公开(公告)号：US08416390B2

公开(公告)日：2013-04-09

申请号：US12533756

申请日：2009-07-31

申请人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

发明人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70216 ,  G03F7/70116 ,  G03F7/70158

摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。

公开(公告)号：US20100060873A1

公开(公告)日：2010-03-11

申请号：US12533756

申请日：2009-07-31

申请人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

发明人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

IPC分类号： G03B27/70

CPC分类号： G03F7/70216 ,  G03F7/70116 ,  G03F7/70158

摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。

公开(公告)号：US07649702B2

公开(公告)日：2010-01-19

申请号：US12019830

申请日：2008-01-25

申请人： Bernhard Gellrich ,  Paul Graeupner ,  Juergen Fischer ,  Andreas Wurmbrand ,  Bauke Jansen ,  Bob Streefkerk ,  Christiaan Alexander Hoogendam ,  Johannes Jacobus Matheus Baselmans

发明人： Bernhard Gellrich ,  Paul Graeupner ,  Juergen Fischer ,  Andreas Wurmbrand ,  Bauke Jansen ,  Bob Streefkerk ,  Christiaan Alexander Hoogendam ,  Johannes Jacobus Matheus Baselmans

IPC分类号： G02B7/02 ,  G02B3/00 ,  G02B3/12

CPC分类号： G03F7/70341 ,  G03F7/70825

摘要： An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

摘要翻译： 浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体，沿着物镜的光轴方向跟随第一光学元件的第二光学元件，与第二光学元件邻接的浸没介质， 位于后者的光轴的方向的下游，以及用于第二光学元件的保持结构。 保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。

公开(公告)号：US20080212211A1

公开(公告)日：2008-09-04

申请号：US12019830

申请日：2008-01-25

申请人： Bernhard Gellrich ,  Paul Graeupner ,  Juergen Fischer ,  Andreas Wurmbrand ,  Bauke Jansen ,  Bob Streefkerk ,  Christiaan Alexander Hoogendam ,  Johannes Jacobus Matheus Baselmans

发明人： Bernhard Gellrich ,  Paul Graeupner ,  Juergen Fischer ,  Andreas Wurmbrand ,  Bauke Jansen ,  Bob Streefkerk ,  Christiaan Alexander Hoogendam ,  Johannes Jacobus Matheus Baselmans

IPC分类号： G02B7/02 ,  H01L21/00

CPC分类号： G03F7/70341 ,  G03F7/70825

摘要： An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

摘要翻译： 浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体，沿着物镜的光轴方向跟随第一光学元件的第二光学元件，与第二光学元件邻接的浸没介质， 位于后者的光轴的方向的下游，以及用于第二光学元件的保持结构。 保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。

公开(公告)号：US08237915B2

公开(公告)日：2012-08-07

申请号：US12203738

申请日：2008-09-03

申请人： Paul Graeupner

发明人： Paul Graeupner

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/32 ,  G03B27/68 ,  G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70891

摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.

摘要翻译： 公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。 首先，将浸没​​液体引入到投影物镜的感光表面和端面之间的间隙中。 然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。 将该成像特性与目标成像特性进行比较。 最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。

公开(公告)号：US07227616B2

公开(公告)日：2007-06-05

申请号：US11149568

申请日：2005-06-10

申请人： Paul Graeupner

发明人： Paul Graeupner

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70891

摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.

摘要翻译： 公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。 首先，将浸没​​液体引入到投影物镜的感光表面和端面之间的间隙中。 然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。 将该成像特性与目标成像特性进行比较。 最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。

公开(公告)号：US08917379B2

公开(公告)日：2014-12-23

申请号：US12483733

申请日：2009-06-12

申请人： Paul Graeupner

发明人： Paul Graeupner

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70091 ,  G03F7/70066 ,  G03F7/70083 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70125 ,  G03F7/70891

摘要： Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle θ, and a pole area APOLE according to: 0.6

摘要翻译： 公开了投影曝光方法，系统，子系统和组件。 方法可以包括对图案的第一子图案进行第一曝光以对图像进行成像，其中第一子图案包括沿第一方向延伸的多个第一特征，并且在第二方向上以主要周期性长度P基本上周期性地间隔开 垂直于第一方向。 可以使用多极照明模式来执行第一曝光，所述多极照明模式包括至少一个基本上是偶极子强度分布，其具有两个位于基本上平行于第二方向并且彼此间隔开的极取向轴上的照明极。 偶极子强度分布的极点可以各自具有由极角度和方位角定义的方位角宽度;以及根据下式的极点面积APOLE：0.6

公开(公告)号：US07352435B2

公开(公告)日：2008-04-01

申请号：US10964816

申请日：2004-10-15

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Adrianus Franciscus Petrus Engelen ,  Jozef Maria Finders ,  Paul Graeupner ,  Johannes Catharinus Hubertus Mulkens ,  Jan Bernard Plechelmus Van Schoot

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Adrianus Franciscus Petrus Engelen ,  Jozef Maria Finders ,  Paul Graeupner ,  Johannes Catharinus Hubertus Mulkens ,  Jan Bernard Plechelmus Van Schoot

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70333

摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.

摘要翻译： 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。

公开(公告)号：US20060164655A1

公开(公告)日：2006-07-27

申请号：US11389053

申请日：2006-03-27

申请人： Wolfgang Emer ,  Paul Graeupner

发明人： Wolfgang Emer ,  Paul Graeupner

IPC分类号： G01B9/02

CPC分类号： G01M11/0242 ,  G01M11/0278 ,  G02B27/0025 ,  G03F7/706

摘要： In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.

摘要翻译： 在用于制造光学成像系统的方法中，在传输光学成像系统之前和之后确定由光学成像系统引起的波前像差。 将在先前确定中确定的至少一些像差参数用作用于在后续确定中确定像差参数的给定前提条件。 这导致混合方法，其中以组合的形式使用至少两种测量方法的强度，并且避免了任何一种方法的特定弱点。

公开(公告)号：US07019846B2

公开(公告)日：2006-03-28

申请号：US10445076

申请日：2003-05-27

申请人： Wolfgang Emer ,  Paul Graeupner

发明人： Wolfgang Emer ,  Paul Graeupner

IPC分类号： G01B9/02

CPC分类号： G01M11/0242 ,  G01M11/0278 ,  G02B27/0025 ,  G03F7/706

摘要： In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.

摘要翻译： 在用于确定用于光学成像系统中的成像特征的表征的波前像差的方法中，来自在连续时间执行的两种不同测量方法的测量结果被组合。 在这种情况下，在先前的第一测量方法中确定的至少一些像差参数被用作借助于第二测量方法来确定像差参数的给定前提条件，并相应地进行评估。 这导致混合方法，其中以组合形式使用至少两种测量方法的强度，并且可以避免任何一种方法的特定弱点。