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86 条记录 (耗时 0.038 秒)

    METHOD FOR PRODUCING SEMICONDUCTOR LASER, SEMICONDUCTOR LASER, OPTICAL PICKUP, AND OPTICAL DISK DRIVE
    62.
    发明申请
    METHOD FOR PRODUCING SEMICONDUCTOR LASER, SEMICONDUCTOR LASER, OPTICAL PICKUP, AND OPTICAL DISK DRIVE 有权
    生产半导体激光，半导体激光，光学拾取和光盘驱动的方法

    公开(公告)号：US20100080107A1

    公开(公告)日：2010-04-01

    申请号：US12568855

    申请日：2009-09-29

    申请人： Rintaro Koda ,  Masaru Kuramoto ,  Eiji Nakayama ,  Tsuyoshi Fujimoto

    发明人： Rintaro Koda ,  Masaru Kuramoto ,  Eiji Nakayama ,  Tsuyoshi Fujimoto

    IPC分类号： G11B7/00 ,  H01L33/00 ,  H01S5/16 ,  H01S5/028

    CPC分类号： H01S5/16 ,  B82Y20/00 ,  H01S5/168 ,  H01S5/2275 ,  H01S5/2277 ,  H01S5/34333

    摘要： A method for producing a semiconductor laser having an edge window structure includes the steps of forming masks of insulating films on a nitride-based III-V compound semiconductor substrate including first regions and second regions periodically arranged in parallel therebetween; and growing a nitride-based III-V compound semiconductor layer in a region not covered by the masks. The first region between each two adjacent second regions has two or more positions, symmetrical with respect to a center line thereof, where laser stripes are to be formed. The masks are formed on one or both sides of each of the positions where the laser stripes are to be formed at least near a position where edge window structures are to be formed such that the masks are symmetrical with respect to the center line. The nitride-based III-V compound semiconductor layer includes an active layer containing at least indium and gallium.

    摘要翻译： 一种具有边缘窗结构的半导体激光器的制造方法，其特征在于，在氮化物系III-V族化合物半导体基板上形成绝缘膜的掩模的工序，所述掩模包括第一区域和第二区域， 以及在未被掩模覆盖的区域中生长氮化物III-V族化合物半导体层。 每个两个相邻的第二区域之间的第一区域具有相对于其中心线对称的两个或更多个位置，其中将形成激光条纹。 掩模形成在每个位置的一个或两侧上，其中激光条形成至少靠近要形成边缘窗口结构的位置，使得掩模相对于中心线对称。 基于氮化物的III-V族化合物半导体层包括至少含有铟和镓的活性层。

    Carbapenem derivatives, their preparation and their use as antibiotics
    66.
    发明授权
    Carbapenem derivatives, their preparation and their use as antibiotics 失效
    碳青霉烯类衍生物，其制备及其作为抗生素的用途

    公开(公告)号：US5866564A

    公开(公告)日：1999-02-02

    申请号：US889542

    申请日：1997-07-08

    申请人： Isao Kawamoto ,  Rokuro Endo ,  Masao Miyauchi ,  Katsuya Ishikawa ,  Eiji Nakayama ,  Hiroshi Yasuda ,  Satoshi Ohya ,  Yukio Utsui ,  Katsuhiko Watanabe

    发明人： Isao Kawamoto ,  Rokuro Endo ,  Masao Miyauchi ,  Katsuya Ishikawa ,  Eiji Nakayama ,  Hiroshi Yasuda ,  Satoshi Ohya ,  Yukio Utsui ,  Katsuhiko Watanabe

