture barrier layer (108); and a light-transmissive second protective layer (106). This multi-layer film can be used in forming an electro-optic display by the processes described in U.S. Pat. No. 6,982,179 or Patent Publication No. 2007/0109219.

    摘要翻译： 用作电光显示器中的前子组件的多层膜按以下顺序包括：透光导电层（114）; 透光的第一保护层（112）; 透光防潮层（108）; 和透光性第二保护层（106）。 这种多层膜可以用于通过美国专利No。 No.6,982,179或专利公开号2007/0109219。

    PROCESSES FOR FORMING BACKPLANES FOR ELECTRO-OPTIC DISPLAYS
    67.
    发明申请
    PROCESSES FOR FORMING BACKPLANES FOR ELECTRO-OPTIC DISPLAYS 有权
    用于形成电光显示器的背板的方法

    公开(公告)号：US20090029527A1

    公开(公告)日：2009-01-29

    申请号：US12243411

    申请日：2008-10-01

    申请人： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    发明人： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    IPC分类号： H01L21/64

    CPC分类号： H01L27/1266 ,  B60C23/04 ,  G02F1/133305 ,  G02F1/1362 ,  G02F1/167 ,  G02F2001/13613 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/78603

    摘要： A non-linear element is formed on a flexible substrate by securing the substrate to a rigid carrier, forming the non-linear element, and then separating the flexible substrate from the carrier. The process allows flexible substrates to be processed in a conventional fab intended to process rigid substrates. In a second method, a transistor is formed on a insulating substrate by forming gate electrodes, depositing a dielectric layer, a semiconductor layer and a conductive layer, patterning the conductive layer to form source, drain and pixel electrodes, covering the channel region of the resultant transistor with an etch-resistant material and etching using the etch-resistant material and the conductive layer as a mask, the etching extending substantially through the semiconductor layer between adjacent transistors. The invention also provides a process for forming a diode on a substrate by depositing on the substrate a first conductive layer, and a second patterned conductive layer and a patterned dielectric layer over parts of the first conductive layer, and etching the first conductive layer using the second conductive layer and dielectric layer as an etch mask. Finally, the invention provides a process for driving an impulse-sensitive electro-optic display.

    摘要翻译： 通过将基板固定到刚性载体上，形成非线性元件，然后将柔性基板与载体分离，在柔性基板上形成非线性元件。 该方法允许柔性基底在旨在处理刚性基底的常规晶圆中进行加工。 在第二种方法中，通过形成栅电极，沉积介电层，半导体层和导电层，在绝缘基板上形成晶体管，图案化导电层以形成源极，漏极和像素电极，覆盖该沟道区 具有耐蚀刻材料的合成晶体管和使用耐蚀刻材料和导电层作为掩模的蚀刻，蚀刻基本上延伸通过相邻晶体管之间的半导体层。 本发明还提供了一种通过在衬底上沉积第一导电层以及第二图案化导电层和在第一导电层的部分上的图案化电介质层在衬底上形成二极管的工艺，并且使用 第二导电层和介电层作为蚀刻掩模。 最后，本发明提供一种驱动脉冲敏感电光显示器的方法。

    Light modulation by frustration of total internal reflection
    70.
    发明授权
    Light modulation by frustration of total internal reflection 有权
    光调制由沮丧的全内反射

    公开(公告)号：US06819471B2

    公开(公告)日：2004-11-16

    申请号：US10064779

    申请日：2002-08-16

    申请人： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Russell J. Wilcox

    发明人： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Russell J. Wilcox

    IPC分类号： G02B2600

    CPC分类号： G02F1/315 ,  G02F1/167

    摘要： Improvements and modifications are provided in the type of frustrated total internal reflection electrophoretic systems described in U.S. Pat. No. 6,215,920. The improvements and modifications include (a) conforming the rear electrode to the shape of the front electrode; (b) encapsulating the electrophoretic medium and particles; (c) modifying the viscosity of the electrophoretic medium; (d) polymer coating the electrophoretic particles; (e) use of a high volume fraction of electrophoretic particles; (f) tethering the electrophoretic particles to the reflecting sheet; (g) using particles of varying electrophoretic mobility; (h) controlling the shape of the electrophoretic particles; (i) use of a low refractive index layer over the channel electrode; (j) providing cross-walls within the electrophoretic medium; (k) use of two immiscible liquids as the electrophoretic medium; and (I) replacing the electrophoretic particles with ones containing absorbing and/or scattering centers within a light transmissive matrix.

    摘要翻译： 在美国专利中描述的沮丧的全内反射电泳系统的类型中提供了改进和修改。 6,215,920号。 改进和修改包括（a）使后电极符合前电极的形状; （b）封装电泳介质和颗粒; （c）改变电泳介质的粘度; （d）聚合物涂覆电泳颗粒; （e）使用高体积分数的电泳颗粒; （f）将电泳粒子系在反射片上; （g）使用具有不同电泳迁移率的颗粒; （h）控制电泳颗粒的形状; （i）在通道电极上使用低折射率层; （j）在电泳介质内提供交叉壁; （k）使用两种不混溶液体作为电泳介质; 和（I）用含有在透光矩阵内的吸收和/或散射中心的电泳粒子代替电泳粒子。