ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    61.
    发明申请
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的照明系统

    公开(公告)号:US20110122388A1

    公开(公告)日:2011-05-26

    申请号:US13005833

    申请日:2011-01-13

    申请人: Markus Deguenther

    发明人: Markus Deguenther

    IPC分类号: G03B27/54

    摘要: An illumination system of a microlithographic projection exposure apparatus includes an optical raster element configured to produce a plurality of secondary light sources located in a system pupil surface. The optical raster element has a plurality of light entrance facets, each being associated with one of the secondary light sources. A beam deflecting device includes a beam deflection array of reflective or transparent beam deflecting elements, each being configured to illuminate a spot on one of the light entrance facets at a position that is variable by changing a deflection angle produced by the beam deflecting element. A control unit is configured to control the beam deflection elements such that variable light patterns assembled from the spots can be formed on at least one of the plurality of light entrance facets.

    摘要翻译: 微光刻投影曝光装置的照明系统包括被配置为产生位于系统光瞳表面中的多个次级光源的光栅元件。 光栅元件具有多个光入射面,每个光入射面与二次光源中的一个相关联。 光束偏转装置包括反射或透明光束偏转元件的光束偏转阵列,每个光束偏转阵列被配置为在通过改变由光束偏转元件产生的偏转角可变的位置处照射光入射面中的一个上的光斑。 控制单元被配置为控制光束偏转元件,使得可以在多个光入射面中的至少一个上形成从斑点组装的可变光图案。

    POLARIZATION-MODULATING OPTICAL ELEMENT
    63.
    发明申请
    POLARIZATION-MODULATING OPTICAL ELEMENT 有权
    极化调制光学元件

    公开(公告)号:US20100177293A1

    公开(公告)日:2010-07-15

    申请号:US12729948

    申请日:2010-03-23

    IPC分类号: G03B27/54 G02B5/30

    摘要: A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

    摘要翻译: 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布,其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

    Polarization-modulating optical element
    64.
    发明申请
    Polarization-modulating optical element 有权
    极化调制光学元件

    公开(公告)号:US20070081114A1

    公开(公告)日:2007-04-12

    申请号:US10580698

    申请日:2005-01-14

    IPC分类号: G02F1/1335

    摘要: A polarization-modulating optical element (1) consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element (1) has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

    摘要翻译: 由光学活性晶体材料构成的偏振调制光学元件(1)具有厚度分布,其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振光调制光学元件(1)具有第一线性偏振光的振荡平面和第二直线偏振光的振动面分别旋转第一旋转角度和第二旋转角度 旋转角度与第一旋转角度和第二旋转角度彼此不同。

    Illumination system and lithographic apparatus
    65.
    发明授权
    Illumination system and lithographic apparatus 有权
    照明系统和光刻设备

    公开(公告)号:US09116439B2

    公开(公告)日:2015-08-25

    申请号:US13051384

    申请日:2011-03-18

    IPC分类号: G03F7/20

    摘要: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.

    摘要翻译: 公开了一种照明系统,其具有偏振构件,该偏振构件包括可移动成与辐射束至少部分交叉的第一和第二偏振修正器,使得各个偏振修正器对至少部分光束施加修改的偏振。 所述照明系统还包括可独立控制的反射元件的阵列,其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器,被配置为控制所述第一和第二偏振调节剂的运动,使得所述第一和第二偏振调节剂与 辐射束的不同部分。

    Polarization-modulating optical element
    66.
    发明授权
    Polarization-modulating optical element 有权
    极化调制光学元件

    公开(公告)号:US08482717B2

    公开(公告)日:2013-07-09

    申请号:US12201767

    申请日:2008-08-29

    IPC分类号: G03B27/42

    摘要: The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

    摘要翻译: 本发明涉及一种投影系统,包括辐射源,可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到光敏基板上的投影物镜,其中所述投影系统包括光学系统 包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件,其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件,第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓,其中 另外或替代地,第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料,其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化,其中 有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比,第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

    Illumination system for illuminating a mask in a microlithographic exposure apparatus
    67.
    发明授权
    Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权
    用于在微光刻曝光设备中照射掩模的照明系统

    公开(公告)号:US08416390B2

    公开(公告)日:2013-04-09

    申请号:US12533756

    申请日:2009-07-31

    IPC分类号: G03B27/54 G03B27/42

    摘要: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

    摘要翻译: 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列,例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件,其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件)和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。

    Polarization-modulating optical element
    69.
    发明授权
    Polarization-modulating optical element 有权
    极化调制光学元件

    公开(公告)号:US08279524B2

    公开(公告)日:2012-10-02

    申请号:US10580698

    申请日:2005-01-14

    摘要: A polarization-modulating optical element formed of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

    摘要翻译: 由光学活性晶体材料形成的偏振调制光学元件具有厚度分布,其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

    POLARIZATION-MODULATING OPTICAL ELEMENT
    70.
    发明申请
    POLARIZATION-MODULATING OPTICAL ELEMENT 有权
    极化调制光学元件

    公开(公告)号:US20080316598A1

    公开(公告)日:2008-12-25

    申请号:US12200068

    申请日:2008-08-28

    IPC分类号: G02B5/30

    摘要: A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second line early polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

    摘要翻译: 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布,其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有如下效果:第一直线偏振光的振荡平面和第二行的早期偏振光的振动平面分别旋转第一旋转角度和第二角度 旋转,第一旋转角度和第二旋转角度彼此不同。