公开(公告)号：US08416390B2

公开(公告)日：2013-04-09

申请号：US12533756

申请日：2009-07-31

申请人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

发明人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70216 ,  G03F7/70116 ,  G03F7/70158

摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。

公开(公告)号：US20100060873A1

公开(公告)日：2010-03-11

申请号：US12533756

申请日：2009-07-31

申请人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

发明人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

IPC分类号： G03B27/70

CPC分类号： G03F7/70216 ,  G03F7/70116 ,  G03F7/70158

摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。

公开(公告)号：US09046786B2

公开(公告)日：2015-06-02

申请号：US13604296

申请日：2012-09-05

申请人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

摘要翻译： 微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。 由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。 位移机构改变衍射光学元件的相互空间排列。 在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。 这使得可以以简单的方式生产连续可变的照明设置。

公开(公告)号：US09013684B2

公开(公告)日：2015-04-21

申请号：US13556408

申请日：2012-07-24

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03F7/20 ,  G02B26/08 ,  G01M11/00 ,  G01N21/55

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

摘要翻译： 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US09007563B2

公开(公告)日：2015-04-14

申请号：US12711059

申请日：2010-02-23

申请人： Markus Deguenther ,  Michael Layh

发明人： Markus Deguenther ,  Michael Layh

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/702 ,  G03F7/70116

摘要： An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.

摘要翻译： 用于在扫描微光刻投影曝光装置中照射掩模的照明系统具有物镜，其具有物平面，至少一个瞳孔表面和可以布置掩模的图像平面。 提供反射或透明光束偏转元件的光束偏转阵列，其中每个光束偏转元件适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件布置在物镜的物平面中或紧邻物镜的物平面。

公开(公告)号：US20130044303A1

公开(公告)日：2013-02-21

申请号：US13590673

申请日：2012-08-21

申请人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

发明人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

IPC分类号： G03B27/54

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70341 ,  G03F7/70558 ,  G03F7/7085

摘要： A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in the case of an adjustment of the at least one variably adjustable pupil-defining element. From the automatically determined illumination stress, the maximum radiant power of the light source is set or determined and/or in which an illumination system is provided with which different illumination settings can be made. Usage of the projection exposure system is recorded and, from the history of the usage, at least one state parameter of at least one optical element of the projection exposure system is determined.

摘要翻译： 公开了一种用于利用照明系统操作用于微光刻的投影曝光系统的投影曝光系统和方法。 所述照明系统包括至少一个可变地调整的光瞳限定元件。 在调整至少一个可变瞳孔限定元件的情况下，自动确定投影曝光系统的至少一个光学元件的照明应力。 根据自动确定的照明应力，设置或确定光源的最大辐射功率，和/或其中提供可以进行不同照明设置的照明系统。 记录投影曝光系统的使用，并且根据使用历史确定投影曝光系统的至少一个光学元件的至少一个状态参数。

公开(公告)号：US08320043B2

公开(公告)日：2012-11-27

申请号：US12205572

申请日：2008-09-05

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  F21V9/14 ,  G03B27/72

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element including an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 包括光学活性晶体材料的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US20120002185A1

公开(公告)日：2012-01-05

申请号：US13215616

申请日：2011-08-23

申请人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

发明人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

IPC分类号： G03B27/54

CPC分类号： G03F7/7085 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70266 ,  G03F7/70591 ,  G03F7/706

摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

摘要翻译： 微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。 测量装置包括具有多个照明构件的照明单元，每个具有光出射面。 光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。 检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

公开(公告)号：US07969556B2

公开(公告)日：2011-06-28

申请号：US12894611

申请日：2010-09-30

申请人： Markus Deguenther

发明人： Markus Deguenther

IPC分类号： G03B27/54 ,  G03B27/68 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/702 ,  G03F7/70116

摘要： An illumination optical system for microlithography is used to guide an illumination light bundle from a radiation source to an object field in an object plane. A field facet mirror has a plurality of field facets to predetermine defined illumination conditions in the object field. A following optical system is arranged downstream of the field facet mirror to transfer the illumination light into the object field. The following optical system has a pupil facet mirror with a plurality of pupil facets. Some of the field facets are divided into individual mirrors, which predetermine individual mirror illumination channels. The latter illuminate object field portions, which are smaller than the object field. At least some of the individual mirrors are configured as individual correction mirrors. The latter can be tilted between at least two tilting positions, a central region illumination taking place in a basic tilting position and a surrounding region illumination of the object field taking place in a correction tilting position. An illumination optical system is the result, with which a correction of undesired variations of illumination parameters, in particular an illumination intensity distribution over the object field, is possible without loss of light.

摘要翻译： 用于微光刻的照明光学系统用于将照明光束从辐射源引导到物平面中的物场。 场面反射镜具有多个场面以预先确定对象场中的定义的照明条件。 下面的光学系统被布置在场面反射镜的下游以将照明光转移到物场中。 以下光学系统具有具有多个光瞳面的光瞳小面镜。 一些场面被分成独立的反射镜，预先确定各个镜面照明通道。 后者照亮比对象字段小的对象字段部分。 至少一些单独的反射镜被配置为单独的校正镜。 后者可以在至少两个倾斜位置之间倾斜，在基本倾斜位置发生的中心区域照明和在校正倾斜位置发生的物体的周围区域照明。 照明光学系统的结果是，在不损失光的情况下可以校正照明参数的不希望的变化，特别是对象场上的照明强度分布。

公开(公告)号：US20110085151A1

公开(公告)日：2011-04-14

申请号：US12894611

申请日：2010-09-30

申请人： Markus Deguenther

发明人： Markus Deguenther

IPC分类号： G03F7/20 ,  G02B17/06 ,  G02B7/185 ,  G03B27/70

CPC分类号： G03F7/702 ,  G03F7/70116

摘要： An illumination optical system for microlithography is used to guide an illumination light bundle from a radiation source to an object field in an object plane. A field facet mirror has a plurality of field facets to predetermine defined illumination conditions in the object field. A following optical system is arranged downstream of the field facet mirror to transfer the illumination light into the object field. The following optical system has a pupil facet mirror with a plurality of pupil facets. Some of the field facets are divided into individual mirrors, which predetermine individual mirror illumination channels. The latter illuminate object field portions, which are smaller than the object field. At least some of the individual mirrors are configured as individual correction mirrors. The latter can be tilted between at least two tilting positions, a central region illumination taking place in a basic tilting position and a surrounding region illumination of the object field taking place in a correction tilting position. An illumination optical system is the result, with which a correction of undesired variations of illumination parameters, in particular an illumination intensity distribution over the object field, is possible without loss of light.

摘要翻译： 用于微光刻的照明光学系统用于将照明光束从辐射源引导到物平面中的物场。 场面反射镜具有多个场面以预先确定对象场中的定义的照明条件。 下面的光学系统被布置在场面反射镜的下游以将照明光转移到物场中。 以下光学系统具有具有多个光瞳面的光瞳小面镜。 一些场面被分成独立的反射镜，预先确定各个镜面照明通道。 后者照亮比对象字段小的对象字段部分。 至少一些单独的反射镜被配置为单独的校正镜。 后者可以在至少两个倾斜位置之间倾斜，在基本倾斜位置发生的中心区域照明和在校正倾斜位置发生的物体的周围区域照明。 照明光学系统的结果是，在不损失光的情况下可以校正照明参数的不希望的变化，特别是对象场上的照明强度分布。