Positive resist composition
    61.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号:US07335454B2

    公开(公告)日:2008-02-26

    申请号:US10317110

    申请日:2002-12-12

    IPC分类号: G03C1/00

    摘要: A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator capable of generating an acid upon irradiation of an actinic ray or radiation, and the acid generator of (B) is a compound selected from a sulfonium salt containing no aromatic ring and a compound having a phenacylsulfonium salt structure.

    摘要翻译: 一种正型抗蚀剂组合物,其包含(A)在聚合物骨架的主链和/或侧链中具有被氟原子取代的结构的含氟基树脂和通过酸的作用而分解的基团以增加 在碱显影剂中的溶解度和(B)能够在光化射线或辐射照射时能产生酸的酸发生剂,(B)的酸产生剂是选自不含芳环的锍盐和具有 苯甲酰锍盐结构。

    Positive resist composition
    62.
    发明授权
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号:US07232640B1

    公开(公告)日:2007-06-19

    申请号:US10812092

    申请日:2004-03-30

    IPC分类号: G03F7/039 G03F7/26

    CPC分类号: G03F7/0392

    摘要: A positive resist composition comprising a polymer capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin comprises repeating units containing at least two special types of acetal structures separately, a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a solvent.

    摘要翻译: 一种正性抗蚀剂组合物,其包含能够在酸的作用下增加其在碱显影剂中的溶解度的聚合物,其中所述树脂包含分别含有至少两种特殊类型的缩醛结构的重复单元,能够在以下情况下产生酸的化合物: 光化射线或辐射,以及溶剂。

    POSITIVE RESIST COMPOSITION
    63.
    发明申请
    POSITIVE RESIST COMPOSITION 有权
    积极抵抗组成

    公开(公告)号:US20070128547A1

    公开(公告)日:2007-06-07

    申请号:US10812092

    申请日:2004-03-30

    IPC分类号: G03C1/00

    CPC分类号: G03F7/0392

    摘要: A positive resist composition comprising a polymer capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin comprises repeating units containing at least two special types of acetal structures separately, a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a solvent.

    摘要翻译: 一种正性抗蚀剂组合物,其包含能够在酸的作用下增加其在碱显影剂中的溶解度的聚合物,其中所述树脂包含分别含有至少两种特殊类型的缩醛结构的重复单元,能够在以下情况下产生酸的化合物: 光化射线或辐射,以及溶剂。

    Photosensitive resin composition
    64.
    发明授权
    Photosensitive resin composition 有权
    感光树脂组合物

    公开(公告)号:US07214467B2

    公开(公告)日:2007-05-08

    申请号:US10455459

    申请日:2003-06-06

    IPC分类号: G03F7/00

    摘要: The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light, where line edge roughness and development time dependence are small and a problem of footing formation is improved; and comprising a resin which decomposes by an action of acid to increase the solubility in alkali developer, in which the resin contains a specific repeat unit; a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, in which the compound includes at least two kinds of compounds selected from the group consisting of specific compounds (B1), (B2), (B3) and (B4).

    摘要翻译: 本发明的感光性树脂组合物是优异的感光性树脂组合物,其在使用160nm以下的曝光光源,更具体地是2/2准分子激光的情况下显示显着的透射性,其中线边 粗糙度和开发时间依赖性小,基础形成问题得到改善; 并且包含通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂,其中树脂含有特定的重复单元; 其中化合物包括选自特定化合物(B1),(B2),(B3)和(B3)中的至少两种化合物, (B4)。

    Positive photoresist composition and pattern making method using the same
    65.
    发明授权
    Positive photoresist composition and pattern making method using the same 有权
    正光致抗蚀剂组合物和使用其的图案制造方法

    公开(公告)号:US07202015B2

    公开(公告)日:2007-04-10

    申请号:US10921962

    申请日:2004-08-20

    IPC分类号: G03F7/004 G03C5/00

    摘要: A positive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.

    摘要翻译: 一种正性光致抗蚀剂组合物,其含有:(A)含有本文所述的由式(IA)表示的重复单元和本文定义的式(IB)表示的重复单元中的至少一种的树脂,并且通过 酸显示出在碱性显影剂中的溶解度的增加; 和(B)作为能够在用光化学射线和辐射之一照射时产生酸的化合物,至少两种选自化合物(B1),(B2),(B3)和(B4)的化合物,如本文所述。

    Resist composition and pattern forming method using the same
    69.
    发明申请
    Resist composition and pattern forming method using the same 审中-公开
    抗蚀剂组合物和图案形成方法使用其

    公开(公告)号:US20060172226A1

    公开(公告)日:2006-08-03

    申请号:US11336912

    申请日:2006-01-23

    IPC分类号: G03C1/76

    摘要: A resist composition comprising (A) an acid generator represented by formula (1): wherein S1 to S8 each independently represents a substituent; a, n, m, l, k, o, p, q and r each independently represents an integer of 0 to 2; X represents a single bond or a divalent linking group; R1 and R2 each independently represents a hydrogen atom or a substituent, and R1 and R2 may combine with each other to represent a single bond or a divalent linking group; and Y− and Z− each independently represents an organic sulfonate anion.

    摘要翻译: 一种抗蚀剂组合物,其包含(A)由式(1)表示的酸发生剂:其中S 1至S 8各自独立地表示取代基; a,n,m,l,k,o,p,q和r各自独立地表示0〜2的整数。 X表示单键或二价连接基团; R 1和R 2各自独立地表示氢原子或取代基,R 1和R 2可以 彼此结合以表示单键或二价连接基团; 和Y - Z - 各自独立地表示有机磺酸根阴离子。