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85 条记录 (耗时 0.03 秒)

    Method and apparatus for reactive vapor deposition of compounds of metal and semi-conductors
    62.
    发明授权
    Method and apparatus for reactive vapor deposition of compounds of metal and semi-conductors 失效
    用于金属和半导体化合物的反应蒸汽沉积的方法和装置

    公开(公告)号：US4572842A

    公开(公告)日：1986-02-25

    申请号：US644314

    申请日：1984-08-24

    申请人： Anton Dietrich ,  Klaus Hartig ,  Michael Scherer

    发明人： Anton Dietrich ,  Klaus Hartig ,  Michael Scherer

    IPC分类号： C23C14/36 ,  C23C14/00 ,  C23C14/34 ,  H01J37/34 ,  B05D3/06

    CPC分类号： H01J37/3405 ,  C23C14/0068

    摘要： Method for reactive vapor deposition of compounds of metals and semi-conductors on at least one substrate by glow discharge. Into a space between a magnetron cathode (1) with a target (5) and the substrate (11) an inert gas and a reaction gas for the formation of the desired compound with the target material are separately introduced. Two solve the problem of making it possible to maintain the vapor deposition process stable over long time periods, according to the invention, a flow restriction is introduced between the target (5) and the substrate (11) by a diaphragm (20), which amounts to at least 40% of the cross-section of the space. Further, the inert gas is fed between target (5) and aperture (20) at the periphery of the target. Moreover the reaction gas is fed to the mass flow through a distributor device (21) to one side of the diaphragm (20), and finally a glow discharge is also maintained in the region between diaphragm (20) and substrate (11) by means of an anode (25) exposed to the reaction gas arranged on the other side of the aperture.

    摘要翻译： 通过辉光放电在至少一个衬底上反应蒸镀金属和半导体化合物的方法。 分别引入到具有靶（5）的磁控管阴极（1）和基板（11）之间的空间中，分别引入用于形成目标化合物的惰性气体和反应气体。 两个解决了根据本发明使得可以在长时间内保持气相沉积过程稳定的问题，通过隔膜（20）在目标（5）和基板（11）之间引入流动限制， 相当于空间横截面的至少40％。 此外，惰性气体在目标（5）和孔（20）之间在靶的周边处被供给。 此外，反应气体通过分配器装置（21）被供给到膜片（20）的一侧的质量流，并且最终通过装置在膜（20）和基板（11）之间的区域中保持辉光放电 暴露于布置在孔径另一侧的反应气体的阳极（25）。

    Heat treatable coated article with dual layer overcoat
    66.
    发明授权
    Heat treatable coated article with dual layer overcoat 有权
    具有双层外套的热处理涂层制品

    公开(公告)号：US07153577B2

    公开(公告)日：2006-12-26

    申请号：US10608560

    申请日：2003-06-30

    申请人： Hong Wang ,  Anton Dietrich

    发明人： Hong Wang ,  Anton Dietrich

    IPC分类号： B32B15/00

    CPC分类号： C03C17/36 ,  B32B17/10009 ,  B32B17/10174 ,  C03C17/3435 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3649 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C17/3694 ,  C03C2217/78 ,  C23C14/0015 ,  C23C14/0084 ,  C23C14/0652

    摘要： A coated article is provided so as to include an overcoat having an outermost layer including silicon nitride which overlies an underlayer including a metal oxide (MOx) or a metal oxynitride (MOxNy), where the metal (M) is selected from the group of Cr, Nb, Hf, Ta, and/or combinations thereof. Such an overcoat provides for good mechanical and chemical protection in the context of heat treatable coated articles. Coated articles herein may be used in the context of insulating glass (IG) window units, architectural or residential monolithic window units, vehicle windows, and/or the like.

    摘要翻译： 提供一种涂覆制品，以便包括外涂层，该外涂层具有包括氮化硅的最外层，该覆盖物覆盖包括金属氧化物（MO）的底层或金属氧氮化物（MOX xS / 其中金属（M）选自Cr，Nb，Hf，Ta和/或其组合中的一种。 这种外涂层可在可热处理的涂层制品的背景下提供良好的机械和化学保护。 本文中的涂层制品可用于中空玻璃（IG）窗单元，建筑或住宅单片窗单元，车窗和/或类似物的上下文中。

    Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation
    68.
    发明授权
    Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation 失效
    用于生产在可见光谱范围内具有高透射率并具有高反射率的热辐射的涂覆玻璃的方法

    公开(公告)号：US5201926A

    公开(公告)日：1993-04-13

    申请号：US230681

    申请日：1988-08-08

    申请人： Joachim Szczyrbowski ,  Anton Dietrich ,  Klaus Hartig

    发明人： Joachim Szczyrbowski ,  Anton Dietrich ,  Klaus Hartig

    IPC分类号： B60J1/00 ,  C03C17/36

    CPC分类号： C03C17/3618 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  B60J1/002

    摘要： Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.

