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公开(公告)号：US20080118872A1
公开(公告)日：2008-05-22
申请号：US11844824
申请日：2007-08-24
IPC分类号： G03C5/00
CPC分类号： H01L21/0276 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/3081 , H01L21/3086 , H01L21/3088
摘要： The present invention provides a method to pattern a substrate which features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.
摘要翻译： 本发明提供一种通过在衬底上形成具有突起和凹陷的图案化层来形成特征为产生多层结构的衬底的方法。 形成在图案层上的是保形层，多层结构具有背离衬底的表冠表面。 去除多层结构的部分以暴露与突起叠加的衬底的区域，同时在与凹部重叠的冠表面的区域中形成硬掩模。
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62.发明授权公开(公告)号：US07323130B2
公开(公告)日：2008-01-29
申请号：US10735110
申请日：2003-12-12
CPC分类号： B82Y10/00 , B29C59/02 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： The present invention is directed to a method of controlling dimensional relations between an original pattern present in a mold and a recorded pattern formed in a layer of a substrate. In this manner, the size of the recorded pattern may appear to be magnified and/or reduced, when compared to the original pattern. To that end, the method comprises defining a region on the layer in which to produce the recorded pattern. The substrate is bent to produce a contoured surface in the region. Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern. The contoured surface and the mold are provided to have similar radii of curvatures. The varied pattern is then recorded in the layer. These and other embodiments of the present invention are discussed more fully below.
摘要翻译： 本发明涉及一种控制存在于模具中的原始图案与形成在基底层中的记录图案之间的尺寸关系的方法。 以这种方式，与原始图案相比，记录图案的尺寸可能看起来被放大和/或缩小。 为此，该方法包括定义在其上产生记录图案的层上的区域。 该基底被弯曲以在该区域中产生轮廓表面。 通过弯曲模具产生原始图案的尺寸变化，限定了不同的图案。 轮廓表面和模具被提供以具有相似的曲率半径。 然后将不同的图案记录在图层中。 下面将更全面地讨论本发明的这些和其它实施例。
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公开(公告)号：US07252777B2
公开(公告)日：2007-08-07
申请号：US10946565
申请日：2004-09-21
CPC分类号： B81C1/00626
摘要： The present invention features a method of patterning a substrate that includes forming from a first material, disposed on the substrate, a first film having an original pattern that includes a plurality of projections. The projections extend from a nadir surface terminating in an apex surface defining a height therebetween. A portion of the first film in superimposition with the nadir surface defines a nadir portion. The nadir portion is removed to expose a region of the substrate in superimposition therewith, defining a plurality of recessions. A second material is disposed upon the first film to form a second film having a surface spaced-apart from the apex surface of the plurality of projections and filling the plurality of recessions to form a multi-film stack. The first film and portions of the second film are removed to create a plurality of spaced-apart projections of the second material on the substrate.
摘要翻译： 本发明的特征在于一种图案化衬底的方法，其包括由设置在衬底上的第一材料形成具有包括多个突起的原始图案的第一膜。 突起从最终的表面延伸，终止于限定其间的高度的顶点表面。 第一膜中与最低点表面重叠的部分限定最低点部分。 去除最低点部分以暴露衬底的区域，从而限定多个凹陷。 第二材料设置在第一膜上以形成具有与多个突起的顶点表面间隔开的表面并填充多个凹陷以形成多层叠层的第二膜。 去除第一膜和第二膜的部分以在基板上产生多个间隔开的第二材料的突出部分。
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公开(公告)号：US07241395B2
公开(公告)日：2007-07-10
申请号：US10946577
申请日：2004-09-21
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00 , H01L21/3081 , H01L21/3086 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/312 , H01L21/3121
摘要： The present invention features a method of patterning a substrate that includes forming, on the substrate, a first film having an original pattern that includes a plurality of projections a subset of which extends from a nadir surface terminating in an apex surface defining a height therebetween. A second film is disposed upon the first film and defines a surface spaced-apart from the apex surface of the plurality of projections. A variation in a distance between the apex surface of any one of the plurality of projections and the surface being within a predetermined range. A recorded pattern is transferred onto the substrate that corresponds to the original pattern, within the predetermined range being selected to minimize pattern distortions in the recorded pattern.