    IPC分类号： C07D477/20 ,  C07D487/04 ,  A61K31/40

    CPC分类号： C07D477/20

    摘要： Compound of formula (I): ##STR1## wherein R.sup.1 is hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.2 -C.sub.6 alkenyl, C.sub.2 -C.sub.6 alkynyl or --C(.dbd.NH)R.sup.0 where R.sup.0 is hydrogen or C.sub.1 -C.sub.6 alkyl;A is ##STR2## R.sup.2 is hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.2 -C.sub.6 alkenyl, C.sub.2 -C.sub.6 alkynyl or --C(.dbd.NH)R.sup.6 where R.sup.6 is hydrogen, C.sub.1 -C.sub.6 alkyl or C.sub.3 -C.sub.7 cycloalkyl; R.sup.3 and R.sup.4 are independently hydrogen, C.sub.1 -C.sub.6 alkyl, halogen, hydroxy, carboxy, cyano, --CO.NR.sup.a R.sup.b, --OCO.NR.sup.a R.sup.b or --NR.sup.a R.sup.b, where R.sup.a and R.sup.b are independently hydrogen or C.sub.1 -C.sub.6 alkyl; R.sup.20", R.sup.21', and R.sup.22" are independently hydrogen or C.sub.1 -C.sub.6 alkyl or R.sup.20" and R.sup.21" or R.sup.20" and R.sup.22" together form a heterocyclic group; R.sup.23" and R.sup.24" are independently hydrogen, halogen or C.sub.1 -C.sub.6 alkyl; n is 1, 2 or 3; and n.sup.3" is 1, 2 or 3. The compounds are antibiotics which are resistant to dehydropeptidase I, and are useful for the treatment of microbial infections.

    摘要翻译： 式（I）化合物：其中R 1是氢，C 1 -C 6烷基，C 2 -C 6烯基，C 2 -C 6炔基或-C（= NH）R 0）其中R 0是氢或C 1 -C 6烷基; （C 1 -C 6）烷基，C 2 -C 6烯基，C 2 -C 6炔基或-C（= NH）R 6，其中R 6是氢，C 1 -C6烷基或C3-C7环烷基; R 3和R 4独立地是氢，C 1 -C 6烷基，卤素，羟基，羧基，氰基，-CO.RRRRb，-OCO，NR a R b或-NR a R b，其中R a和R b独立地是氢或C 1 -C 6烷基; R 20“，R 21'和R 22”独立地是氢或C 1 -C 6烷基或R 20“，R 21”或R 20“和R 22”一起形成杂环基; R 23“和R 24”独立地是氢，卤素或C 1 -C 6烷基; n为1,2或3; 和n3“是1,2或3.化合物是抗脱水肽酶I的抗生素，并且可用于治疗微生物感染。

    Glass plate positioning and supplying machine
    67.
    发明授权
    Glass plate positioning and supplying machine 失效
    玻璃板定位供应机

    公开(公告)号：US5413204A

    公开(公告)日：1995-05-09

    申请号：US262903

    申请日：1994-06-21

    申请人： Takeshi Mori ,  Masato Nakamura ,  Eiji Nakayama

    发明人： Takeshi Mori ,  Masato Nakamura ,  Eiji Nakayama

    IPC分类号： B65G49/06 ,  B65G47/24

    CPC分类号： B65G49/064 ,  B65G2249/04

    摘要： A glass plate positioning and supplying machine has a glass plate positioning machine disposed above a roller conveyor for adjusting the longitudinal, transverse, and rotational position of the glass plate, and a glass plate supplying machine disposed below the glass plate positioning machine for receiving the positioned glass plate from the glass plate positioning machine and supplying it onto the roller conveyor.

    摘要翻译： 玻璃板定位供给机具有设置在辊式输送机上方的玻璃板定位机，用于调节玻璃板的纵向，横向和旋转位置，以及设置在玻璃板定位机下方的玻璃板供给机，用于接收定位 玻璃板从玻璃板定位机并将其供给到辊式输送机上。

    Method for producing semiconductor laser, semiconductor laser, optical pickup, and optical disk drive
    69.
    发明授权
    Method for producing semiconductor laser, semiconductor laser, optical pickup, and optical disk drive 有权
    半导体激光器，半导体激光器，光学拾取器和光盘驱动器的制造方法