    摘要翻译： 在可见光谱范围内具有高透射率并具有高反射率的热辐射以及低表面电阻的方法。 在矿物玻璃的基材上，按照以下顺序建立涂层体系：涂层1：氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合物，涂层1：氧化物，涂层2：合金80 镍的重量百分比和20重量％的铬，涂层3：银或银合金具有至少50重量％的银含量，涂层4：80重量％的镍和20重量％的铬的合金， 涂层5：氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合物的氧化物。 此后，将具有整个涂层的基底加热至玻璃的软化温度并弯曲成最终形状。

    Process for coating a dielectric substrate with copper
    69.
    发明授权
    Process for coating a dielectric substrate with copper 失效
    用铜包覆电介质基板的工艺

    公开(公告)号：US5108571A

    公开(公告)日：1992-04-28

    申请号：US770772

    申请日：1991-10-04

    申请人： Rainer Ludwig ,  Rolf Adam ,  Anton Dietrich ,  Reiner Kukla

    发明人： Rainer Ludwig ,  Rolf Adam ,  Anton Dietrich ,  Reiner Kukla

    IPC分类号： C23C14/14 ,  C23C14/02 ,  C23C14/08 ,  C23C14/18 ,  C23C14/34 ,  C23C14/35 ,  H05K3/16 ,  H05K3/38

    CPC分类号： H05K3/16 ,  C23C14/024 ,  C23C14/087 ,  C23C14/18 ,  C23C14/35 ,  H05K3/38

    摘要： In a process for coating substrates 1, 35, for example aluminum ceramic plates 1 or polyimide films 35 with copper by means of a device including a direct current source 10 which is connected to a sputtering cathode 5, 30, 31 disposed in a process chamber 15, 15a, 32 which can be evacuated and this cathode electrically interacts with a copper target 3, 33, 34 which can be sputtered and the sputtered particles are deposited on the substrate 1, 35 whereby the argon gas can be introduced into the process chamber 15, 15a, 32 which can be evacuated, an oxygen inlet 20, 39 is provided in addition to the argon inlet 21, 40, whereby the supply of oxygen can be controlled via a valve 19, 43 inserted in the feed line 23, 39 and the amount of oxygen can be metered such that during a first process phase a copper oxide layer which functions as a bonding agent forms on the substrate 1, 35 and after adjusting the argon atmosphere in the process chamber 15, 15a, 32 pure copper is deposited as an electrically conductive layer.

    摘要翻译： 在通过包括连接到设置在处理室中的溅射阴极5,30,31的直流电源10的装置来涂覆基板1，35，例如铝陶瓷板1或具有铜的聚酰亚胺膜35的工艺中 15，15a，32，其可以被抽真空，并且该阴极与可以溅射的铜靶3,33,34电相互作用，并且溅射的颗粒沉积在衬底1,35上，由此氩气可以被引入到处理室 除了氩入口21,40之外，还可以提供可以抽真空的氧气入口20,39，从而可以通过插入进料管线23,39中的阀19,43来控制供氧。 并且可以计量氧气的量，使得在第一处理阶段期间，在基板1,35上形成用作粘合剂的氧化铜层，并且在调节处理室15,15a，32纯铜中的氩气氛之后， 作为选民保存 导电层。

    Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation
    70.
    发明授权
    Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation 失效
    用于生产在可见光谱范围内具有高透射率的曲线玻璃以及用于热辐射的高反射率的方法

    公开(公告)号：US4919778A

    公开(公告)日：1990-04-24

    申请号：US356668

    申请日：1989-05-19

    申请人： Anton Dietrich ,  Klaus Hartig ,  Joachim Szczyrbowski

    发明人： Anton Dietrich ,  Klaus Hartig ,  Joachim Szczyrbowski

    IPC分类号： C03C17/36 ,  C03C27/12

    CPC分类号： C03C17/3618 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C17/3689

    摘要： A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.

    摘要翻译： 按照以下顺序在矿物玻璃的基板上建立层的系统：第一层：来自该组的氧化物，氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合氧化物; 第二层：一组金属，钽，钨，镍，铁; 第三层：含有至少50重量％银的银或银合金; 第四层：一组金属，钽，钨，镍，铁或它们的合金; 第五层：来自该组的氧化物，氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或它们的混合氧化物。 之后，将具有所有涂层的基板在氧化气氛中加热至玻璃的软化温度并弯曲成最终形状。