摘要翻译： 本发明的特征在于一种图案化衬底的方法，其包括在衬底上形成具有原始图案的第一膜，该第一膜包括多个突起，该多个突起的一个子集从终止于限定其间的高度的顶点表面的最低点表面延伸。 第二膜设置在第一膜上并且限定与多个突起的顶点间隔开的表面。 多个突起中的任何一个的顶点表面与表面之间的距离的变化在预定范围内。 在被选择的预定范围内，将记录图案转印到与原始图案对应的基板上，以使记录图案中的图案失真最小化。
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65.发明授权公开(公告)号：US07186483B2
公开(公告)日：2007-03-06
申请号：US10805916
申请日：2004-03-22
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks and the template having template alignment marks, the method including, reducing a distance between the substrate and the template to cause a spreading of the activating light curable liquid; and varying an overlay placement of the template with respect to the substrate such that the template alignment marks are substantially aligned with the substrate alignment marks before the spreading causes the activating light curable liquid to cover an area between the substrate alignment marks and the template alignment marks.
摘要翻译： 本发明包括一种将衬底和与衬底间隔开的模板与其间设置的活化光可固化液体对准的方法，所述衬底具有衬底对准标记，并且模板具有模板对准标记，该方法包括， 基板和模板，以引起活化光可固化液体的扩散; 并且改变模板相对于基板的覆盖布局，使得模板对准标记在扩展之前基本对准基板对准标记，使得激活光可固化液体覆盖基板对准标记和模板对准标记之间的区域 。
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公开(公告)号：US07179396B2
公开(公告)日：2007-02-20
申请号：US10396615
申请日：2003-03-25
IPC分类号： C03C17/30
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/76802
摘要： The present invention provides a method to pattern a substrate which features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.
摘要翻译： 本发明提供一种通过在衬底上形成具有突起和凹陷的图案化层来形成特征为产生多层结构的衬底的方法。 形成在图案层上的是保形层，多层结构具有背离衬底的表冠表面。 去除多层结构的部分以暴露与突起叠加的衬底的区域，同时在与凹部重叠的冠表面的区域中形成硬掩模。
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67.发明授权System for determining characteristics of substrates employing fluid geometries 有权用于确定采用流体几何形状的基板特性的系统公开(公告)号：US07036389B2
公开(公告)日：2006-05-02
申请号：US10863800
申请日：2004-06-08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention provides a system for determining characteristics of substrates, such as the presence of contaminants, shape, as well as the spatial relationships between spaced-apart substrates. The spatial relationships include distance and angular orientation between first and second spaced apart substrates.
摘要翻译： 本发明提供一种用于确定衬底特性的系统，例如污染物的存在，形状以及间隔开的衬底之间的空间关系。 空间关系包括第一和第二间隔开的基底之间的距离和角度取向。
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68.发明授权Method for fabricating nanoscale patterns in light curable compositions using an electric field 失效使用电场在光固化组合物中制造纳米尺度图案的方法公开(公告)号：US06964793B2
公开(公告)日：2005-11-15
申请号：US09905718
申请日：2001-05-16
CPC分类号： B81C1/0046 , B05D1/40 , B05D3/067 , B05D3/145 , B29C43/003 , B29C2043/025 , B29C2043/3211 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A high-throughput lithography process for creating high-resolution patterns in a polymerizable composition using carefully controlled electric field followed by curing of the polymerizable composition is described. The process involves the use of a template that includes the desired patterns. This template is brought into close proximity to the polymerizable composition on the substrate. An external electric file is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the polymerizable composition to be attracted to the raised portions of the template. By appropriately choosing the various process parameters such as the viscosity of the polymerizable composition, the magnitude of the electric field, and the distance between the template and substrate, the resolution of the structures formed in the liquid may be controlled to conform to that of the template.
摘要翻译： 描述了使用仔细控制的电场随后固化可聚合组合物在可聚合组合物中产生高分辨率图案的高通量光刻工艺。 该过程涉及使用包含所需图案的模板。 使该模板靠近基材上的可聚合组合物。 外部电文件被施加到模板 - 基板界面上，同时保持模板和基板之间均匀且谨慎控制的间隙。 这使得可聚合组合物被吸引到模板的凸起部分。 通过适当地选择各种工艺参数，例如可聚合组合物的粘度，电场的大小以及模板和衬底之间的距离，可以控制在液体中形成的结构的分辨率以符合 模板。
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公开(公告)号：US06926929B2
公开(公告)日：2005-08-09
申请号：US10191749
申请日：2002-07-09
CPC分类号： B05D7/24 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method and a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.
摘要翻译： 本发明提供了一种方法和系统，该方法和系统将包含在盒中的液体分配到采用在与存储器进行数据通信的处理器的控制下的分配系统。
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公开(公告)号：US06921615B2
公开(公告)日：2005-07-26
申请号：US09907512
申请日：2001-07-16
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
摘要翻译： 描述了在压印光刻工艺期间确定和校正对准的方法。 在压印光刻工艺期间，模板可以通过使用设置在模板和衬底上的对准标记与衬底对准。 可以在层被处理之前确定和校正对准。
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