    公开(公告)号：US08896002B2

    公开(公告)日：2014-11-25

    申请号：US12568855

    申请日：2009-09-29

    申请人： Rintaro Koda ,  Masaru Kuramoto ,  Eiji Nakayama ,  Tsuyoshi Fujimoto

    发明人： Rintaro Koda ,  Masaru Kuramoto ,  Eiji Nakayama ,  Tsuyoshi Fujimoto

    IPC分类号： H01L33/00 ,  B82Y20/00 ,  H01S5/323 ,  H01S5/227 ,  H01S5/16 ,  H01S5/343

    CPC分类号： H01S5/16 ,  B82Y20/00 ,  H01S5/168 ,  H01S5/2275 ,  H01S5/2277 ,  H01S5/34333

    摘要： A method for producing a semiconductor laser having an edge window structure includes the steps of forming masks of insulating films on a nitride-based III-V compound semiconductor substrate including first regions and second regions periodically arranged in parallel therebetween; and growing a nitride-based III-V compound semiconductor layer in a region not covered by the masks. The first region between each two adjacent second regions has two or more positions, symmetrical with respect to a center line thereof, where laser stripes are to be formed. The masks are formed on one or both sides of each of the positions where the laser stripes are to be formed at least near a position where edge window structures are to be formed such that the masks are symmetrical with respect to the center line. The nitride-based III-V compound semiconductor layer includes an active layer containing at least indium and gallium.

    摘要翻译： 一种具有边缘窗结构的半导体激光器的制造方法，其特征在于，在氮化物系III-V族化合物半导体基板上形成绝缘膜的掩模的工序，所述掩模包括第一区域和第二区域， 以及在未被掩模覆盖的区域中生长氮化物III-V族化合物半导体层。 每个两个相邻的第二区域之间的第一区域具有相对于其中心线对称的两个或更多个位置，其中将形成激光条纹。 掩模形成在每个位置的一个或两侧上，其中激光条形成至少靠近要形成边缘窗口结构的位置，使得掩模相对于中心线对称。 基于氮化物的III-V族化合物半导体层包括至少含有铟和镓的活性层。

    WIRELESS COMMUNICATION SYSTEM, WIRELESS BASE STATION, CONTROL METHOD, AND CONTROL DEVICE
    70.
    发明申请
    WIRELESS COMMUNICATION SYSTEM, WIRELESS BASE STATION, CONTROL METHOD, AND CONTROL DEVICE 审中-公开
    无线通信系统，无线基站，控制方法和控制设备

    公开(公告)号：US20120156987A1

    公开(公告)日：2012-06-21

    申请号：US13392245

    申请日：2010-08-24

    申请人： Eiji Nakayama

    发明人： Eiji Nakayama

    IPC分类号： H04W56/00 ,  H04B7/19

    CPC分类号： H04W56/00 ,  H04J3/0641 ,  H04J3/0644 ,  H04W52/143 ,  H04W52/243

    摘要： Each of the plurality of wireless base stations determines whether the accuracy of a synchronizing signal generated at a corresponding synchronizing signal generation unit is below a predetermined level, and when the accuracy of synchronizing signal is below the predetermined level, refers to the management unit to determine whether there is, among other wireless base stations arranged adjacent to its own station, a wireless base station connected to a synchronizing signal generation unit differing from its own connected synchronizing signal generation unit, and when there is a wireless base station connected to a synchronizing signal generation unit differing from its own connected synchronizing signal generation unit, reducing its own transmission power.

    摘要翻译： 多个无线基站中的每一个确定在相应的同步信号生成单元处生成的同步信号的精度是否低于预定值，并且当同步信号的精度低于预定值时，指管理单元确定 除了与其本台相邻布置的无线基站之外，是否连接到与其自身连接的同步信号生成单元不同的同步信号生成单元的无线基站，以及当存在连接到同步信号的无线基站时 生成单元不同于其自身连接的同步信号生成单元，从而降低其自身的发送功率。