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1.发明授权Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权用于在微光刻曝光设备中照射掩模的照明系统公开(公告)号：US08416390B2
公开(公告)日：2013-04-09
申请号：US12533756
申请日：2009-07-31
CPC分类号： G03F7/70216 , G03F7/70116 , G03F7/70158
摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。
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2.发明申请ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS 有权用于在微波曝光装置中照射掩模的照明系统公开(公告)号：US20100060873A1
公开(公告)日：2010-03-11
申请号：US12533756
申请日：2009-07-31
IPC分类号： G03B27/70
CPC分类号： G03F7/70216 , G03F7/70116 , G03F7/70158
摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。
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公开(公告)号：US07649702B2
公开(公告)日：2010-01-19
申请号：US12019830
申请日：2008-01-25
申请人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
发明人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
CPC分类号： G03F7/70341 , G03F7/70825
摘要： An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
摘要翻译： 浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体，沿着物镜的光轴方向跟随第一光学元件的第二光学元件，与第二光学元件邻接的浸没介质， 位于后者的光轴的方向的下游，以及用于第二光学元件的保持结构。 保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。
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公开(公告)号：US20080212211A1
公开(公告)日：2008-09-04
申请号：US12019830
申请日：2008-01-25
申请人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
发明人： Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
CPC分类号： G03F7/70341 , G03F7/70825
摘要： An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
摘要翻译： 浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体，沿着物镜的光轴方向跟随第一光学元件的第二光学元件，与第二光学元件邻接的浸没介质， 位于后者的光轴的方向的下游，以及用于第二光学元件的保持结构。 保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。
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5.发明授权Actuator including magnet for a projection exposure system and projection exposure system including a magnet 有权致动器包括用于投影曝光系统的磁体和包括磁体的投影曝光系统公开(公告)号：US09025128B2
公开(公告)日：2015-05-05
申请号：US13196592
申请日：2011-08-02
申请人： Armin Werber , Norbert Muehlberger , Almut Czap , Juergen Fischer
发明人： Armin Werber , Norbert Muehlberger , Almut Czap , Juergen Fischer
CPC分类号： G03F7/7095 , G02B26/085 , G02B27/0006 , G03F7/70 , G03F7/70291 , H01F7/0221 , H01F7/1623 , H01F7/1638
摘要： The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.
摘要翻译： 本公开涉及一种包括磁体的用于投影曝光系统的致动器。 磁体被封装和/或支撑在通过微技术生产方法制造的磁体保持板中，使得移动的操纵器表面通过单片或粘合的连接件被保持在磁体保持板中，而没有附加的连接材料，使得存在安全的连接。
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6.发明授权公开(公告)号：US08885143B2
公开(公告)日：2014-11-11
申请号：US13071237
申请日：2011-03-24
申请人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译： 用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。 为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。
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7.发明授权Gravitation compensation for optical elements in projection exposure apparatuses 有权投影曝光装置中的光学元件的重力补偿公开(公告)号：US08854603B2
公开(公告)日：2014-10-07
申请号：US13111492
申请日：2011-05-19
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译： 公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。 重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。 这尤其适用于要补偿的高重量力。 此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。
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8.发明授权Implement for processing, particularly sealing, ground surfaces under water, particularly bottoms and embankments of waterways, particularly canals, a method for setting up the same, a method for moving the same, a method for sealing ground surfaces using the same, and the like 有权用于加工，特别是在水下，特别是水路的底部和路堤，特别是运河处的地面的密封，其设置方法，使其移动的方法，使用其的密封地面的方法等公开(公告)号：US08632276B2
公开(公告)日：2014-01-21
申请号：US12988478
申请日：2009-03-13
申请人： Juergen Fischer
发明人： Juergen Fischer
CPC分类号： E02B3/121 , E02B5/02 , Y10T403/7015
摘要： A method and apparatus for processing underwater beds includes a plurality of polygonal hollow pipes arranged side by side, the upper ends of which form a horizontal, substantially flat working platform. Each hollow pipe has a horizontal projection with a flange extending vertically and a corresponding flange insertion aperture with a slot immediately above it running vertically and extending as far as the upper end of the hollow pipe, the aperture being further away from the upper end of the hollow pipe than the projection with the flange and having a greater horizontal dimension than the slot. Neighboring hollow pipes engage one another via a respective projection with a corresponding slot. The hollow pipes cannot be moved relative to one another horizontally. Individual pipes can only be pulled out individually in an upward direction at the platform outer edge.
摘要翻译： 一种用于处理水下床的方法和装置包括多个并排布置的多边形中空管，其上端形成水平的，基本平坦的工作平台。 每个中空管具有水平突起，其具有垂直延伸的凸缘和相应的凸缘插入孔，其上方正好在其上垂直延伸并延伸至中空管的上端，该孔远离该中空管的上端 中空管比具有凸缘的突起具有比槽更大的水平尺寸。 相邻的中空管通过相应的突起与相应的槽相互接合。 中空管不能相对于水平移动。 单独的管道只能在平台外边缘沿向上方向单独拉出。
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9.发明申请公开(公告)号：US20090225296A1
公开(公告)日：2009-09-10
申请号：US12467879
申请日：2009-05-18
申请人： Juergen Fischer
发明人： Juergen Fischer
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70266
摘要： A projection objective of a microlithographic projection exposure apparatus has a plurality of optical elements, for example lenses or mirrors. The objective furthermore includes an actuator for exerting a mechanical force that deforms a selected optical element of the projection objective. A manipulator modifies the spatial position of one of the optical elements as a function of the force exerted by the actuator.
摘要翻译： 微光刻投影曝光装置的投影物镜具有多个光学元件，例如透镜或反射镜。 此外，该目的还包括用于施加使所选投影物镜的所选择的光学元件变形的机械力的致动器。 操纵器根据由致动器施加的力的函数来修改光学元件中的一个的空间位置。
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公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。
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